JPS58173741A - フオトレリ−フの形成法 - Google Patents

フオトレリ−フの形成法

Info

Publication number
JPS58173741A
JPS58173741A JP5762882A JP5762882A JPS58173741A JP S58173741 A JPS58173741 A JP S58173741A JP 5762882 A JP5762882 A JP 5762882A JP 5762882 A JP5762882 A JP 5762882A JP S58173741 A JPS58173741 A JP S58173741A
Authority
JP
Japan
Prior art keywords
polyvinyl alcohol
film
photorelief
resin
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5762882A
Other languages
English (en)
Japanese (ja)
Other versions
JPH023491B2 (enExample
Inventor
Kiichi Maruhashi
丸橋 基一
Yusuke Tsumura
津村 雄右
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP5762882A priority Critical patent/JPS58173741A/ja
Publication of JPS58173741A publication Critical patent/JPS58173741A/ja
Publication of JPH023491B2 publication Critical patent/JPH023491B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5762882A 1982-04-06 1982-04-06 フオトレリ−フの形成法 Granted JPS58173741A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5762882A JPS58173741A (ja) 1982-04-06 1982-04-06 フオトレリ−フの形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5762882A JPS58173741A (ja) 1982-04-06 1982-04-06 フオトレリ−フの形成法

Publications (2)

Publication Number Publication Date
JPS58173741A true JPS58173741A (ja) 1983-10-12
JPH023491B2 JPH023491B2 (enExample) 1990-01-23

Family

ID=13061145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5762882A Granted JPS58173741A (ja) 1982-04-06 1982-04-06 フオトレリ−フの形成法

Country Status (1)

Country Link
JP (1) JPS58173741A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172027A (ja) * 1986-01-24 1987-07-29 Nippon Synthetic Chem Ind Co Ltd:The アセト酢酸エステル基含有水溶性高分子の耐水化方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (enExample) * 1974-01-10 1975-08-12
JPS51143409A (en) * 1975-06-04 1976-12-09 Fuji Photo Film Co Ltd Method of making lithographic press plate
JPS526205A (en) * 1975-06-30 1977-01-18 Hoechst Ag Method of producing lithographic plate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (enExample) * 1974-01-10 1975-08-12
JPS51143409A (en) * 1975-06-04 1976-12-09 Fuji Photo Film Co Ltd Method of making lithographic press plate
JPS526205A (en) * 1975-06-30 1977-01-18 Hoechst Ag Method of producing lithographic plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172027A (ja) * 1986-01-24 1987-07-29 Nippon Synthetic Chem Ind Co Ltd:The アセト酢酸エステル基含有水溶性高分子の耐水化方法

Also Published As

Publication number Publication date
JPH023491B2 (enExample) 1990-01-23

Similar Documents

Publication Publication Date Title
JPH0296170A (ja) 着色写真像の形成方法
JPH029480A (ja) 光硬化被膜を形成する方法
US4001015A (en) Method for the production of printing plates using photosensitive compositions
US3740224A (en) Photosensitive compositions for the production of printing plates
US3898087A (en) Photopolymerizable compositions containing aminimides
DE1905012C3 (de) Photopolymerisierbares Aufzeichnungsmaterial zum Herstellen von Reliefs
JPS62141005A (ja) イオン系重合体
US6333137B1 (en) Screen printing stencil
JPS58173741A (ja) フオトレリ−フの形成法
US4097283A (en) Water-soluble composition admixture of copolymer having ethylenic unsaturation in side chain and anthraquinone photosensitizer
JPH0239784B2 (ja) Kankoseijushisoseibutsu
JP2002023349A (ja) 感光性樹脂凸版材
US4933260A (en) Water based photopolymerizable resin composition
JPH023492B2 (enExample)
JPH04283749A (ja) 感光性樹脂組成物
JP3565625B2 (ja) 感光性樹脂組成物
JPS58137834A (ja) 感光性組成物
JP2900075B2 (ja) 感光性樹脂組成物
JP2540577B2 (ja) 感光性樹脂板の製法
DE2166551C3 (de) Copolymerisate mit äthylenisch ungesättigten Seitenketten und deren Verwendung
JP2873706B2 (ja) 光硬化性樹脂組成物
JP3627394B2 (ja) 感光性樹脂凸版材
DE2049621A1 (de) Photosensible Gemische zur Herstellung von Druckplatten
JPS6016986B2 (ja) 感光性樹脂組成物
JPS58100128A (ja) 液中後露光方法