JPS58173741A - Formation of photorelief - Google Patents

Formation of photorelief

Info

Publication number
JPS58173741A
JPS58173741A JP5762882A JP5762882A JPS58173741A JP S58173741 A JPS58173741 A JP S58173741A JP 5762882 A JP5762882 A JP 5762882A JP 5762882 A JP5762882 A JP 5762882A JP S58173741 A JPS58173741 A JP S58173741A
Authority
JP
Japan
Prior art keywords
polyvinyl alcohol
film
photorelief
resin
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5762882A
Other languages
Japanese (ja)
Other versions
JPH023491B2 (en
Inventor
Kiichi Maruhashi
丸橋 基一
Yusuke Tsumura
津村 雄右
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Synthetic Chemical Industry Co Ltd
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP5762882A priority Critical patent/JPS58173741A/en
Publication of JPS58173741A publication Critical patent/JPS58173741A/en
Publication of JPH023491B2 publication Critical patent/JPH023491B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain a photorelief while improving the work environment, the danger of a fire and the cost by forming a film consisting of specified polyvinyl alcohol (PVA) resin and a photoreaction accelerator, irradiating the film with ultraviolet rays through a negative image, and wshing the film. CONSTITUTION:A film made of a mixture of polyvinyl alcohol resin contg. acetoacetic ester groups or allyl groups with a photoreaction accelerator is formed on a substrate. The film is irradiated with ulraviolet rays through a negative image, and the unexposed part is removed by washing. The substrate having the resulting image may be subjected to hardening treatment with metallic salt or ammonium salt to form a photorelief image with much more superior resolving power. Said PVA resin contg. acetoacetic ester groups is preferably obtd. by the addition reaction of diketene to PVA resin or the transesterification of PVA resin with acetoacetic ester.

Description

【発明の詳細な説明】 ポリビニルアルコールのケイ皮酸エステルが感光性を有
することは周知であるが、該樹脂は水に不溶性である丸
めこれに光照射した後床感光部分ts出するにはベンゼ
ン、トルエン、クロルベンゼン、トリクレンなどの有機
溶剤の使用が不可欠となる。しかしかかる有機溶剤の使
用は作業環境の悪化、火災の危険、コストのアップ勢の
点で実用上問題がある。
DETAILED DESCRIPTION OF THE INVENTION It is well known that cinnamate ester of polyvinyl alcohol has photosensitivity, but the resin is insoluble in water. , the use of organic solvents such as toluene, chlorobenzene, and trichlene is essential. However, the use of such organic solvents poses practical problems in terms of deterioration of the working environment, risk of fire, and increased costs.

しかるに本発明者らは種々検討を重ねた結果、アセト酢
酸エステル基又はアリル基を含有するポリビニルアルコ
ール系樹脂は紫外線照射をしなければ水溶性であり、反
面該樹脂膜に紫外線照射すると照射部分のみが水不溶性
になるという性質を有していること、そこでかかる性質
を利用して該樹脂のIjllNを基材上に形成させつい
でこれに陰画向を通して紫外線照射すると極めて感度よ
く感光して感光部分が水不溶性にな抄、一方未感光部分
は水溶性を保つため水洗により容易に除去することがで
きるのでフォトレリーフの形成の目的に極めて好適であ
ること、更に上記で得られた画像形成基材を金楓塩ある
いはアンモニクム塩で硬膜魁理すると一段と解像力のす
ぐれ九フォトレリーフ像が形成されるという顕著な効果
を奏し得ることを見出し、本発明を完成するに至っ九。
However, as a result of various studies, the present inventors found that polyvinyl alcohol resin containing an acetoacetate group or an allyl group is water-soluble unless it is irradiated with ultraviolet rays, but on the other hand, when the resin film is irradiated with ultraviolet rays, only the irradiated portion The resin has the property of being water-insoluble, and when this property is used to form the resin IjllN on a substrate and irradiate it with ultraviolet rays through a negative direction, it becomes extremely sensitive and the photosensitive area is exposed. The image forming base material obtained above is highly suitable for the purpose of forming a photorelief because it is water-insoluble, while the unexposed part remains water-soluble and can be easily removed by washing with water. It was discovered that dura mater treatment with gold maple salt or ammonium salt can produce a remarkable effect in that a photorelief image with even better resolution can be formed, leading to the completion of the present invention.

