JPS58197826A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS58197826A JPS58197826A JP57079983A JP7998382A JPS58197826A JP S58197826 A JPS58197826 A JP S58197826A JP 57079983 A JP57079983 A JP 57079983A JP 7998382 A JP7998382 A JP 7998382A JP S58197826 A JPS58197826 A JP S58197826A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- film
- emitter
- thermal oxide
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P14/60—
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57079983A JPS58197826A (ja) | 1982-05-14 | 1982-05-14 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57079983A JPS58197826A (ja) | 1982-05-14 | 1982-05-14 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58197826A true JPS58197826A (ja) | 1983-11-17 |
| JPH0122731B2 JPH0122731B2 (enExample) | 1989-04-27 |
Family
ID=13705549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57079983A Granted JPS58197826A (ja) | 1982-05-14 | 1982-05-14 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58197826A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60154628A (ja) * | 1984-01-25 | 1985-08-14 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置の製造方法 |
| EP0198150A1 (de) * | 1985-02-06 | 1986-10-22 | Reimbold & Strick GmbH & Co. KG | Keramische Zusammensetzungen und ihre Verwendung |
| EP0198149A1 (de) * | 1985-02-06 | 1986-10-22 | Reimbold & Strick GmbH & Co. KG | Verfahren zur Herstellung eines metallkeramischen Leiters und Anwendung des Verfahrens |
| JPS6218040A (ja) * | 1985-07-17 | 1987-01-27 | Matsushita Electronics Corp | リンケイ酸ガラス被膜の平坦化方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5019363A (enExample) * | 1973-06-21 | 1975-02-28 | ||
| JPS5485673A (en) * | 1977-12-20 | 1979-07-07 | Matsushita Electric Ind Co Ltd | Manufacture for semiconductor device |
-
1982
- 1982-05-14 JP JP57079983A patent/JPS58197826A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5019363A (enExample) * | 1973-06-21 | 1975-02-28 | ||
| JPS5485673A (en) * | 1977-12-20 | 1979-07-07 | Matsushita Electric Ind Co Ltd | Manufacture for semiconductor device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60154628A (ja) * | 1984-01-25 | 1985-08-14 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置の製造方法 |
| EP0198150A1 (de) * | 1985-02-06 | 1986-10-22 | Reimbold & Strick GmbH & Co. KG | Keramische Zusammensetzungen und ihre Verwendung |
| EP0198149A1 (de) * | 1985-02-06 | 1986-10-22 | Reimbold & Strick GmbH & Co. KG | Verfahren zur Herstellung eines metallkeramischen Leiters und Anwendung des Verfahrens |
| JPS6218040A (ja) * | 1985-07-17 | 1987-01-27 | Matsushita Electronics Corp | リンケイ酸ガラス被膜の平坦化方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0122731B2 (enExample) | 1989-04-27 |
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