JPS58126981A - 薄膜製造装置 - Google Patents

薄膜製造装置

Info

Publication number
JPS58126981A
JPS58126981A JP834482A JP834482A JPS58126981A JP S58126981 A JPS58126981 A JP S58126981A JP 834482 A JP834482 A JP 834482A JP 834482 A JP834482 A JP 834482A JP S58126981 A JPS58126981 A JP S58126981A
Authority
JP
Japan
Prior art keywords
film
cylindrical
adhesion preventing
opening
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP834482A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0240740B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Miyama
博 深山
Yasuhiko Nakayama
中山 靖彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP834482A priority Critical patent/JPS58126981A/ja
Publication of JPS58126981A publication Critical patent/JPS58126981A/ja
Publication of JPH0240740B2 publication Critical patent/JPH0240740B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP834482A 1982-01-21 1982-01-21 薄膜製造装置 Granted JPS58126981A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP834482A JPS58126981A (ja) 1982-01-21 1982-01-21 薄膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP834482A JPS58126981A (ja) 1982-01-21 1982-01-21 薄膜製造装置

Publications (2)

Publication Number Publication Date
JPS58126981A true JPS58126981A (ja) 1983-07-28
JPH0240740B2 JPH0240740B2 (enrdf_load_stackoverflow) 1990-09-13

Family

ID=11690592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP834482A Granted JPS58126981A (ja) 1982-01-21 1982-01-21 薄膜製造装置

Country Status (1)

Country Link
JP (1) JPS58126981A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501708A (enrdf_load_stackoverflow) * 1973-05-04 1975-01-09

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501708A (enrdf_load_stackoverflow) * 1973-05-04 1975-01-09

Also Published As

Publication number Publication date
JPH0240740B2 (enrdf_load_stackoverflow) 1990-09-13

Similar Documents

Publication Publication Date Title
US4474832A (en) Magnetic recording media
JPS58126981A (ja) 薄膜製造装置
JPH0721560A (ja) 磁気記録媒体の製造方法
US4913933A (en) Method for preparing magnetic recording medium
US6251496B1 (en) Magnetic recording medium method and apparatus for producing the same
JPS6192431A (ja) 磁気記録媒体の製造法
JP2894253B2 (ja) 高機能性薄膜の製造方法
JPH0479065B2 (enrdf_load_stackoverflow)
JPH0132174Y2 (enrdf_load_stackoverflow)
JPS59172163A (ja) 垂直磁気記録媒体の製造方法
JPS62230976A (ja) 連続スパツタリング装置
JPS58199440A (ja) 磁気記録媒体の製造方法
JPS63308728A (ja) 垂直磁気記録媒体の製造方法
JPH0451889B2 (enrdf_load_stackoverflow)
JPH04132015A (ja) CoCr垂直磁気記録テープおよびその製造方法
JPS6093640A (ja) 磁気記録媒体の製造用装置
JPH0528487A (ja) 磁気記録媒体の製造方法
JPS6267728A (ja) 磁気記録媒体の製造方法
JPS6052930A (ja) 垂直磁気記録媒体の製造方法
JPH0555930B2 (enrdf_load_stackoverflow)
JPS62102421A (ja) 基板用フイルム及び薄膜形成方法
JPH10251843A (ja) 真空蒸着装置
JPH02240831A (ja) 磁気記録媒体の製造方法
JPH07192259A (ja) 磁気記録媒体の製造方法
JPH0198123A (ja) 磁気記録媒体の製造方法