JPH023491B2 - - Google Patents

Info

Publication number
JPH023491B2
JPH023491B2 JP57057628A JP5762882A JPH023491B2 JP H023491 B2 JPH023491 B2 JP H023491B2 JP 57057628 A JP57057628 A JP 57057628A JP 5762882 A JP5762882 A JP 5762882A JP H023491 B2 JPH023491 B2 JP H023491B2
Authority
JP
Japan
Prior art keywords
polyvinyl alcohol
water
photorelief
ammonium
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57057628A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58173741A (ja
Inventor
Kiichi Maruhashi
Jusuke Tsumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP5762882A priority Critical patent/JPS58173741A/ja
Publication of JPS58173741A publication Critical patent/JPS58173741A/ja
Publication of JPH023491B2 publication Critical patent/JPH023491B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5762882A 1982-04-06 1982-04-06 フオトレリ−フの形成法 Granted JPS58173741A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5762882A JPS58173741A (ja) 1982-04-06 1982-04-06 フオトレリ−フの形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5762882A JPS58173741A (ja) 1982-04-06 1982-04-06 フオトレリ−フの形成法

Publications (2)

Publication Number Publication Date
JPS58173741A JPS58173741A (ja) 1983-10-12
JPH023491B2 true JPH023491B2 (enExample) 1990-01-23

Family

ID=13061145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5762882A Granted JPS58173741A (ja) 1982-04-06 1982-04-06 フオトレリ−フの形成法

Country Status (1)

Country Link
JP (1) JPS58173741A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653817B2 (ja) * 1986-01-24 1994-07-20 日本合成化学工業株式会社 アセト酢酸エステル基含有水溶性高分子の耐水化方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (enExample) * 1974-01-10 1975-08-12
JPS51143409A (en) * 1975-06-04 1976-12-09 Fuji Photo Film Co Ltd Method of making lithographic press plate
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme

Also Published As

Publication number Publication date
JPS58173741A (ja) 1983-10-12

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