JPS58151072A - 光電変換素子及びその製造方法 - Google Patents
光電変換素子及びその製造方法Info
- Publication number
- JPS58151072A JPS58151072A JP58018039A JP1803983A JPS58151072A JP S58151072 A JPS58151072 A JP S58151072A JP 58018039 A JP58018039 A JP 58018039A JP 1803983 A JP1803983 A JP 1803983A JP S58151072 A JPS58151072 A JP S58151072A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- conductive layer
- transparent conductive
- sno
- tin oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58018039A JPS58151072A (ja) | 1983-02-08 | 1983-02-08 | 光電変換素子及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58018039A JPS58151072A (ja) | 1983-02-08 | 1983-02-08 | 光電変換素子及びその製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56178966A Division JPS5880877A (ja) | 1981-11-10 | 1981-11-10 | 太陽電池及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58151072A true JPS58151072A (ja) | 1983-09-08 |
| JPH0516198B2 JPH0516198B2 (OSRAM) | 1993-03-03 |
Family
ID=11960531
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58018039A Granted JPS58151072A (ja) | 1983-02-08 | 1983-02-08 | 光電変換素子及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58151072A (OSRAM) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57157578A (en) * | 1981-03-23 | 1982-09-29 | Sumitomo Electric Ind Ltd | Active crystalline silicon thin film photovoltaic element |
| JPS5814582A (ja) * | 1981-07-17 | 1983-01-27 | Kanegafuchi Chem Ind Co Ltd | 高効率のアモルフアスシリコン系太陽電池 |
-
1983
- 1983-02-08 JP JP58018039A patent/JPS58151072A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57157578A (en) * | 1981-03-23 | 1982-09-29 | Sumitomo Electric Ind Ltd | Active crystalline silicon thin film photovoltaic element |
| JPS5814582A (ja) * | 1981-07-17 | 1983-01-27 | Kanegafuchi Chem Ind Co Ltd | 高効率のアモルフアスシリコン系太陽電池 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0516198B2 (OSRAM) | 1993-03-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4117506A (en) | Amorphous silicon photovoltaic device having an insulating layer | |
| US4213798A (en) | Tellurium schottky barrier contact for amorphous silicon solar cells | |
| JP2006080557A (ja) | 高水素希釈低温プラズマ蒸着によって製造されるアモルファスシリコン系素子の向上せしめられた安定化特性 | |
| JPH07123111B2 (ja) | 半導体膜の製造方法及び光起電力構造体の製造方法 | |
| US4339470A (en) | Fabricating amorphous silicon solar cells by varying the temperature _of the substrate during deposition of the amorphous silicon layer | |
| JPH0143449B2 (OSRAM) | ||
| US4710786A (en) | Wide band gap semiconductor alloy material | |
| US4415760A (en) | Amorphous silicon solar cells incorporating an insulating layer in the body of amorphous silicon and a method of suppressing the back diffusion of holes into an N-type region | |
| JP2000138384A (ja) | 非晶質半導体素子及びその製造方法 | |
| US5049523A (en) | Method of forming semiconducting materials and barriers | |
| JPS58151072A (ja) | 光電変換素子及びその製造方法 | |
| US5543634A (en) | Method of forming semiconductor materials and barriers | |
| JP3453329B2 (ja) | 透明導電膜及びその製造方法 | |
| US4705913A (en) | Amorphous silicon devices and method of producing | |
| TW201201396A (en) | Method for manufacturing a solar panel | |
| JPS62256481A (ja) | 半導体装置 | |
| JP2592809B2 (ja) | 光起電力素子の製造方法 | |
| JPH0650780B2 (ja) | 太陽電池及びその製造方法 | |
| US5073804A (en) | Method of forming semiconductor materials and barriers | |
| JPH04290274A (ja) | 光電変換装置 | |
| JPS6356712B2 (OSRAM) | ||
| JPS58151073A (ja) | 光電変換素子及びその製造方法 | |
| JPH0445991B2 (OSRAM) | ||
| JPS5880877A (ja) | 太陽電池及びその製造方法 | |
| JP3272681B2 (ja) | 太陽電池の製造方法 |