本発明においては有機溶剤を用いず単に水を使用するこ
とによって鮮明なフォトレジスト像を形成することがで
きるので、有機溶剤便用に伴なう作業環境の悪化、火災
の危険、コストアップなどO問題点は全て解決すること
ができ、実用化にあ九り極めて有利である。
In the present invention, a clear photoresist image can be formed simply by using water without using an organic solvent. All problems can be solved, and it is extremely advantageous for practical application.

又、従来フォトレリーフの形成には多くの場合光重合性
の単量体が併用されるが、本発明のアセトアセチル基又
はアリル基含有ポリビニルアルコール系樹脂はそれ自身
が光で架橋をおこし強固なレリーフを形成することが出
来る点に大きな特色を有している。従って本発明におい
て社光重合性の単量体の併用は必要としない。
In addition, conventionally, photopolymerizable monomers are often used together to form photoreliefs, but the acetoacetyl group- or allyl group-containing polyvinyl alcohol resin of the present invention itself crosslinks with light and is strong. A major feature is that it can form relief. Therefore, in the present invention, there is no need to use a Shako polymerizable monomer in combination.

本発明におけるアセト酢酸エステル基を有するポリビニ
ルアルコール系樹脂は、任意の方法で製造され、その製
法に特に制限はないが、好適にはポリビニルアルコール
系樹脂にジケテンを付加反応するか、アセト酢酸エステ
ルをエステル交換反応することによって取得される。同
様にアリル基含有ポリビニルアルコール系樹脂の好適な
製造法はアリルクロライド、アリルクロライド等のアリ
ル化合物とポリビニルアルコール系樹脂を反応させる方
法である。基体となるポリビニルアルコール系樹脂とし
ては、ポリ酢酸ビニルなどポリビニルエステルの部分又
は完全ケン化物のほか、酢酸ビニルを主体とし、これと
他の共重合可能なモノマー、たとえば不飽和カルボン酸
又はその部分又は完全エステル・塩・無水物・アミド・
ニトリル、不飽和スルホン酸又はその塩、炭素&2〜′
50のα−オレフィン、ビニルエーテルなどとの共重合
体をケン化した「共重合変性」ポリビニルアルコールや
ポリビニルアルコールをアセタール化、フレタン化、エ
ーテル化、グラフト化、リン酸エステル化などした「後
変性」ポリビニルアルコールも用いうる。
The polyvinyl alcohol resin having an acetoacetate group in the present invention can be produced by any method, and there are no particular restrictions on the production method, but it is preferable to add diketene to the polyvinyl alcohol resin or add acetoacetate to the polyvinyl alcohol resin. Obtained by transesterification. Similarly, a preferred method for producing an allyl group-containing polyvinyl alcohol resin is a method in which an allyl compound such as allyl chloride or allyl chloride is reacted with a polyvinyl alcohol resin. The base polyvinyl alcohol resin may include a partially saponified polyvinyl ester such as polyvinyl acetate, or a monomer mainly composed of vinyl acetate and copolymerizable with it, such as an unsaturated carboxylic acid or a portion thereof, or Complete ester, salt, anhydride, amide,
Nitrile, unsaturated sulfonic acid or its salt, carbon &2~'
"Copolymerization modification" in which a copolymer with 50 α-olefins, vinyl ethers, etc. is saponified. "Post-modification" in which polyvinyl alcohol or polyvinyl alcohol is acetalized, phretanized, etherified, grafted, or phosphoric acid esterified. Polyvinyl alcohol can also be used.

