JPS632136B2 - - Google Patents

Info

Publication number
JPS632136B2
JPS632136B2 JP57145540A JP14554082A JPS632136B2 JP S632136 B2 JPS632136 B2 JP S632136B2 JP 57145540 A JP57145540 A JP 57145540A JP 14554082 A JP14554082 A JP 14554082A JP S632136 B2 JPS632136 B2 JP S632136B2
Authority
JP
Japan
Prior art keywords
photomask
pattern
reticle
patterns
reticle pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57145540A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58168228A (ja
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57145540A priority Critical patent/JPS58168228A/ja
Publication of JPS58168228A publication Critical patent/JPS58168228A/ja
Publication of JPS632136B2 publication Critical patent/JPS632136B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP57145540A 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置 Granted JPS58168228A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57145540A JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57145540A JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Publications (2)

Publication Number Publication Date
JPS58168228A JPS58168228A (ja) 1983-10-04
JPS632136B2 true JPS632136B2 (enrdf_load_stackoverflow) 1988-01-18

Family

ID=15387546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57145540A Granted JPS58168228A (ja) 1982-08-24 1982-08-24 フオトマスクの比較検査方法と装置

Country Status (1)

Country Link
JP (1) JPS58168228A (enrdf_load_stackoverflow)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS5354479A (en) * 1976-10-28 1978-05-17 Toshiba Corp Comparative inspecting apparatus of pattern plate
JPS5619622A (en) * 1979-07-26 1981-02-24 Fujitsu Ltd Photomask comparison inspecting mechanism
JPS5639516A (en) * 1979-09-10 1981-04-15 Fujitsu Ltd Comparative inspecting mechanism of photomask

Also Published As

Publication number Publication date
JPS58168228A (ja) 1983-10-04

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