JPS6236638B2 - - Google Patents
Info
- Publication number
- JPS6236638B2 JPS6236638B2 JP19840081A JP19840081A JPS6236638B2 JP S6236638 B2 JPS6236638 B2 JP S6236638B2 JP 19840081 A JP19840081 A JP 19840081A JP 19840081 A JP19840081 A JP 19840081A JP S6236638 B2 JPS6236638 B2 JP S6236638B2
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- pattern
- circuit
- positional deviation
- detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 42
- 239000013307 optical fiber Substances 0.000 claims description 33
- 230000007547 defect Effects 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 13
- 238000007689 inspection Methods 0.000 claims description 4
- 238000003384 imaging method Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 6
- 238000012360 testing method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56198400A JPS58100438A (ja) | 1981-12-11 | 1981-12-11 | パタ−ン検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56198400A JPS58100438A (ja) | 1981-12-11 | 1981-12-11 | パタ−ン検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58100438A JPS58100438A (ja) | 1983-06-15 |
| JPS6236638B2 true JPS6236638B2 (enrdf_load_stackoverflow) | 1987-08-07 |
Family
ID=16390495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56198400A Granted JPS58100438A (ja) | 1981-12-11 | 1981-12-11 | パタ−ン検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58100438A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6015504A (ja) * | 1983-07-07 | 1985-01-26 | Mitsubishi Rayon Co Ltd | フオトマスク自動検査装置 |
| JPS6093305A (ja) * | 1983-10-27 | 1985-05-25 | Fujitsu Ltd | マスク検査方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50127574A (enrdf_load_stackoverflow) * | 1974-03-27 | 1975-10-07 |
-
1981
- 1981-12-11 JP JP56198400A patent/JPS58100438A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58100438A (ja) | 1983-06-15 |
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