JPS58159363A - Input/output protecting device for semiconductor integrated circuit - Google Patents
Input/output protecting device for semiconductor integrated circuitInfo
- Publication number
- JPS58159363A JPS58159363A JP57042177A JP4217782A JPS58159363A JP S58159363 A JPS58159363 A JP S58159363A JP 57042177 A JP57042177 A JP 57042177A JP 4217782 A JP4217782 A JP 4217782A JP S58159363 A JPS58159363 A JP S58159363A
- Authority
- JP
- Japan
- Prior art keywords
- input
- output
- drain region
- protecting device
- prescribed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
Abstract
Description
【発明の詳細な説明】 本発#4は牛導体集積回路の入出力保賎装盲に関する。[Detailed description of the invention] This issue #4 concerns the input/output protection of conductor integrated circuits.
従来、入出力保@*を扛、入力側と出力側にそれぞれ孤
別にその+段を施している為にし1アウトパターンの占
有面積は入力保―襞電のみ、あるいは出力保線装置のみ
よりも当然のことながら大急〈なりていた0又、仁とに
相1IIIA溢M(Jl構造で入出力コモンタ11の回
路執IIにおいては、相補fiMU8@造特Mのラッチ
了Vプ現象の発生防止に努めなけれはならない為にN型
M(JI9@造又は1’fiM08構造による入出力保
線装置に比べj!に。Conventionally, input/output protection @* was used, and the + stage was separately applied to the input and output sides, so the area occupied by the 1-out pattern was naturally larger than that of input protection only or output protection device only. However, in order to prevent the occurrence of the phase 1 IIIA overflow M (in the circuit II of the input/output commoner 11 in the Jl structure, the latch of the complementary fiMU 8 @ Zoku M) was urgently required. Because of this, the N-type M (J!
し1アウトパターンの占有面積は大きくなっていたO
しかるに、高集積密度化が進んでいる現在において、上
記し友人出力保gii装置を採用し続けることは、非常
に不合場的でかつ有効性に欠けている。However, in today's world where high integration densities are progressing, it is extremely inopportune to continue to use the above-mentioned output protection device, and it is not effective. Missing.
つまり、従来の入出力保線iitmが必費最小限のもの
であり九かどうかはかな9疑門のある所が多い為に1人
力保線及び出力保護に必l!な最小限の機能を満足する
し1了クトバメーン倉見出し採用することによって、従
来の入出力保護パターンを採用してい次時よりも1更に
、高集積密度1ヒを図らなけれt’fならない。In other words, the conventional input/output track maintenance IITM is the minimum necessary cost, and since there are many places with 9 doubts, it is indispensable for one-man track maintenance and output protection! By adopting a main unit that satisfies the minimum functionality required, it is necessary to achieve an even higher integration density than the conventional input/output protection pattern.
本!a明は、従来の人出力保饅耐圧と同等、又はそれ以
上の耐圧管有し、*(従来以上の高集積密度化を実現す
ることYt目的としている。Book! The a-mei has pressure-resistant tubes that are equivalent to or higher than the conventional human power retention pressure, and aims to achieve higher integration density than the conventional one.
本%IIKよれは、入出力用ポンディングパッドからは
、出力保Ii装筺のみに接続され、入力ゲートは該出力
保w!に装置の出力増と拡散抵抗會介して接続された構
造の入出力保5iii置が得られる。In this %IIK twist, the input/output bonding pad is connected only to the output protection Ii housing, and the input gate is connected to the output protection w! In this way, the output power of the device is increased and the input/output protection of the structure connected through the diffused resistor system is obtained.
