JPS5833837A - 荷電ビ−ム用位置検出マ−クの構成方法 - Google Patents

荷電ビ−ム用位置検出マ−クの構成方法

Info

Publication number
JPS5833837A
JPS5833837A JP13161581A JP13161581A JPS5833837A JP S5833837 A JPS5833837 A JP S5833837A JP 13161581 A JP13161581 A JP 13161581A JP 13161581 A JP13161581 A JP 13161581A JP S5833837 A JPS5833837 A JP S5833837A
Authority
JP
Japan
Prior art keywords
substrate
mark
position detection
detection mark
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13161581A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6257253B2 (enrdf_load_stackoverflow
Inventor
Naoki Kato
加藤 直規
Kuniki Owada
大和田 邦樹
Tadamasa Ogawa
小川 忠政
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP13161581A priority Critical patent/JPS5833837A/ja
Publication of JPS5833837A publication Critical patent/JPS5833837A/ja
Publication of JPS6257253B2 publication Critical patent/JPS6257253B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP13161581A 1981-08-24 1981-08-24 荷電ビ−ム用位置検出マ−クの構成方法 Granted JPS5833837A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13161581A JPS5833837A (ja) 1981-08-24 1981-08-24 荷電ビ−ム用位置検出マ−クの構成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13161581A JPS5833837A (ja) 1981-08-24 1981-08-24 荷電ビ−ム用位置検出マ−クの構成方法

Publications (2)

Publication Number Publication Date
JPS5833837A true JPS5833837A (ja) 1983-02-28
JPS6257253B2 JPS6257253B2 (enrdf_load_stackoverflow) 1987-11-30

Family

ID=15062199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13161581A Granted JPS5833837A (ja) 1981-08-24 1981-08-24 荷電ビ−ム用位置検出マ−クの構成方法

Country Status (1)

Country Link
JP (1) JPS5833837A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948924A (ja) * 1982-09-14 1984-03-21 Nec Corp 電子線露光用位置合せマ−ク
JPS603400U (ja) * 1983-06-22 1985-01-11 富士工器株式会社 Lpガス容器用キヤツプ

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948924A (ja) * 1982-09-14 1984-03-21 Nec Corp 電子線露光用位置合せマ−ク
JPS603400U (ja) * 1983-06-22 1985-01-11 富士工器株式会社 Lpガス容器用キヤツプ

Also Published As

Publication number Publication date
JPS6257253B2 (enrdf_load_stackoverflow) 1987-11-30

Similar Documents

Publication Publication Date Title
Hatzakis Electron resists for microcircuit and mask production
JPS5948924A (ja) 電子線露光用位置合せマ−ク
CA1066431A (en) Semiconductor device manufacture
EP0090447B1 (en) Masking process for semiconductor device manufacture
US4503334A (en) Method of using an electron beam
US4871919A (en) Electron beam lithography alignment using electric field changes to achieve registration
JPS5833837A (ja) 荷電ビ−ム用位置検出マ−クの構成方法
JP3287333B2 (ja) 電子線露光用マスク、その製造方法及び半導体装置の製造方法
JPH05502760A (ja) 半導体デバイスのメサ構造体に電気的接触片を製造するための処理方法
US4073990A (en) Apparatus for adjusting a semiconductor wafer by electron beam illumination
JPS6246976B2 (enrdf_load_stackoverflow)
JPH11162810A (ja) 電子ビーム露光用アラインメントマーク
JPS627688B2 (enrdf_load_stackoverflow)
JPH01192115A (ja) アライメントマーカーの形成方法
JPH0982940A (ja) 半導体装置およびその製造方法
JP3617223B2 (ja) アライメント方法
JPS60111425A (ja) 位置合わせ用マ−クの形成方法
JPH0644550B2 (ja) 半導体装置の製造方法
JPS58103129A (ja) 半導体装置の製造方法
JPS63263722A (ja) 電子線描画方法
Daniel Improvements in and relating to methods of manufacturing semiconductor devices
JPH07130611A (ja) 半導体装置の製造方法
JPH0738371B2 (ja) 位置検出用マークの形成方法
JPS5893342A (ja) 半導体装置の製造方法
JPH05136480A (ja) 半導体装置の製造方法