DE3373219D1 - Reduction projection aligner system - Google Patents

Reduction projection aligner system

Info

Publication number
DE3373219D1
DE3373219D1 DE8383104432T DE3373219T DE3373219D1 DE 3373219 D1 DE3373219 D1 DE 3373219D1 DE 8383104432 T DE8383104432 T DE 8383104432T DE 3373219 T DE3373219 T DE 3373219T DE 3373219 D1 DE3373219 D1 DE 3373219D1
Authority
DE
Germany
Prior art keywords
reduction projection
projection aligner
aligner system
reduction
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383104432T
Other languages
German (de)
English (en)
Inventor
Shinji Kuniyoshi
Akihiro Takanashi
Sumio Hosaka
Yoshio Kawamura
Toshiei Kurosaki
Tsuneo Terasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE3373219D1 publication Critical patent/DE3373219D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE8383104432T 1982-05-07 1983-05-05 Reduction projection aligner system Expired DE3373219D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57075265A JPS58193547A (ja) 1982-05-07 1982-05-07 縮小投影露光装置

Publications (1)

Publication Number Publication Date
DE3373219D1 true DE3373219D1 (en) 1987-10-01

Family

ID=13571214

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383104432T Expired DE3373219D1 (en) 1982-05-07 1983-05-05 Reduction projection aligner system

Country Status (3)

Country Link
EP (1) EP0094041B1 (https=)
JP (1) JPS58193547A (https=)
DE (1) DE3373219D1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5121987A (en) * 1989-03-02 1992-06-16 Honeywell Inc. Method and apparatus for measuring coefficient of thermal expansion
US4989980A (en) * 1989-03-02 1991-02-05 Honeywell Inc. Method and apparatus for measuring coefficient of thermal expansion
EP0474487B1 (en) * 1990-09-07 1997-03-19 Canon Kabushiki Kaisha Method and device for optically detecting position of an article

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3943359A (en) * 1973-06-15 1976-03-09 Hitachi, Ltd. Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
US4172664A (en) * 1977-12-30 1979-10-30 International Business Machines Corporation High precision pattern registration and overlay measurement system and process
JPS55162227A (en) * 1979-06-04 1980-12-17 Hitachi Ltd Microprojection exposure device

Also Published As

Publication number Publication date
EP0094041A1 (en) 1983-11-16
JPH0328810B2 (https=) 1991-04-22
EP0094041B1 (en) 1987-08-26
JPS58193547A (ja) 1983-11-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee