JPS5816216A - タルボ干渉計 - Google Patents

タルボ干渉計

Info

Publication number
JPS5816216A
JPS5816216A JP11468181A JP11468181A JPS5816216A JP S5816216 A JPS5816216 A JP S5816216A JP 11468181 A JP11468181 A JP 11468181A JP 11468181 A JP11468181 A JP 11468181A JP S5816216 A JPS5816216 A JP S5816216A
Authority
JP
Japan
Prior art keywords
diffraction grating
grating
side diffraction
interference
talbot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11468181A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0153408B2 (enrdf_load_stackoverflow
Inventor
Ryuichi Sato
隆一 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP11468181A priority Critical patent/JPS5816216A/ja
Publication of JPS5816216A publication Critical patent/JPS5816216A/ja
Publication of JPH0153408B2 publication Critical patent/JPH0153408B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP11468181A 1981-07-22 1981-07-22 タルボ干渉計 Granted JPS5816216A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11468181A JPS5816216A (ja) 1981-07-22 1981-07-22 タルボ干渉計

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11468181A JPS5816216A (ja) 1981-07-22 1981-07-22 タルボ干渉計

Publications (2)

Publication Number Publication Date
JPS5816216A true JPS5816216A (ja) 1983-01-29
JPH0153408B2 JPH0153408B2 (enrdf_load_stackoverflow) 1989-11-14

Family

ID=14643966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11468181A Granted JPS5816216A (ja) 1981-07-22 1981-07-22 タルボ干渉計

Country Status (1)

Country Link
JP (1) JPS5816216A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60247133A (ja) * 1984-05-22 1985-12-06 Yoshiaki Nakano モアレ縞によるレンズの焦点距離測定法
JP2003524175A (ja) * 2000-02-23 2003-08-12 カール−ツアイス−スチフツング 波面検出装置
US7030998B2 (en) 2002-01-31 2006-04-18 Canon Kabushiki Kaisha Phase measurement apparatus for measuring characterization of optical thin films
US7595931B2 (en) 2003-01-15 2009-09-29 Asml Holding N.V. Grating for EUV lithographic system aberration measurement
US7602503B2 (en) 2003-01-15 2009-10-13 Asml Holdings N.V. Methods for measuring a wavefront of an optical system
WO2011033798A1 (ja) 2009-09-16 2011-03-24 コニカミノルタエムジー株式会社 Ｘ線撮影装置、ｘ線画像システム及びｘ線画像生成方法
JP2011106975A (ja) * 2009-11-18 2011-06-02 Canon Inc 屈折率分布の計測方法および計測装置
JP2011117897A (ja) * 2009-12-07 2011-06-16 Canon Inc 屈折率分布の計測方法および計測装置
US8989474B2 (en) 2010-03-18 2015-03-24 Konica Minolta Medical & Graphic, Inc. X-ray image capturing system
US9044154B2 (en) 2012-03-01 2015-06-02 Konica Minolta, Inc. Joint imaging apparatus

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60247133A (ja) * 1984-05-22 1985-12-06 Yoshiaki Nakano モアレ縞によるレンズの焦点距離測定法
JP2003524175A (ja) * 2000-02-23 2003-08-12 カール−ツアイス−スチフツング 波面検出装置
US7030998B2 (en) 2002-01-31 2006-04-18 Canon Kabushiki Kaisha Phase measurement apparatus for measuring characterization of optical thin films
US7327467B2 (en) 2002-01-31 2008-02-05 Canon Kabushiki Kaisha Phase measuring method and apparatus for measuring characterization of optical thin films
US7595931B2 (en) 2003-01-15 2009-09-29 Asml Holding N.V. Grating for EUV lithographic system aberration measurement
US7602503B2 (en) 2003-01-15 2009-10-13 Asml Holdings N.V. Methods for measuring a wavefront of an optical system
WO2011033798A1 (ja) 2009-09-16 2011-03-24 コニカミノルタエムジー株式会社 Ｘ線撮影装置、ｘ線画像システム及びｘ線画像生成方法
US9025725B2 (en) 2009-09-16 2015-05-05 Konica Minolta Medical & Graphic, Inc. X-ray image capturing apparatus, X-ray imaging system and X-ray image creation method
JP2011106975A (ja) * 2009-11-18 2011-06-02 Canon Inc 屈折率分布の計測方法および計測装置
JP2011117897A (ja) * 2009-12-07 2011-06-16 Canon Inc 屈折率分布の計測方法および計測装置
US8989474B2 (en) 2010-03-18 2015-03-24 Konica Minolta Medical & Graphic, Inc. X-ray image capturing system
US9044154B2 (en) 2012-03-01 2015-06-02 Konica Minolta, Inc. Joint imaging apparatus

Also Published As

Publication number Publication date
JPH0153408B2 (enrdf_load_stackoverflow) 1989-11-14

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