JPS58168266A - 金層の選択的付着方法 - Google Patents
金層の選択的付着方法Info
- Publication number
- JPS58168266A JPS58168266A JP58010026A JP1002683A JPS58168266A JP S58168266 A JPS58168266 A JP S58168266A JP 58010026 A JP58010026 A JP 58010026A JP 1002683 A JP1002683 A JP 1002683A JP S58168266 A JPS58168266 A JP S58168266A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- metal
- pattern
- copper
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10W99/00—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/001—Interlayers, transition pieces for metallurgical bonding of workpieces
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
- H05K3/246—Reinforcing conductive paste, ink or powder patterns by other methods, e.g. by plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/143—Masks therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US359469 | 1982-03-18 | ||
| US06/359,469 US4493856A (en) | 1982-03-18 | 1982-03-18 | Selective coating of metallurgical features of a dielectric substrate with diverse metals |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58168266A true JPS58168266A (ja) | 1983-10-04 |
| JPS6317337B2 JPS6317337B2 (cg-RX-API-DMAC10.html) | 1988-04-13 |
Family
ID=23413928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58010026A Granted JPS58168266A (ja) | 1982-03-18 | 1983-01-26 | 金層の選択的付着方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4493856A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS58168266A (cg-RX-API-DMAC10.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007000615A (ja) * | 2005-05-27 | 2007-01-11 | Itoki Corp | 学習家具における仕切板の取付装置 |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4582722A (en) * | 1984-10-30 | 1986-04-15 | International Business Machines Corporation | Diffusion isolation layer for maskless cladding process |
| US4663186A (en) * | 1986-04-24 | 1987-05-05 | International Business Machines Corporation | Screenable paste for use as a barrier layer on a substrate during maskless cladding |
| US4704304A (en) * | 1986-10-27 | 1987-11-03 | International Business Machines Corporation | Method for repair of opens in thin film lines on a substrate |
| US4829020A (en) * | 1987-10-23 | 1989-05-09 | The United States Of America As Represented By The United States Department Of Energy | Substrate solder barriers for semiconductor epilayer growth |
| US4934309A (en) * | 1988-04-15 | 1990-06-19 | International Business Machines Corporation | Solder deposition system |
| US4898117A (en) * | 1988-04-15 | 1990-02-06 | International Business Machines Corporation | Solder deposition system |
| DE3907004A1 (de) * | 1989-03-04 | 1990-09-06 | Contraves Ag | Verfahren zum herstellen von duennschichtschaltungen |
| EP0421120B1 (en) * | 1989-10-05 | 1996-10-30 | International Business Machines Corporation | Thin film magnetic storage medium and method for the manufacture thereof |
| US5156903A (en) * | 1989-12-21 | 1992-10-20 | Sumitomo Metal Ceramics Inc. | Multilayer ceramic substrate and manufacture thereof |
| US5104689A (en) * | 1990-09-24 | 1992-04-14 | International Business Machines Corporation | Method and apparatus for automated solder deposition at multiple sites |
| US5143867A (en) * | 1991-02-13 | 1992-09-01 | International Business Machines Corporation | Method for depositing interconnection metallurgy using low temperature alloy processes |
| US5719447A (en) | 1993-06-03 | 1998-02-17 | Intel Corporation | Metal alloy interconnections for integrated circuits |
| US6066514A (en) * | 1996-10-18 | 2000-05-23 | Micron Technology, Inc. | Adhesion enhanced semiconductor die for mold compound packaging |
| US5787578A (en) * | 1996-07-09 | 1998-08-04 | International Business Machines Corporation | Method of selectively depositing a metallic layer on a ceramic substrate |
| US6376054B1 (en) * | 1999-02-10 | 2002-04-23 | International Business Machines Corporation | Surface metallization structure for multiple chip test and burn-in |