上記樹脂中のアセト酢酸ステル基又はアリル基の含量は
、0.05モル哄以上で水溶性を有する範囲内の最大限
まで可能であるが、通常は0.1〜35毫ル哄、なかん
ずく0.2〜60毫ル哄の範囲から選ぶことが多い。ア
セト酢酸エステル基又はアリル基の含量が余秒に低いと
紫外線照射による水不嬉化が充分でなく満足すべきフォ
トレリーフ像が得られない。必要以上のアセト酢酸エス
テル基又はアリル基の導入は水不溶性となるので本発明
の目的に#′i、不適当である。又、平均重合度は20
0〜3000好ましくは10〜2000、茂存酢駿基F
i35モル哄以下好ましくは30モル哄以下の範囲から
選ぶのが望ましい。
The content of the acetoacetate ster group or allyl group in the resin may be 0.05 mole or more, up to the maximum within the range of water solubility, but it is usually 0.1 to 35 mole, especially 0.05 mole or more. It is often selected from the range of .2 to 60 beats. If the content of the acetoacetate group or allyl group is too low, water discoloration by ultraviolet irradiation will not be sufficient and a satisfactory photorelief image will not be obtained. Introduction of more acetoacetate groups or allyl groups than necessary is unsuitable for the purpose of the present invention, since it becomes water-insoluble. Also, the average degree of polymerization is 20
0-3000 preferably 10-2000
It is desirable to select from a range of i35 mol or less, preferably 30 mol or less.

かかるアセト酢酸エステル基又はアリル基含有ポリビニ
ルアルコール系樹脂に#i光反応促進剤が併用される。
#i photoreaction accelerator is used in combination with such acetoacetate group- or allyl group-containing polyvinyl alcohol resin.

光反応促進剤としてはベンゾインメチルエーテル、ペン
ツインエチルエーテル、ペンツインイソプロビルエーテ
ル等のベンゾインアルキルエーテル、ジブチルスルフィ
ド、ベンジルスルフィド、デシルフェニルスルフィドな
どの有機イオク化合物、ジアゾニウム塩、テトラゾニク
ム塩或いはこれらと塩化亜鉛との複合塩又はその縮合物
、アゾビスイソブチロニトリル、メチレンブルーなどの
染料又はこれとp−)ルエンスルホネートイオンなどと
の組合せ、有機過酸化物、過酸化水素、ピリリウム塩又
はチアビリリクム塩、重クロム酸アンモニクム、アヤト
フェノン、ベンゾフェノン、ベンジル、フェナントレン
、チオキサントン、ジクロルプロピルフェニルケトン、
アントラキノン、2−クロロアントラキノン、2−ブロ
モアントラキノン、アントラキノンβ−スルホン酸ソー
ダ、1.5−シニ) o7ントラキノン、1,2−ペン
サントラキノン、7エナントレンキノン、5−ベンゾイ
ルアセナフテン、5−ニトロアセナフテン、1.4=ナ
フトキノン、1,8−7タロイルナフタリン、2−ニト
ロフルオレン、p−ニトロアニリン1、ビクラミド、ベ
ンズアルデヒドなどがあげられ、これらFi1種又Fi
2種以上を組合せて用いられる。
Examples of photoreaction accelerators include benzoin alkyl ethers such as benzoin methyl ether, pentuin ethyl ether, and pentuin isopropyl ether, organic iodine compounds such as dibutyl sulfide, benzyl sulfide, and decylphenyl sulfide, diazonium salts, tetrazonicum salts, or salts thereof. Complex salts with zinc or condensates thereof, azobisisobutyronitrile, dyes such as methylene blue, or combinations thereof with p-)luenesulfonate ions, organic peroxides, hydrogen peroxide, pyrylium salts or thiavirillicum salts, Ammonicum dichromate, ayatophenone, benzophenone, benzyl, phenanthrene, thioxanthone, dichloropropylphenyl ketone,
Anthraquinone, 2-chloroanthraquinone, 2-bromoanthraquinone, anthraquinone β-sulfonic acid sodium, 1,5-cyni) o7anthraquinone, 1,2-pensanthraquinone, 7-enanthrenequinone, 5-benzoylacenaphthene, 5-nitro Examples include acenaphthene, 1.4=naphthoquinone, 1,8-7 taloylnaphthalene, 2-nitrofluorene, p-nitroaniline 1, biclamide, benzaldehyde, etc.
Two or more types are used in combination.

