JPS5816546A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS5816546A
JPS5816546A JP56114666A JP11466681A JPS5816546A JP S5816546 A JPS5816546 A JP S5816546A JP 56114666 A JP56114666 A JP 56114666A JP 11466681 A JP11466681 A JP 11466681A JP S5816546 A JPS5816546 A JP S5816546A
Authority
JP
Japan
Prior art keywords
conductive film
semiconductor substrate
semiconductor device
film
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56114666A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6244813B2 (https=
Inventor
Takehiko Kubota
久保田 武彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56114666A priority Critical patent/JPS5816546A/ja
Publication of JPS5816546A publication Critical patent/JPS5816546A/ja
Publication of JPS6244813B2 publication Critical patent/JPS6244813B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/45Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
    • H10W20/48Insulating materials thereof

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP56114666A 1981-07-22 1981-07-22 半導体装置 Granted JPS5816546A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56114666A JPS5816546A (ja) 1981-07-22 1981-07-22 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56114666A JPS5816546A (ja) 1981-07-22 1981-07-22 半導体装置

Publications (2)

Publication Number Publication Date
JPS5816546A true JPS5816546A (ja) 1983-01-31
JPS6244813B2 JPS6244813B2 (https=) 1987-09-22

Family

ID=14643541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56114666A Granted JPS5816546A (ja) 1981-07-22 1981-07-22 半導体装置

Country Status (1)

Country Link
JP (1) JPS5816546A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63152147A (ja) * 1986-12-17 1988-06-24 Nippon Denso Co Ltd アルミニウム合金配線装置およびその製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6417052U (https=) * 1987-07-21 1989-01-27
JPS6436740U (https=) * 1987-08-29 1989-03-06

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63152147A (ja) * 1986-12-17 1988-06-24 Nippon Denso Co Ltd アルミニウム合金配線装置およびその製造方法

Also Published As

Publication number Publication date
JPS6244813B2 (https=) 1987-09-22

Similar Documents

Publication Publication Date Title
US4319264A (en) Nickel-gold-nickel conductors for solid state devices
JPS62133738A (ja) 集積回路
JPS6185879A (ja) 導電パタ−ンの形成方法
US3617816A (en) Composite metallurgy stripe for semiconductor devices
JPS63278255A (ja) 集積回路用層間接続
GB1265375A (https=)
TW392322B (en) Semiconductor device and its fabrication
JP5505142B2 (ja) ヒューズおよびその製造方法
JP3091026B2 (ja) 集積回路の配線
JPS5816546A (ja) 半導体装置
US4456506A (en) Superconducting circuit fabrication
US4161430A (en) Method of forming integrated circuit metal interconnect structure employing molybdenum on aluminum
JPH0262035A (ja) 半導体装置
JP3415387B2 (ja) 半導体装置およびその製造方法
JPH0246076Y2 (https=)
JP2000173364A (ja) スズメッキ平型導体およびその導体を使用したフラットケーブル
JPS5915178B2 (ja) 配線構造及び方法
JPH03159152A (ja) バンプ電極の製造方法
JPH0199239A (ja) 半導体装置
JPH04206528A (ja) 半導体装置における配線構造
JPH05152299A (ja) 配線構造体
JPH02229433A (ja) 配線材料
JPS6025827B2 (ja) 磁気バブルメモリチツプ
JPH0629292A (ja) 半導体装置及びその製造方法
JPS63318013A (ja) 超電導配線材料