JPS58168228A - フオトマスクの比較検査方法と装置 - Google Patents

フオトマスクの比較検査方法と装置

Info

Publication number
JPS58168228A
JPS58168228A JP57145540A JP14554082A JPS58168228A JP S58168228 A JPS58168228 A JP S58168228A JP 57145540 A JP57145540 A JP 57145540A JP 14554082 A JP14554082 A JP 14554082A JP S58168228 A JPS58168228 A JP S58168228A
Authority
JP
Japan
Prior art keywords
pattern
photomask
reticle
stage
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57145540A
Other languages
English (en)
Japanese (ja)
Other versions
JPS632136B2 (enrdf_load_stackoverflow
Inventor
Kenichi Kobayashi
賢一 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57145540A priority Critical patent/JPS58168228A/ja
Publication of JPS58168228A publication Critical patent/JPS58168228A/ja
Publication of JPS632136B2 publication Critical patent/JPS632136B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57145540A 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置 Granted JPS58168228A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57145540A JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57145540A JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Publications (2)

Publication Number Publication Date
JPS58168228A true JPS58168228A (ja) 1983-10-04
JPS632136B2 JPS632136B2 (enrdf_load_stackoverflow) 1988-01-18

Family

ID=15387546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57145540A Granted JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Country Status (1)

Country Link
JP (1) JPS58168228A (enrdf_load_stackoverflow)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS5354479A (en) * 1976-10-28 1978-05-17 Toshiba Corp Comparative inspecting apparatus of pattern plate
JPS5619622A (en) * 1979-07-26 1981-02-24 Fujitsu Ltd Photomask comparison inspecting mechanism
JPS5639516A (en) * 1979-09-10 1981-04-15 Fujitsu Ltd Comparative inspecting mechanism of photomask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS5354479A (en) * 1976-10-28 1978-05-17 Toshiba Corp Comparative inspecting apparatus of pattern plate
JPS5619622A (en) * 1979-07-26 1981-02-24 Fujitsu Ltd Photomask comparison inspecting mechanism
JPS5639516A (en) * 1979-09-10 1981-04-15 Fujitsu Ltd Comparative inspecting mechanism of photomask

Also Published As

Publication number Publication date
JPS632136B2 (enrdf_load_stackoverflow) 1988-01-18

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