父上に列挙したものに限られず、光による反応、架橋、
を促進するものはいずれも使用可能である。
Not limited to those listed above, reactions by light, cross-linking,
Anything that promotes this can be used.

これらの中ではベンゾインアルキルエーテル、アントラ
キノンβ−スルホン駿ソーダが価格の点、感度の点で特
に良い結果を与える。
Among these, benzoin alkyl ether and anthraquinone β-sulfone soda give particularly good results in terms of cost and sensitivity.

本発明の方法を実施するKあえうては、上記の如きアセ
ト酢酸エステル基又はアリル基含有ポリビニルアルコー
ル系樹脂と光反応促進剤との混合物を水溶液状−で基材
に塗布し、乾燥するか予めアセト酢酸エステル基又はア
リル基含有ポリビニルアルコール系樹脂と光反応促進剤
と01!合液から任意の方法でフィルムを製造し、それ
を基材に接着させる。この際多少の有機溶剤を含んでい
ても差支えない。又、金属塩、アルデヒド、アミン顛等
、公知の耐水化剤を併用して亀差支えない。
To carry out the method of the present invention, a mixture of the acetoacetate group-containing or allyl group-containing polyvinyl alcohol resin and a photoreaction accelerator as described above is applied to a substrate in the form of an aqueous solution and dried. 01! in advance with an acetoacetate group- or allyl group-containing polyvinyl alcohol resin and a photoreaction accelerator! A film is produced from the mixture by any method and is adhered to a substrate. At this time, there is no problem even if some organic solvent is included. In addition, there is no problem in using a known water-resistant agent such as a metal salt, aldehyde, or amine film.

水溶液中の樹脂濃度社基材に塗布するときの作業性の点
や得られるフォトレリーフ像の用途の点などから通常は
1〜20重量嘔程度の範囲から選ばれる。皮膜の厚さは
1〜1011程1−が適当である。
The resin concentration in the aqueous solution is usually selected from the range of 1 to 20% by weight in view of workability when coating on a base material and the use of the resulting photorelief image. The appropriate thickness of the film is 1-1011.

基材としては通常亜鉛板、アルミニラム板、マグネシウ
ム板、鋼板、銅板などが使用される。
As the base material, zinc plates, aluminum plates, magnesium plates, steel plates, copper plates, etc. are usually used.

かくして得られた塗布板を用いて、これを随−肉を通し
て紫外線を照射することにより感光部分は水不溶性にな
シ、未感光部分は水溶性を保つので、これを水洗すれば
未感光部分のみが除去され基材の上にフォトレリーフ像
が形成される。光源としては低圧水銀灯、高圧水銀灯、
超高圧水銀灯、カーボンアーク灯、クセノン灯等が用い
られる。
Using the coated plate obtained in this way, by irradiating ultraviolet rays through the flesh of the plate, the exposed areas become water-insoluble and the unexposed areas remain water-soluble, so if you wash it with water, only the unexposed areas will be removed. is removed and a photorelief image is formed on the substrate. Light sources include low-pressure mercury lamps, high-pressure mercury lamps,
Ultra-high pressure mercury lamps, carbon arc lamps, xenon lamps, etc. are used.

凸版印刷、凹版印刷、オフセット印刷の目的にはこれを
そのまま版として用いればよい。
This plate may be used as it is for letterpress printing, intaglio printing, and offset printing.

