DE2722951C2 - Verwendung von Copolymeren aus 2,3-Epithiopropylmethacrylat und Acrylaten zur Herstellung von Ätzmasken - Google Patents
Verwendung von Copolymeren aus 2,3-Epithiopropylmethacrylat und Acrylaten zur Herstellung von ÄtzmaskenInfo
- Publication number
- DE2722951C2 DE2722951C2 DE2722951A DE2722951A DE2722951C2 DE 2722951 C2 DE2722951 C2 DE 2722951C2 DE 2722951 A DE2722951 A DE 2722951A DE 2722951 A DE2722951 A DE 2722951A DE 2722951 C2 DE2722951 C2 DE 2722951C2
- Authority
- DE
- Germany
- Prior art keywords
- udf54
- udf53
- production
- copolymers
- etching masks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000005530 etching Methods 0.000 title claims description 7
- 229920001577 copolymer Polymers 0.000 title claims description 5
- OXUABORVCCLQJI-UHFFFAOYSA-N thiiran-2-ylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1CS1 OXUABORVCCLQJI-UHFFFAOYSA-N 0.000 title claims description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 title description 2
- 239000002904 solvent Substances 0.000 claims description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 238000004132 cross linking Methods 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000011347 resin Substances 0.000 description 16
- 229920005989 resin Polymers 0.000 description 16
- 239000000243 solution Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- -1 Polyvinylsiloxan Polymers 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 241001235661 Acteon Species 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- AWDBHOZBRXWRKS-UHFFFAOYSA-N tetrapotassium;iron(6+);hexacyanide Chemical compound [K+].[K+].[K+].[K+].[Fe+6].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] AWDBHOZBRXWRKS-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/38—Esters containing sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polymerisation Methods In General (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7615520A FR2352007A1 (fr) | 1976-05-21 | 1976-05-21 | Resine sensible aux electrons et procede de fabrication de ladite resine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2722951A1 DE2722951A1 (de) | 1977-12-01 |
| DE2722951C2 true DE2722951C2 (de) | 1987-05-07 |
Family
ID=9173500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2722951A Expired DE2722951C2 (de) | 1976-05-21 | 1977-05-20 | Verwendung von Copolymeren aus 2,3-Epithiopropylmethacrylat und Acrylaten zur Herstellung von Ätzmasken |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4315067A (enExample) |
| JP (1) | JPS5835527B2 (enExample) |
| DE (1) | DE2722951C2 (enExample) |
| FR (1) | FR2352007A1 (enExample) |
| GB (1) | GB1576741A (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2382709A1 (fr) * | 1977-03-04 | 1978-09-29 | Thomson Csf | Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique |
| FR2441634A1 (fr) * | 1978-11-14 | 1980-06-13 | Thomson Csf | Resine a cycle thietane reticulable par irradiation electronique ou photonique et son utilisation pour la fabrication de composants electroniques et de couches de protection |
| FR2472768A1 (fr) * | 1979-12-27 | 1981-07-03 | Thomson Csf | Composition photopolymerisable comportant un cycle thiirane, procede de revetement d'une fibre optique utilisant une telle composition, et fibre ainsi revetue |
| JPS59146048A (ja) * | 1983-02-09 | 1984-08-21 | Chisso Corp | 電子線又はｘ線に感応性の樹脂 |
| GB2163435B (en) * | 1984-07-11 | 1987-07-22 | Asahi Chemical Ind | Image-forming materials sensitive to high-energy beam |
| FR2630744B1 (fr) * | 1988-04-29 | 1992-04-17 | Thomson Csf | Procede d'obtention d'un materiau polymere utilisable en optique non lineaire et materiau polymere obtenu |
| JP3245324B2 (ja) * | 1995-03-31 | 2002-01-15 | カネボウ株式会社 | 金属接着剤及び接着方法 |
| TWI482814B (zh) * | 2007-03-16 | 2015-05-01 | Mitsubishi Gas Chemical Co | 光學材料用樹脂組成物及由該組成物得到之光學材料 |