| DE19909505C2 (de) * | 1999-03-04 | 2001-11-15 | Daimler Chrysler Ag | Verfahren zur Herstellung von Schaltungsanordnungen |
| US20020076910A1 (en) * | 1999-12-15 | 2002-06-20 | Pace Benedict G. | High density electronic interconnection |
| DE10101359A1 (de) * | 2001-01-13 | 2002-07-25 | Conti Temic Microelectronic | Verfahren zur Herstellung einer elektronischen Baugruppe |
| KR101159514B1 (ko) | 2007-05-24 | 2012-06-26 | 프린코 코포레이션 | 다층기판 금속배선 제조방법 및 그 구조 |
| TWI354523B (en) * | 2007-05-25 | 2011-12-11 | Princo Corp | Method for manufacturing metal lines in multi-laye |
| US8815333B2 (en) | 2007-12-05 | 2014-08-26 | Princo Middle East Fze | Manufacturing method of metal structure in multi-layer substrate |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3186863A (en) * | 1961-06-05 | 1965-06-01 | Hughes Aircraft Co | Process for plating ceramic bodies |
| US3512051A (en) * | 1965-12-29 | 1970-05-12 | Burroughs Corp | Contacts for a semiconductor device |
| DE1627596A1 (de) * | 1967-02-24 | 1971-07-15 | Siemens Ag | Verfahren zum Verzinnen und/oder Verloeten von metallischen Stellen,insbesondere der Leiterbahnen von Schaltungsplatten der Fernmeldetechnik |
| NL6914593A (cg-RX-API-DMAC10.html) * | 1969-09-26 | 1971-03-30 | ||
| US3736167A (en) * | 1971-04-01 | 1973-05-29 | Coors Porcelain Co | Electroless nickel plating process |
| US3698408A (en) * | 1971-06-11 | 1972-10-17 | Branson Instr | Ultrasonic processing apparatus |
| US3979858A (en) * | 1975-07-24 | 1976-09-14 | International Lead Zinc Research Organization, Inc. | Chemically accelerated metal finishing process |
| US4206254A (en) * | 1979-02-28 | 1980-06-03 | International Business Machines Corporation | Method of selectively depositing metal on a ceramic substrate with a metallurgy pattern |
-
1982
- 1982-03-18 US US06/359,469 patent/US4493856A/en not_active Expired - Fee Related
-
1983
- 1983-01-26 JP JP58010026A patent/JPS58168266A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007000615A (ja) * | 2005-05-27 | 2007-01-11 | Itoki Corp | 学習家具における仕切板の取付装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6317337B2 (cg-RX-API-DMAC10.html) | 1988-04-13 |
| US4493856A (en) | 1985-01-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS58168266A (ja) | 金層の選択的付着方法 | |
| EP0089559B1 (en) | Method for forming metal coatings for metallurgy patterns on dielectric substrates | |
| US20020076910A1 (en) | High density electronic interconnection | |
| WO1997018584A1 (en) | Method for forming bump of semiconductor device | |
| JPS63110697A (ja) | 多層金属構造体 | |
| US5787578A (en) | Method of selectively depositing a metallic layer on a ceramic substrate | |
| EP1121840A1 (en) | Soldering of a semiconductor chip to a substrate | |
| JPH0141271B2 (cg-RX-API-DMAC10.html) | ||
| US5124175A (en) | Method of patterned metal reflow on interconnect substrates | |
| US8250748B2 (en) | Method for producing an LTCC substrate | |
| US4501768A (en) | Thin film floating zone metal coating technique | |
| EP1722616A2 (en) | Technique for defining a wettable solder joint area for an electronic assembly substrate | |
| EP0089604B1 (en) | Method for selectively coating metallurgical patterns on dielectric substrates | |
| WO2004056162A1 (ja) | フリップチップ実装用電子部品及びその製造法、回路板及びその製造法、実装体の製造法 | |
| EP0717125A1 (en) | Bonding of diamond to a substrate | |
| JP4520665B2 (ja) | プリント配線板及びその製造方法並びに部品実装構造 | |
| JPH03218644A (ja) | 回路基板の接続構造 | |
| JP2008227055A (ja) | 回路基板 | |
| JP2585891B2 (ja) | ボンディングツール | |
| JPH11135533A (ja) | 電極構造、該電極を備えたシリコン半導体素子、その製造方法及び該素子を実装した回路基板並びにその製造方法 | |
| JPH03200343A (ja) | 半田バンプの形成方法 | |
| JPH01307237A (ja) | 薄い可撓性基板構造体 | |
| JPH0793310B2 (ja) | 電極付半導体チップ及びその実装方法 | |
| US6884708B2 (en) | Method of partially plating substrate for electronic devices | |
| JPS6366949A (ja) | はんだバンブの形成方法 |