なお基材として前記の如き金属板に限らず、九とえば上
記ポリビニルアルコール誘導体皮膜を木綿、レーヨン、
羊毛、ポリエステル系・ポリアミド系・ポリアクリロニ
トリル系・ポリビニルアルコール基合成繊維等からなる
織布、・不縁布等の表向に形成せしめ、ついで陰画面を
通して紫外線を照射して未感光部分を水洗除去し、つい
で染色することにより生地に模様を付する如くすること
もできる。
Note that the base material is not limited to the above-mentioned metal plate; for example, the above-mentioned polyvinyl alcohol derivative film can be used on cotton, rayon,
It is formed on the surface of wool, woven fabrics made of polyester-based, polyamide-based, polyacrylonitrile-based, polyvinyl alcohol-based synthetic fibers, etc., non-woven fabrics, etc., and then ultraviolet rays are irradiated through a negative screen and the unexposed areas are washed away with water. However, it is also possible to add a pattern to the fabric by subsequently dyeing it.

そのほか基材に紙、合成樹脂シート等を用いることもあ
る。
In addition, paper, synthetic resin sheets, etc. may be used as the base material.

かくしてフォトレリーフ像が形成された基材はそのまま
で充分実用に供し得るが、該基材をIK金属塩あるいは
アンモニウム塩で処理するこ七によって一段とすぐれ九
性質の像版が製造出来る。
Although the substrate on which the photorelief image has been formed can be put to practical use as it is, an image plate with even better properties can be produced by treating the substrate with an IK metal salt or ammonium salt.

即ちかかる処理によって感光部分は一段と硬化が強化さ
れ印刷時の摩耗性等の心配が全くなくなり非常に#明な
自侭を与えることが出来るのである。
That is, this treatment further strengthens the hardening of the photosensitive area, eliminates any concerns about abrasion during printing, and provides a very clear image.

かかる硬膜処理はポリビニルアルコール系のS覚剤を用
いる場合、例えば無水クロム酸を用いて通常行なわれて
いることであるが、アセト酢酸エステル基又はアリル基
含有ポリビニルアルコール系樹脂ではその使用量を未変
性のポリビニルアルコールに比べて著しく軽減させるこ
とが可能で69、本発明で使用するアセト酢酸エステル
基又はアリル基含有ポリビニルアルコール系樹脂の特徴
点の一つである。
When using polyvinyl alcohol-based S stimulants, such hardening treatment is usually carried out using, for example, chromic anhydride, but when using polyvinyl alcohol-based resins containing acetoacetate groups or allyl groups, the amount used is This can be significantly reduced compared to unmodified polyvinyl alcohol69, which is one of the characteristics of the acetoacetate group- or allyl group-containing polyvinyl alcohol resin used in the present invention.

金属塩として代表的なものを例示すれば、アルミニタム
、象、銅、亜鉛、スズ、チタン、ニッケル、アンチモン
、マグネシクム、クロム等の多価金属の塩化物、臭化物
、硝酸塩、硫酸塩、酢酸塩、等の塩であや、具体的には
塩化第二銅、塩化アルミニタム、塩化第二鉄、塩化第二
スズ、塩化亜鉛、塩化ニッケル、塩化マグネシクム、硫
酸アルミニウム、酢酸銅、酢酸クロム等が挙げられる。
Representative examples of metal salts include chlorides, bromides, nitrates, sulfates, acetates of polyvalent metals such as aluminum, copper, zinc, tin, titanium, nickel, antimony, magnesium, and chromium. Specific examples include cupric chloride, aluminum chloride, ferric chloride, tin chloride, zinc chloride, nickel chloride, magnesium chloride, aluminum sulfate, copper acetate, chromium acetate, and the like.

ただし、これらに限定されるものではない。特に好まし
い塩類は塩化ニッケル、塩化マグネシクム、塩化第二鉄
等である。
However, it is not limited to these. Particularly preferred salts are nickel chloride, magnesium chloride, ferric chloride, and the like.