本発#4を相補tIiMUS構造における入出力保護装
置を例にとマて、従来の装置と比較しながら図Il]を
用いてa明してい〈0
111図は従来から!l!施されてきた入出力保護装置
のレイアウトパターンを示し、!2図KIIIL1図の
等価回路を示す。mlll図、312図において、入出
力用ボンティングパッドll[、i’ch出力トランジ
スタで所定の拡散層容量會もり友ドレイン領域12と所
定のNJII拡散層抵抗13t−介したNch出力トラ
ンジスタで所定の拡散増容JIIVr4りたドレイン領
域14へとオー建y/iI!続される0次に人力ゲート
への接続は所定のNfJ拡散層抵抗15とN!1!第1
!【含む所定のポリシリコン抵抗16とt介してボンデ
(ングバッド11へと接続されている0尚m1図、1I
LltIAK&vh−r−矢fllO(1人力ゲートへ
いたることt示している。このような従来の構造によれ
ばPch、hch両出カドランジス7Iに対する出力保
I11装置と、入力ブートに対する入力保躾f!櫨とが
それぞれ孤別に形成し、配置をとる牛導体集積回路では
必然的にそのレイアウトパターンの占有伽横が大きくな
ってい危。Taking the present invention #4 as an example of an input/output protection device in a complementary tIiMUS structure, we will explain it using Figure Il while comparing it with a conventional device. l! The layout pattern of input/output protection devices that have been applied is shown! Figure 2 shows the equivalent circuit of Figure 1. In Fig. mlll and Fig. 312, the input/output bonding pad ll[, the i'ch output transistor has a predetermined diffusion layer capacitance, and the Nch output transistor has a predetermined value through the drain region 12 and a predetermined NJII diffusion layer resistor 13t. Diffusion volume increase JIIVr4 to the drain region 14 and O construction y/iI! The connection to the 0th order manual gate is a predetermined NfJ diffusion layer resistor 15 and N! 1! 1st
! [Contains a predetermined polysilicon resistor 16 and is connected to the bonding pad 11 via t.
LltIAK & vhr-arrow fllO (shows that it leads to a one-man power gate. According to such a conventional structure, there is an output protection device for both Pch and hch output quadrants 7I, and an input protection device for input boot). In conductor integrated circuits in which each conductor is formed and arranged separately, the layout pattern inevitably occupies a large amount of space, which is dangerous.
本発明では、入力保si装置を出力保1IIft置の一
部に共存させることによりて、従来の入出力保1耐圧を
推持した上でレイアウトパターンの占有面積を小さくし
たことt特徴としている。The present invention is characterized in that the area occupied by the layout pattern is reduced while maintaining the conventional input/output protection voltage by coexisting the input protection device in a part of the output protection area.
83図は本楯#4による入出力保護装置のレイアウトパ
ターンで、属4wJはIN3図の等価回路を示す。Figure 83 is the layout pattern of the input/output protection device according to this shield #4, and Gen 4wJ shows the equivalent circuit of the IN3 diagram.
尚、m3図、514図で矢印100は入力ゲートへいた
ることを示している。5113図、属4図において、入
出力用ボンティングパッド21Fi、Pch出力トラン
ジスタで所定の拡散層容量を持りたドレイン領域22と
所定のNjll拡散抵抗23t−介したNch出力トラ
ンジスタで所定の拡散増容tt待ったドレイン領域24
へとオーζvl@絖される。Note that the arrow 100 in Figures m3 and 514 indicates the direction to the input gate. In Fig. 5113 and Fig. 4, the input/output bonding pad 21Fi, the drain region 22 with a predetermined diffusion layer capacitance in the Pch output transistor, and the predetermined diffusion increase in the Nch output transistor via the predetermined Njll diffusion resistor 23t- are shown. drain area 24
It will be completed at ζvl@.
次に人力ゲートへの接続は前記Nch出力トランジスタ
のドレイン領域24からjI!#Ch製拡散抵抗25を
介して接続されている。このように出力保論用に設けら
れている所定の拡散mstを持9たドレイン領域の−S
t入力入力保検目も同時に担わせることによp、出力保
鏝装置と入力保麺装置とtかなりの範囲で共有させたこ
とによりレイアウトパターンは従来のそれに比べて約3
096小さくすることが可能となりた0尚0本発#!A
に相補星hL)8構造以外の構造においても効果は得ら
れるものである◎Next, the connection to the human gate is from the drain region 24 of the Nch output transistor to jI! It is connected via a #Ch diffused resistor 25. -S of the drain region with a predetermined diffusion mst provided for output guarantee in this way.
The layout pattern has been reduced to approximately 3 times compared to the conventional one by having the output and input maintenance devices share a considerable range.
096 It is now possible to make the size smaller! A
The effect can also be obtained in structures other than the complementary star hL)8 structure.
