FR2352007A1 - Resine sensible aux electrons et procede de fabrication de ladite resine - Google Patents

Resine sensible aux electrons et procede de fabrication de ladite resine

Info

Publication number
FR2352007A1
FR2352007A1 FR7615520A FR7615520A FR2352007A1 FR 2352007 A1 FR2352007 A1 FR 2352007A1 FR 7615520 A FR7615520 A FR 7615520A FR 7615520 A FR7615520 A FR 7615520A FR 2352007 A1 FR2352007 A1 FR 2352007A1
Authority
FR
France
Prior art keywords
resin
manufacturing
electron sensitive
sensitive resin
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7615520A
Other languages
English (en)
Other versions
FR2352007B1 (fr
Inventor
Maryse Gazard
Armand Eranian
Francoise Barre
Claude Duchesne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7615520A priority Critical patent/FR2352007A1/fr
Priority to GB21007/77A priority patent/GB1576741A/en
Priority to DE19772722951 priority patent/DE2722951A1/de
Priority to JP52059292A priority patent/JPS5835527B2/ja
Publication of FR2352007A1 publication Critical patent/FR2352007A1/fr
Application granted granted Critical
Publication of FR2352007B1 publication Critical patent/FR2352007B1/fr
Priority to US06/167,036 priority patent/US4315067A/en
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
FR7615520A 1976-05-21 1976-05-21 Resine sensible aux electrons et procede de fabrication de ladite resine Granted FR2352007A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR7615520A FR2352007A1 (fr) 1976-05-21 1976-05-21 Resine sensible aux electrons et procede de fabrication de ladite resine
GB21007/77A GB1576741A (en) 1976-05-21 1977-05-18 Electron sensitive acrylate resin
DE19772722951 DE2722951A1 (de) 1976-05-21 1977-05-20 Gegenueber elektronen empfindliches harz und verfahren zu seiner herstellung
JP52059292A JPS5835527B2 (ja) 1976-05-21 1977-05-21 電子官能性樹脂
US06/167,036 US4315067A (en) 1976-05-21 1980-07-09 Method for making electron sensitive negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7615520A FR2352007A1 (fr) 1976-05-21 1976-05-21 Resine sensible aux electrons et procede de fabrication de ladite resine

Publications (2)

Publication Number Publication Date
FR2352007A1 true FR2352007A1 (fr) 1977-12-16
FR2352007B1 FR2352007B1 (fr) 1979-08-17

Family

ID=9173500

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7615520A Granted FR2352007A1 (fr) 1976-05-21 1976-05-21 Resine sensible aux electrons et procede de fabrication de ladite resine

Country Status (5)

Country Link
US (1) US4315067A (fr)
JP (1) JPS5835527B2 (fr)
DE (1) DE2722951A1 (fr)
FR (1) FR2352007A1 (fr)
GB (1) GB1576741A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0033043A2 (fr) * 1979-12-27 1981-08-05 Lignes Telegraphiques Et Telephoniques L.T.T. Composition photopolymérisable comportant un cycle thiirane, et procédé de revêtement d'une fibre optique utilisant une telle composition
FR2630744A1 (fr) * 1988-04-29 1989-11-03 Thomson Csf Procede d'obtention d'un materiau polymere utilisable en optique non lineaire et materiau polymere obtenu

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2382709A1 (fr) * 1977-03-04 1978-09-29 Thomson Csf Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique
FR2441634A1 (fr) * 1978-11-14 1980-06-13 Thomson Csf Resine a cycle thietane reticulable par irradiation electronique ou photonique et son utilisation pour la fabrication de composants electroniques et de couches de protection
JPS59146048A (ja) * 1983-02-09 1984-08-21 Chisso Corp 電子線又はｘ線に感応性の樹脂
JPS6114293U (ja) * 1984-06-29 1986-01-27 忠夫 大岡 排水用管継手
GB2163435B (en) * 1984-07-11 1987-07-22 Asahi Chemical Ind Image-forming materials sensitive to high-energy beam
JP3245324B2 (ja) * 1995-03-31 2002-01-15 カネボウ株式会社 金属接着剤及び接着方法
TWI482814B (zh) * 2007-03-16 2015-05-01 Mitsubishi Gas Chemical Co 光學材料用樹脂組成物及由該組成物得到之光學材料
JP5933818B2 (ja) * 2012-04-26 2016-06-15 ピーピージー インダストリーズ オハイオ，インコーポレイティド エピスルフィド官能基を有するエチレン性不飽和モノマーを含有する重合可能な組成物および関連する方法
US9279907B2 (en) 2012-12-05 2016-03-08 Ppg Industries Ohio, Inc. Epoxide and thioepoxide functional, polymerizable compositions and methods of preparing optical articles therefrom

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3364184A (en) * 1959-12-04 1968-01-16 Shell Oil Co Oil - soluble polymeric glycidyl compounds and functional organic compositions containing them
US3404158A (en) * 1964-05-18 1968-10-01 Thiokol Chemical Corp Thioglycidyl compounds
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0033043A2 (fr) * 1979-12-27 1981-08-05 Lignes Telegraphiques Et Telephoniques L.T.T. Composition photopolymérisable comportant un cycle thiirane, et procédé de revêtement d'une fibre optique utilisant une telle composition
EP0033043B1 (fr) * 1979-12-27 1984-01-11 Lignes Telegraphiques Et Telephoniques L.T.T. Composition photopolymérisable comportant un cycle thiirane, et procédé de revêtement d'une fibre optique utilisant une telle composition
FR2630744A1 (fr) * 1988-04-29 1989-11-03 Thomson Csf Procede d'obtention d'un materiau polymere utilisable en optique non lineaire et materiau polymere obtenu

Also Published As

Publication number Publication date
JPS5835527B2 (ja) 1983-08-03
FR2352007B1 (fr) 1979-08-17
JPS52142793A (en) 1977-11-28
DE2722951C2 (fr) 1987-05-07
GB1576741A (en) 1980-10-15
US4315067A (en) 1982-02-09
DE2722951A1 (de) 1977-12-01

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Legal Events

Date Code Title Description
ST Notification of lapse
ST Notification of lapse