次にアンモニウム塩としては塩化アンモニクム、硫酸ア
ンモニクム、硝酸アンモニクム、重クロム酸アンモニク
ム等の鉱酸のアンモニウム塩や、酢峻アンモニクム、フ
ロピオン酸アンモニクム等の有機酸のアンモニウム塩が
あけられる。これの金属塩、アンモニウム塩は単独又は
併用して使用可能である。
Next, as ammonium salts, ammonium salts of mineral acids such as ammonicum chloride, ammonicum sulfate, ammonicum nitrate, and ammonium dichromate, and ammonium salts of organic acids such as ammonium acetate and ammonium fropionate are used. These metal salts and ammonium salts can be used alone or in combination.

硬膜処理は前記の如くして得られ九基材に、金属塩、ア
ンモニクム塩溶液を噴震、塗布、浸漬等の方法により適
宜処理を行ない、つづいて乾燥、必要であれば熱fl&
坪を行うことによって実施される。
For hardening, the base material obtained as described above is treated with a metal salt or ammonium salt solution by squirting, coating, dipping, etc., followed by drying, and heat treatment if necessary.
It is carried out by doing tsubo.

以下、実例を挙げて本発明の方法を更に具体的に説明す
る。部又Fi%は特にことわりのない限り重量基準であ
る。
Hereinafter, the method of the present invention will be explained in more detail by giving examples. Parts and Fi% are based on weight unless otherwise specified.

実施例1 アセト酢酸エステル基含蓋25モル哄、残存酢酸基1モ
ルチ、平均重合度500のア−1’)酢酸エステル基含
有ポリビニルアルコールの15%水溶液を調製し、更に
これKベンゼンジアゾニクムクロライド5部を混合した
Example 1 A 15% aqueous solution of acetoacetate group-containing polyvinyl alcohol containing 25 moles of acetoacetate groups, 1 mole of remaining acetate groups, and an average degree of polymerization of 500 was prepared, and this was further added to Kbenzenediasonicum. 5 parts of chloride were mixed.

該水溶液を亜鉛板上に回転塗布器を用いて均一に塗布、
乾燥して厚さ10声の皮膜を作った後、線画ネガチグを
密着させて15−の距離に保った400W低犀水銀灯を
用いて3分間紫外線照射し、ついで水洗して亜鉛板上に
フォトレリーフ像を形成せしめ良好な印刷版が得られた
。鎖板を用いて印刷したときの分解能は1インチ当りの
画線数が180であっ九。尚、上記の15%水溶液を調
製し、該水溶液をガラス板上に塗布、乾燥して厚さ40
μの皮膜を作り、ついでaoow低圧水銀灯を用いて光
源の膜との開の距離を15amに保って3分間紫外線を
照射し、その後充分に水洗を行なった。このときの感光
度を残膜収率の相対値及びイーストマン・コダック社製
25段階グレースケールで示すと前者が170%、後者
が20であう九。
Apply the aqueous solution uniformly onto a zinc plate using a rotating applicator,
After drying to form a film with a thickness of 10 tones, the line drawing negative was placed in close contact with the film and exposed to ultraviolet light for 3 minutes using a 400W low-temperature mercury lamp kept at a distance of 15 mm, then washed with water and printed as a photorelief on a zinc plate. An image was formed and a good printing plate was obtained. The resolution when printing using a chain plate is 180 lines per inch. The above 15% aqueous solution was prepared, and the aqueous solution was applied onto a glass plate and dried to a thickness of 40%.
A .mu. film was formed, and then ultraviolet rays were irradiated for 3 minutes using an AOOW low-pressure mercury lamp while keeping the distance between the light source and the film at 15 am, and then thoroughly washed with water. When the photosensitivity at this time is expressed as a relative value of residual film yield and a 25-step gray scale manufactured by Eastman Kodak, the former is 170% and the latter is 20.