謳1図は、従来の入出力保護装置を用いたし1アウトパ
タ一ン図で、謳2図は、111図の等価−略図である。
183図は、本発明の夾施例による入出力保si!電を
用いたレイアウトパターン図で、5114図は%@3図
の等価回略図である。
纂1@1.畠2図、纂3図、畠4図において、11゜・
21・・・入出力用ボンティングパッド、12.22・
・・Pch出力トランジスタのドレイン領域、13゜2
3・・NJII拡歓抵抗、14.24・・・Nch出力
トランジスタのドレイン領域、15.25・・・N急拡
散抵抗、16・・・Na1l不純@を含むボIノシリコ
ン抵抗、100・・1人力ゲートへ」に接続されること
t示す矢印である。
拵1図
第3図Figure 1 is a one-out pattern diagram using a conventional input/output protection device, and Figure 2 is an equivalent schematic diagram of Figure 111. Figure 183 shows input/output protection si! according to another embodiment of the present invention. This is a layout pattern diagram using electricity, and Figure 5114 is an equivalent circuit diagram of Figure %@3.纂1@1. In Hatake 2, Hatake 3, and Hatake 4, 11°・
21... Input/output bonding pad, 12.22.
...Drain region of Pch output transistor, 13゜2
3...NJII expansion resistor, 14.24...Drain region of Nch output transistor, 15.25...N rapid diffusion resistor, 16...BoI silicon resistor containing Na1l impurity, 100... This is an arrow indicating that it is connected to the ``one-person powered gate''. Koshirae 1 diagram 3
Claims (1)
くとも一部が入力保@atを兼ね備えたことを特徴とす
る牛導体集St回路の入出力保鰻懐筺0Output protection device (itt) Input/output protection device for a cow conductor collection St circuit characterized in that at least a part of the wandering resistance element and capacitance element also serves as input protection @at
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57042177A JPS58159363A (en) | 1982-03-17 | 1982-03-17 | Input/output protecting device for semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57042177A JPS58159363A (en) | 1982-03-17 | 1982-03-17 | Input/output protecting device for semiconductor integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58159363A true JPS58159363A (en) | 1983-09-21 |
JPH0312472B2 JPH0312472B2 (en) | 1991-02-20 |
Family
ID=12628698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57042177A Granted JPS58159363A (en) | 1982-03-17 | 1982-03-17 | Input/output protecting device for semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58159363A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61176146A (en) * | 1985-01-31 | 1986-08-07 | Toshiba Corp | Semiconductor integrated circuit device |
JPS61168650U (en) * | 1985-04-10 | 1986-10-20 | ||
JPS63114409A (en) * | 1986-10-31 | 1988-05-19 | Hitachi Ltd | Flip-flop circuit |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52132685A (en) * | 1976-04-28 | 1977-11-07 | Toshiba Corp | Semiconductor integrated circuit device |
JPS539484A (en) * | 1976-07-14 | 1978-01-27 | Nec Corp | Integrated circuit device |
JPS53116262A (en) * | 1977-03-22 | 1978-10-11 | Sumitomo Light Metal Ind | Two stage disk for metal extrusion and metal extruding method |
JPS5526683A (en) * | 1978-08-16 | 1980-02-26 | Matsushita Electric Ind Co Ltd | Semiconductor integrated circuit device |
JPS574151A (en) * | 1980-06-11 | 1982-01-09 | Hitachi Ltd | Mos integrated circuit device |
JPS5763861A (en) * | 1980-10-06 | 1982-04-17 | Nec Corp | Semiconductor device |
-
1982
- 1982-03-17 JP JP57042177A patent/JPS58159363A/en active Granted
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52132685A (en) * | 1976-04-28 | 1977-11-07 | Toshiba Corp | Semiconductor integrated circuit device |
JPS539484A (en) * | 1976-07-14 | 1978-01-27 | Nec Corp | Integrated circuit device |
JPS53116262A (en) * | 1977-03-22 | 1978-10-11 | Sumitomo Light Metal Ind | Two stage disk for metal extrusion and metal extruding method |
JPS5526683A (en) * | 1978-08-16 | 1980-02-26 | Matsushita Electric Ind Co Ltd | Semiconductor integrated circuit device |
JPS574151A (en) * | 1980-06-11 | 1982-01-09 | Hitachi Ltd | Mos integrated circuit device |
JPS5763861A (en) * | 1980-10-06 | 1982-04-17 | Nec Corp | Semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61176146A (en) * | 1985-01-31 | 1986-08-07 | Toshiba Corp | Semiconductor integrated circuit device |
JPS61168650U (en) * | 1985-04-10 | 1986-10-20 | ||
JPS63114409A (en) * | 1986-10-31 | 1988-05-19 | Hitachi Ltd | Flip-flop circuit |
Also Published As
Publication number | Publication date |
---|---|
JPH0312472B2 (en) | 1991-02-20 |
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