| GB2515697B (en) * | 2012-04-26 | 2020-03-04 | Ppg Ind Ohio Inc | Polymerizable compositions containing ethylenically unsaturated monomers having episulfide functional groups and related methods |
| US9279907B2 (en) | 2012-12-05 | 2016-03-08 | Ppg Industries Ohio, Inc. | Epoxide and thioepoxide functional, polymerizable compositions and methods of preparing optical articles therefrom |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3364184A (en) * | 1959-12-04 | 1968-01-16 | Shell Oil Co | Oil - soluble polymeric glycidyl compounds and functional organic compositions containing them |
| US3404158A (en) * | 1964-05-18 | 1968-10-01 | Thiokol Chemical Corp | Thioglycidyl compounds |
| US4130424A (en) * | 1976-08-06 | 1978-12-19 | Bell Telephone Laboratories, Incorporated | Process using radiation curable epoxy containing resist and resultant product |
-
1976
- 1976-05-21 FR FR7615520A patent/FR2352007A1/fr active Granted
-
1977
- 1977-05-18 GB GB21007/77A patent/GB1576741A/en not_active Expired
- 1977-05-20 DE DE2722951A patent/DE2722951C2/de not_active Expired
- 1977-05-21 JP JP52059292A patent/JPS5835527B2/ja not_active Expired
-
1980
- 1980-07-09 US US06/167,036 patent/US4315067A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE2722951A1 (de) | 1977-12-01 |
| FR2352007A1 (fr) | 1977-12-16 |
| JPS52142793A (en) | 1977-11-28 |
| JPS5835527B2 (ja) | 1983-08-03 |
| FR2352007B1 (enExample) | 1979-08-17 |
| US4315067A (en) | 1982-02-09 |
| GB1576741A (en) | 1980-10-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE19758244B4 (de) | Photoresist-Copolymer auf der Basis von Bicycloalkenen, Verfahren zu dessen Herstellung und dessen Verwendung | |
| EP0003040B1 (de) | Strahlungsempfindliche Überzugsmasse und Verfahren zur Herstellung eines negativen Photoresistbildes | |
| DE69325480T2 (de) | Harzzusammensetzungen, die eine Epoxygruppe enthalten | |
| EP0233567B1 (de) | Härtbare Mischungen, enthaltend N-Sulfonylaminosulfoniumsalze als kationisch wirksame Katalysatoren | |
| DE2445433A1 (de) | Elektronenstrahl-aufzeichnungstraeger | |
| DE2406400A1 (de) | Lichtempfindliche harzzusammensetzungen | |
| EP0072780B1 (de) | Imidylverbindungen, Polymere daraus und Verwendung der Polymeren | |
| DE2722951C2 (de) | Verwendung von Copolymeren aus 2,3-Epithiopropylmethacrylat und Acrylaten zur Herstellung von Ätzmasken | |
| EP0065285A2 (de) | Durch Strahlung polymerisierbares Gemisch und damit hergestelltes Kopiermaterial | |
| DE2520775A1 (de) | Lichtempfindliche harzzusammensetzung | |
| DE19919795A1 (de) | Polymer und dessen Verwendung in einem Verfahren zur Bildung eines Mikromusters | |
| DE2618897A1 (de) | Haertbare zusammensetzungen | |
| DE60101910T2 (de) | Monocarbonsäuresalze von imidazolreaktionsprodukten, verfahren zur herstellung der salze, und oberflächenbehandlungen, zusätze für harze und harzzusammensetzungen welche diese enthalten | |
| DE3322886C2 (enExample) | ||
| EP0043084A1 (de) | Flexible, laminierbare lichtempfindliche Schicht | |
| DE1771568A1 (de) | Verfahren zur Herstellung von verbesserten AEtzreliefs | |
| DE2609218A1 (de) | Kathodenstrahlenempfindliche materialien | |
| DE2457882C3 (enExample) | ||
| DE69430960T2 (de) | Entwickler für positiv arbeitenden Elektronenstrahlresist | |
| EP0126029A2 (de) | Verfahren zur Bilderzeugung | |
| DE2130904C3 (de) | Homogene lichtvernetzbare Schichten liefernde Gemische | |
| CH617950A5 (enExample) | ||
| DE2450381C3 (de) | Strahlungsempfindliches Material und dessen Verwendung | |
| DE1618729A1 (de) | Verfahren zur Herstellung eines photopolymerisierbaren Epoxydharzes | |
| DE2151068A1 (de) | Photolackzusammensetzung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8125 | Change of the main classification |
Ipc: G03F 7/26 |
|
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition |