JPS58189263A - ＳｉＯ↓２膜形成用塗布液 - Google Patents
ＳｉＯ↓２膜形成用塗布液Info
- Publication number
- JPS58189263A JPS58189263A JP7189782A JP7189782A JPS58189263A JP S58189263 A JPS58189263 A JP S58189263A JP 7189782 A JP7189782 A JP 7189782A JP 7189782 A JP7189782 A JP 7189782A JP S58189263 A JPS58189263 A JP S58189263A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- film
- film formation
- water
- coating fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 34
- 239000011248 coating agent Substances 0.000 title claims abstract description 31
- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 7
- 239000012530 fluid Substances 0.000 title abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000007788 liquid Substances 0.000 claims description 9
- 239000003960 organic solvent Substances 0.000 claims description 7
- 150000002148 esters Chemical class 0.000 claims description 6
- 150000003014 phosphoric acid esters Chemical class 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 9
- 239000000758 substrate Substances 0.000 abstract description 9
- 239000011521 glass Substances 0.000 abstract description 8
- 239000002904 solvent Substances 0.000 abstract description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910019142 PO4 Inorganic materials 0.000 abstract description 3
- 238000007645 offset printing Methods 0.000 abstract description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 abstract description 3
- 239000010452 phosphate Substances 0.000 abstract description 3
- 239000004094 surface-active agent Substances 0.000 abstract description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 abstract description 2
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 239000007769 metal material Substances 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 235000019441 ethanol Nutrition 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 5
- 238000001879 gelation Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- -1 hydrogen halides Chemical class 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- UCQFCFPECQILOL-UHFFFAOYSA-N diethyl hydrogen phosphate Chemical compound CCOP(O)(=O)OCC UCQFCFPECQILOL-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- SWQWONXMUXCEDF-UHFFFAOYSA-N tetrakis(2-ethylbutyl) silicate Chemical compound CCC(CC)CO[Si](OCC(CC)CC)(OCC(CC)CC)OCC(CC)CC SWQWONXMUXCEDF-UHFFFAOYSA-N 0.000 description 1
- JSECNWXDEZOMPD-UHFFFAOYSA-N tetrakis(2-methoxyethyl) silicate Chemical compound COCCO[Si](OCCOC)(OCCOC)OCCOC JSECNWXDEZOMPD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7189782A JPS58189263A (ja) | 1982-04-28 | 1982-04-28 | ＳｉＯ↓２膜形成用塗布液 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7189782A JPS58189263A (ja) | 1982-04-28 | 1982-04-28 | ＳｉＯ↓２膜形成用塗布液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58189263A true JPS58189263A (ja) | 1983-11-04 |
| JPS6358867B2 JPS6358867B2 (enrdf_load_stackoverflow) | 1988-11-17 |
Family
ID=13473778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7189782A Granted JPS58189263A (ja) | 1982-04-28 | 1982-04-28 | ＳｉＯ↓２膜形成用塗布液 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58189263A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60186570A (ja) * | 1984-03-07 | 1985-09-24 | Nippon Soda Co Ltd | コ−テイング用組成物 |
| WO1993013393A1 (en) * | 1991-12-26 | 1993-07-08 | Elf Atochem North America, Inc. | Coating composition for glass |
| EP0736488A4 (en) * | 1993-12-21 | 1996-12-18 | Mitsubishi Chem Ind | ULTRAFINE REACTIVE SILICONE PARTICLES, THESE SUSPENSION AND COMPOSITION FOR HARD COATINGS |
| US6030445A (en) * | 1997-05-15 | 2000-02-29 | Advanced Delivery & Chemical Systems, Ltd. | Multi-component mixtures for manufacturing of in situ doped borophosphosilicate |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5251868A (en) * | 1975-10-22 | 1977-04-26 | Seiko Epson Corp | Semiconductor integrated circuit |
| JPS5534276A (en) * | 1978-09-04 | 1980-03-10 | Tokyo Denshi Kagaku Kabushiki | Preparation of coating liquid for silica-based film formation |
| JPS5536216A (en) * | 1978-09-05 | 1980-03-13 | Mitsubishi Gas Chem Co Inc | Curing of organoalkoxysilane compound |
| JPS5634234A (en) * | 1979-08-30 | 1981-04-06 | Toshiba Corp | Buffer circuit |
| JPS5638472A (en) * | 1979-09-06 | 1981-04-13 | Tokyo Denshi Kagaku Kabushiki | Formation of silica coating |
| JPS5638362A (en) * | 1979-09-06 | 1981-04-13 | Tokyo Denshi Kagaku Kabushiki | Preparation of coating solution for formation of high- purity silica film |
-
1982
- 1982-04-28 JP JP7189782A patent/JPS58189263A/ja active Granted
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5251868A (en) * | 1975-10-22 | 1977-04-26 | Seiko Epson Corp | Semiconductor integrated circuit |
| JPS5534276A (en) * | 1978-09-04 | 1980-03-10 | Tokyo Denshi Kagaku Kabushiki | Preparation of coating liquid for silica-based film formation |
| JPS5536216A (en) * | 1978-09-05 | 1980-03-13 | Mitsubishi Gas Chem Co Inc | Curing of organoalkoxysilane compound |
| JPS5634234A (en) * | 1979-08-30 | 1981-04-06 | Toshiba Corp | Buffer circuit |
| JPS5638472A (en) * | 1979-09-06 | 1981-04-13 | Tokyo Denshi Kagaku Kabushiki | Formation of silica coating |
| JPS5638362A (en) * | 1979-09-06 | 1981-04-13 | Tokyo Denshi Kagaku Kabushiki | Preparation of coating solution for formation of high- purity silica film |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60186570A (ja) * | 1984-03-07 | 1985-09-24 | Nippon Soda Co Ltd | コ−テイング用組成物 |
| WO1993013393A1 (en) * | 1991-12-26 | 1993-07-08 | Elf Atochem North America, Inc. | Coating composition for glass |
| US5401305A (en) * | 1991-12-26 | 1995-03-28 | Elf Atochem North America, Inc. | Coating composition for glass |
| CN1041814C (zh) * | 1991-12-26 | 1999-01-27 | 北美埃尔夫爱托化学股份有限公司 | 涂层制品 |
| CN1041815C (zh) * | 1991-12-26 | 1999-01-27 | 北美埃尔夫爱托化学股份有限公司 | 玻璃涂层组合物 |
| CN1043988C (zh) * | 1991-12-26 | 1999-07-07 | 北美埃尔夫爱托化学股份有限公司 | 涂覆玻璃基物的方法 |
| USRE41799E1 (en) * | 1991-12-26 | 2010-10-05 | Arkema Inc. | Coating composition for glass |
| EP0736488A4 (en) * | 1993-12-21 | 1996-12-18 | Mitsubishi Chem Ind | ULTRAFINE REACTIVE SILICONE PARTICLES, THESE SUSPENSION AND COMPOSITION FOR HARD COATINGS |
| EP1016625A1 (en) * | 1993-12-21 | 2000-07-05 | Mitsubishi Chemical Corporation | Suspension containing ultrafine reactive silica particles |
| US6030445A (en) * | 1997-05-15 | 2000-02-29 | Advanced Delivery & Chemical Systems, Ltd. | Multi-component mixtures for manufacturing of in situ doped borophosphosilicate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6358867B2 (enrdf_load_stackoverflow) | 1988-11-17 |
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