JPS58194241A - イオン注入装置のタ−ゲツト冷却装置 - Google Patents

イオン注入装置のタ−ゲツト冷却装置

Info

Publication number
JPS58194241A
JPS58194241A JP57078715A JP7871582A JPS58194241A JP S58194241 A JPS58194241 A JP S58194241A JP 57078715 A JP57078715 A JP 57078715A JP 7871582 A JP7871582 A JP 7871582A JP S58194241 A JPS58194241 A JP S58194241A
Authority
JP
Japan
Prior art keywords
cooling
disk
rotary joint
shaft
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57078715A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6259409B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Koji Matsuda
松田　耕自
Tsukasa Nogami
野上　司
Susumu Yamada
進 山田
Masahiko Aoki
青木　正彦
Katsuo Naito
勝男 内藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NISSHIN HAIBORUTEEJI KK
Nissin High Voltage Co Ltd
Original Assignee
NISSHIN HAIBORUTEEJI KK
Nissin High Voltage Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NISSHIN HAIBORUTEEJI KK, Nissin High Voltage Co Ltd filed Critical NISSHIN HAIBORUTEEJI KK
Priority to JP57078715A priority Critical patent/JPS58194241A/ja
Publication of JPS58194241A publication Critical patent/JPS58194241A/ja
Publication of JPS6259409B2 publication Critical patent/JPS6259409B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP57078715A 1982-05-10 1982-05-10 イオン注入装置のタ−ゲツト冷却装置 Granted JPS58194241A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57078715A JPS58194241A (ja) 1982-05-10 1982-05-10 イオン注入装置のタ−ゲツト冷却装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57078715A JPS58194241A (ja) 1982-05-10 1982-05-10 イオン注入装置のタ−ゲツト冷却装置

Publications (2)

Publication Number Publication Date
JPS58194241A true JPS58194241A (ja) 1983-11-12
JPS6259409B2 JPS6259409B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-12-10

Family

ID=13669562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57078715A Granted JPS58194241A (ja) 1982-05-10 1982-05-10 イオン注入装置のタ−ゲツト冷却装置

Country Status (1)

Country Link
JP (1) JPS58194241A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008021340A3 (en) * 2006-08-17 2008-07-17 Axcelis Tech Inc Workpiece handling scan arm for ion implantation system
WO2018142459A1 (ja) * 2017-01-31 2018-08-09 住友重機械工業株式会社 ターゲット装置
JP2021059755A (ja) * 2019-10-07 2021-04-15 キヤノントッキ株式会社 成膜装置、成膜方法および電子デバイスの製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008021340A3 (en) * 2006-08-17 2008-07-17 Axcelis Tech Inc Workpiece handling scan arm for ion implantation system
CN101517725B (zh) 2006-08-17 2011-09-07 艾克塞利斯科技公司 用于离子注入系统的工件处理扫描臂
WO2018142459A1 (ja) * 2017-01-31 2018-08-09 住友重機械工業株式会社 ターゲット装置
JP2021059755A (ja) * 2019-10-07 2021-04-15 キヤノントッキ株式会社 成膜装置、成膜方法および電子デバイスの製造方法

Also Published As

Publication number Publication date
JPS6259409B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-12-10

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