JPS58210615A - 電子ビ−ムを用いたマ−ク位置測定方法 - Google Patents

電子ビ−ムを用いたマ−ク位置測定方法

Info

Publication number
JPS58210615A
JPS58210615A JP9289982A JP9289982A JPS58210615A JP S58210615 A JPS58210615 A JP S58210615A JP 9289982 A JP9289982 A JP 9289982A JP 9289982 A JP9289982 A JP 9289982A JP S58210615 A JPS58210615 A JP S58210615A
Authority
JP
Japan
Prior art keywords
mark
electron beam
alignment
mark position
measuring method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9289982A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6246057B2 (enrdf_load_stackoverflow
Inventor
Tadahiro Takigawa
忠宏 滝川
Yoshihide Kato
加藤　芳秀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP9289982A priority Critical patent/JPS58210615A/ja
Publication of JPS58210615A publication Critical patent/JPS58210615A/ja
Publication of JPS6246057B2 publication Critical patent/JPS6246057B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP9289982A 1982-05-31 1982-05-31 電子ビ−ムを用いたマ−ク位置測定方法 Granted JPS58210615A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9289982A JPS58210615A (ja) 1982-05-31 1982-05-31 電子ビ−ムを用いたマ−ク位置測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9289982A JPS58210615A (ja) 1982-05-31 1982-05-31 電子ビ−ムを用いたマ−ク位置測定方法

Publications (2)

Publication Number Publication Date
JPS58210615A true JPS58210615A (ja) 1983-12-07
JPS6246057B2 JPS6246057B2 (enrdf_load_stackoverflow) 1987-09-30

Family

ID=14067308

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9289982A Granted JPS58210615A (ja) 1982-05-31 1982-05-31 電子ビ−ムを用いたマ−ク位置測定方法

Country Status (1)

Country Link
JP (1) JPS58210615A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6246057B2 (enrdf_load_stackoverflow) 1987-09-30

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