JPS5826182B2 - 静的バイポ−ラ・メモリ・セル - Google Patents

静的バイポ−ラ・メモリ・セル

Info

Publication number
JPS5826182B2
JPS5826182B2 JP55124127A JP12412780A JPS5826182B2 JP S5826182 B2 JPS5826182 B2 JP S5826182B2 JP 55124127 A JP55124127 A JP 55124127A JP 12412780 A JP12412780 A JP 12412780A JP S5826182 B2 JPS5826182 B2 JP S5826182B2
Authority
JP
Japan
Prior art keywords
region
conductivity type
transistor
island
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55124127A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5647991A (en
Inventor
ヤン・ローストロー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of JPS5647991A publication Critical patent/JPS5647991A/ja
Publication of JPS5826182B2 publication Critical patent/JPS5826182B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • H10B10/10SRAM devices comprising bipolar components
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/41Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
    • G11C11/411Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using bipolar transistors only
    • G11C11/4116Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using bipolar transistors only with at least one cell access via separately connected emittors of said transistors or via multiple emittors, e.g. T2L, ECL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/611Combinations of BJTs and one or more of diodes, resistors or capacitors
    • H10D84/613Combinations of vertical BJTs and one or more of diodes, resistors or capacitors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Static Random-Access Memory (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
JP55124127A 1979-09-11 1980-09-09 静的バイポ−ラ・メモリ・セル Expired JPS5826182B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NLAANVRAGE7906752,A NL186934C (nl) 1979-09-11 1979-09-11 Statische bipolaire geheugencel.

Publications (2)

Publication Number Publication Date
JPS5647991A JPS5647991A (en) 1981-04-30
JPS5826182B2 true JPS5826182B2 (ja) 1983-06-01

Family

ID=19833819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55124127A Expired JPS5826182B2 (ja) 1979-09-11 1980-09-09 静的バイポ−ラ・メモリ・セル

Country Status (10)

Country Link
US (1) US4388636A (OSRAM)
JP (1) JPS5826182B2 (OSRAM)
AU (1) AU538551B2 (OSRAM)
CA (1) CA1143477A (OSRAM)
DE (1) DE3033731C2 (OSRAM)
FR (1) FR2465294A1 (OSRAM)
GB (1) GB2058453B (OSRAM)
IT (1) IT1132700B (OSRAM)
NL (1) NL186934C (OSRAM)
SE (1) SE449937B (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6259977U (OSRAM) * 1985-10-03 1987-04-14

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL186934C (nl) 1979-09-11 1991-04-02 Philips Nv Statische bipolaire geheugencel.
EP0090665B1 (en) * 1982-03-30 1989-05-31 Fujitsu Limited Semiconductor memory device
JPS59141600U (ja) * 1983-03-14 1984-09-21 日立造船富岡機械株式会社 抄紙機の紙の水分調節装置
US4956688A (en) * 1984-10-29 1990-09-11 Hitachi, Ltd. Radiation resistant bipolar memory
US5177584A (en) * 1988-04-11 1993-01-05 Hitachi, Ltd. Semiconductor integrated circuit device having bipolar memory, and method of manufacturing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4032902A (en) * 1975-10-30 1977-06-28 Fairchild Camera And Instrument Corporation An improved semiconductor memory cell circuit and structure
FR2413782A1 (fr) * 1977-12-30 1979-07-27 Radiotechnique Compelec Element de circuit integre destine aux memoires bipolaires a isolement lateral par oxyde
JPS6057707B2 (ja) * 1978-01-25 1985-12-16 株式会社日立製作所 記憶回路
US4257059A (en) * 1978-12-20 1981-03-17 Fairchild Camera And Instrument Corp. Inverse transistor coupled memory cell
NL186934C (nl) 1979-09-11 1991-04-02 Philips Nv Statische bipolaire geheugencel.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6259977U (OSRAM) * 1985-10-03 1987-04-14

Also Published As

Publication number Publication date
NL186934B (nl) 1990-11-01
NL186934C (nl) 1991-04-02
GB2058453A (en) 1981-04-08
JPS5647991A (en) 1981-04-30
SE449937B (sv) 1987-05-25
CA1143477A (en) 1983-03-22
GB2058453B (en) 1983-07-06
DE3033731C2 (de) 1985-05-30
FR2465294B1 (OSRAM) 1985-02-15
SE8006225L (sv) 1981-03-12
US4388636A (en) 1983-06-14
NL7906752A (nl) 1981-03-13
IT8024530A0 (it) 1980-09-08
AU538551B2 (en) 1984-08-16
AU6211880A (en) 1981-03-19
DE3033731A1 (de) 1981-03-26
FR2465294A1 (fr) 1981-03-20
IT1132700B (it) 1986-07-02

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