実施例2 アヤト酢酸エステル基台ji13モルチ、残存酢酸基5
モ火哄、平均重合度1100のアセト酢酸エステル基含
有ポリビニルアルコールの*0哄水溶液を調製し、更に
これK 4.4’−ジアジドスチルベン−2,2′−ジ
スルホン酸ソーダ5部を混合した。
Example 2 Ayato acetate base ji13 morti, residual acetate group 5
An aqueous solution of polyvinyl alcohol containing acetoacetate groups with an average degree of polymerization of 1100 was prepared, and 5 parts of sodium 4.4'-diazidostilbene-2,2'-disulfonic acid was further mixed therein. .

該水溶液を亜鉛板上に回転塗布器を用いて均一に塗布、
乾燥して厚さ10pのt!l!lIを作った後、線画ネ
ガチグを密着させて15−の距離に保った400W低圧
水銀灯を用いて3分間紫外線照射し、ついで水洗して亜
鉛板上にフォトレリーフ像を形成せしめた。2次に得ら
れた画像板を約60秒間10哄硫酸アルミニクム水溶液
に浸漬したのち、バーニングして良好な印刷版が得られ
九。鎖板を用いて印刷した時の分解能は1インチ当りの
画線数は160であった。尚、実施例1と同一条件下で
測定した相対残膜収率は95嘔、ブレニスクールは19
であっ九。
Apply the aqueous solution uniformly onto a zinc plate using a rotating applicator,
Dry and 10p thick! l! After making the 1I, a line drawing negative was brought into close contact with the film and irradiated with ultraviolet rays for 3 minutes using a 400 W low pressure mercury lamp kept at a distance of 15 mm, and then washed with water to form a photorelief image on the zinc plate. Second, the resulting image plate was immersed in a 10% aluminum sulfate aqueous solution for about 60 seconds, and then burned to obtain a good printing plate. The resolution when printing using the chain plate was 160 lines per inch. In addition, the relative residual film yield measured under the same conditions as in Example 1 was 95 mm, and that of Brennis School was 19 mm.
Deah nine.

実施例6〜6 第1表に示す如き条件下で実施例2.に準じて実験を行
った@その結果を第1表に示す。
Examples 6-6 Example 2 under the conditions shown in Table 1. An experiment was conducted in accordance with @The results are shown in Table 1.

第     1      表 実施例7 アセト酢酸エステル基含有ポリビニルアルコール系樹脂
に代えてアリル基含有メリビニルアルコール糸樹脂(変
性量13モルチ、筏存酢駿基5モル、平均重合度110
0)を用いて実施例2と同一の方法を行った〇 画線数160、相対残膜収率95S1グレースケール1
8であり九。
Table 1 Example 7 In place of the acetoacetate group-containing polyvinyl alcohol resin, allyl group-containing melivinyl alcohol thread resin (denaturation amount 13 mol, presence of vinegar group 5 mol, average degree of polymerization 110)
The same method as in Example 2 was carried out using 0) 〇 Number of strokes 160, relative residual film yield 95 S1 gray scale 1
8 and 9.

Claims (1)

【特許請求の範囲】[Claims] 1.1七ト酢酸エステル基又はアリル基含有ポリビニル
アルコール系樹脂と光反応促進剤との混合物からなる皮
膜を基材上に形成せしめ、険−面を通して紫外#l@射
し、次いで未感光部分を水洗除去することを特徴とする
フォトレリーフの形成法。 2ア七ト酢酸エステル基又はアリル基含有ポリビニルア
ルコール系樹脂と光反応促進剤七の混合物からなる皮膜
を基材上に形成せしめ、陰−面を通して紫外線照射し、
次いで未感光部分を水洗除去した後、金属塩又はアンモ
ニウム塩で硬膜処理を行なうことを特徴とするフォトレ
リーフの形成法。
1.1 A film made of a mixture of a polyvinyl alcohol resin containing a heptoacetic acid ester group or an allyl group and a photoreaction accelerator is formed on a substrate, UV light is irradiated through the rough surface, and then the unexposed area is exposed. A photorelief formation method characterized by removing by washing with water. A film made of a mixture of a polyvinyl alcohol resin containing a 2-7toacetic acid ester group or an allyl group and a photoreaction accelerator is formed on a substrate, and ultraviolet rays are irradiated through the negative surface,
A method for forming a photorelief, which is characterized in that the unexposed areas are then washed away with water and then hardened with a metal salt or ammonium salt.
JP5762882A 1982-04-06 1982-04-06 Formation of photorelief Granted JPS58173741A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5762882A JPS58173741A (en) 1982-04-06 1982-04-06 Formation of photorelief

