JPS58193547A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPS58193547A
JPS58193547A JP57075265A JP7526582A JPS58193547A JP S58193547 A JPS58193547 A JP S58193547A JP 57075265 A JP57075265 A JP 57075265A JP 7526582 A JP7526582 A JP 7526582A JP S58193547 A JPS58193547 A JP S58193547A
Authority
JP
Japan
Prior art keywords
pattern
wafer
slit
reticle
projection exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57075265A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0328810B2 (https=
Inventor
Shinji Kuniyoshi
伸治 国吉
Akihiro Takanashi
高梨　明紘
Sumio Hosaka
純男 保坂
Yoshio Kawamura
河村　喜雄
Toshishige Kurosaki
利栄 黒崎
Tsuneo Terasawa
恒男 寺澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57075265A priority Critical patent/JPS58193547A/ja
Priority to DE8383104432T priority patent/DE3373219D1/de
Priority to EP19830104432 priority patent/EP0094041B1/en
Publication of JPS58193547A publication Critical patent/JPS58193547A/ja
Publication of JPH0328810B2 publication Critical patent/JPH0328810B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP57075265A 1982-05-07 1982-05-07 縮小投影露光装置 Granted JPS58193547A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57075265A JPS58193547A (ja) 1982-05-07 1982-05-07 縮小投影露光装置
DE8383104432T DE3373219D1 (en) 1982-05-07 1983-05-05 Reduction projection aligner system
EP19830104432 EP0094041B1 (en) 1982-05-07 1983-05-05 Reduction projection aligner system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57075265A JPS58193547A (ja) 1982-05-07 1982-05-07 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS58193547A true JPS58193547A (ja) 1983-11-11
JPH0328810B2 JPH0328810B2 (https=) 1991-04-22

Family

ID=13571214

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57075265A Granted JPS58193547A (ja) 1982-05-07 1982-05-07 縮小投影露光装置

Country Status (3)

Country Link
EP (1) EP0094041B1 (https=)
JP (1) JPS58193547A (https=)
DE (1) DE3373219D1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5121987A (en) * 1989-03-02 1992-06-16 Honeywell Inc. Method and apparatus for measuring coefficient of thermal expansion
US4989980A (en) * 1989-03-02 1991-02-05 Honeywell Inc. Method and apparatus for measuring coefficient of thermal expansion
EP0474487B1 (en) * 1990-09-07 1997-03-19 Canon Kabushiki Kaisha Method and device for optically detecting position of an article

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3943359A (en) * 1973-06-15 1976-03-09 Hitachi, Ltd. Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
US4172664A (en) * 1977-12-30 1979-10-30 International Business Machines Corporation High precision pattern registration and overlay measurement system and process
JPS55162227A (en) * 1979-06-04 1980-12-17 Hitachi Ltd Microprojection exposure device

Also Published As

Publication number Publication date
DE3373219D1 (en) 1987-10-01
EP0094041A1 (en) 1983-11-16
JPH0328810B2 (https=) 1991-04-22
EP0094041B1 (en) 1987-08-26

Similar Documents

Publication Publication Date Title
JPS5979527A (ja) パタ−ン検出装置
JPH0732109B2 (ja) 光露光方法
JPH10242041A (ja) 位置検出方法及びその装置並びに露光装置
JPS58193547A (ja) 縮小投影露光装置
JPS587823A (ja) アライメント方法およびその装置
JPH0332910B2 (https=)
JP3894505B2 (ja) 位置検出方法、位置検出装置、半導体露光装置および半導体製造方法
JPH0612752B2 (ja) 投影式アライメント方法及びその装置
JP2854448B2 (ja) 光投影露光装置
JPS60163432A (ja) パタ−ン位置検出装置
JPS5913324A (ja) 縮小投影露光装置
JPS60134421A (ja) パタ−ン位置検出装置
JPH0227811B2 (https=)
JPS6018917A (ja) 投影露光装置
KR100221022B1 (ko) 반도체 노광 장치
JP2605266B2 (ja) 露光装置及びパターン露光方法
JPS60180118A (ja) 回折格子による位置合せ装置
JPS60249325A (ja) 投影露光装置
JPH05234845A (ja) 縮小投影露光装置
JPS59161025A (ja) 縮小投影露光装置
JP2699902B2 (ja) 光露光方法
JPS58192323A (ja) パタ−ン検出光学装置
JPS61166027A (ja) 縮小投影露光装置
JPH06310407A (ja) 投影露光装置の焦点合わせ装置
JPH05141926A (ja) 光学的間隙測定装置