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5762882A JPS58173741A (en) 1982-04-06 1982-04-06 Formation of photorelief

Publications (2)

Publication Number Publication Date
JPS58173741A true JPS58173741A (en) 1983-10-12
JPH023491B2 JPH023491B2 (en) 1990-01-23

Family

ID=13061145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5762882A Granted JPS58173741A (en) 1982-04-06 1982-04-06 Formation of photorelief

Country Status (1)

Country Link
JP (1) JPS58173741A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172027A (en) * 1986-01-24 1987-07-29 Nippon Synthetic Chem Ind Co Ltd:The Method for imparting water resistance to acetoacetic ester group-containing water-soluble high polymer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (en) * 1974-01-10 1975-08-12
JPS51143409A (en) * 1975-06-04 1976-12-09 Fuji Photo Film Co Ltd Method of making lithographic press plate
JPS526205A (en) * 1975-06-30 1977-01-18 Hoechst Ag Method of producing lithographic plate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (en) * 1974-01-10 1975-08-12
JPS51143409A (en) * 1975-06-04 1976-12-09 Fuji Photo Film Co Ltd Method of making lithographic press plate
JPS526205A (en) * 1975-06-30 1977-01-18 Hoechst Ag Method of producing lithographic plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172027A (en) * 1986-01-24 1987-07-29 Nippon Synthetic Chem Ind Co Ltd:The Method for imparting water resistance to acetoacetic ester group-containing water-soluble high polymer

Also Published As

Publication number Publication date
JPH023491B2 (en) 1990-01-23

Similar Documents

Publication Publication Date Title
JPH0296170A (en) Method of forming colored photographic image
US3101270A (en) Photopolymerization of unsaturated organic compounds by means of radiation sensitive iron compounds as photoinitiators
US4001015A (en) Method for the production of printing plates using photosensitive compositions
US3740224A (en) Photosensitive compositions for the production of printing plates
US3898087A (en) Photopolymerizable compositions containing aminimides
DE1905012C3 (en) Photopolymerizable recording material for producing reliefs
JPS62141005A (en) Ionic polymer
US6333137B1 (en) Screen printing stencil
JPS58173741A (en) Formation of photorelief
US4097283A (en) Water-soluble composition admixture of copolymer having ethylenic unsaturation in side chain and anthraquinone photosensitizer
JPH0239784B2 (en) KANKOSEIJUSHISOSEIBUTSU
JP2002023349A (en) Photosensitive resin relief printing plate material
US4933260A (en) Water based photopolymerizable resin composition
JPS58137834A (en) Photosensitive composition
JPH023492B2 (en)
JPH04283749A (en) Photosensitive resin composition
JP3565625B2 (en) Photosensitive resin composition
JP2900075B2 (en) Photosensitive resin composition
JP2540577B2 (en) Manufacturing method of photosensitive resin plate
DE2166551C3 (en) Copolymers with ethylenically unsaturated side chains and their use
JP2873706B2 (en) Photocurable resin composition
JPS58100128A (en) Method for postexposure in liquid
JP3627394B2 (en) Photosensitive resin letterpress material
DE2049621A1 (en) Photosensitive mixtures for the production of printing plates
JPS6016986B2 (en) Photosensitive resin composition