JPS58122036A - 多結晶体膜の製造方法 - Google Patents

多結晶体膜の製造方法

Info

Publication number
JPS58122036A
JPS58122036A JP57003903A JP390382A JPS58122036A JP S58122036 A JPS58122036 A JP S58122036A JP 57003903 A JP57003903 A JP 57003903A JP 390382 A JP390382 A JP 390382A JP S58122036 A JPS58122036 A JP S58122036A
Authority
JP
Japan
Prior art keywords
temperature
amorphous
crystal
polycrystalline film
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57003903A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6130018B2 (enExample
Inventor
Yoshihiro Matsuo
嘉浩 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57003903A priority Critical patent/JPS58122036A/ja
Publication of JPS58122036A publication Critical patent/JPS58122036A/ja
Publication of JPS6130018B2 publication Critical patent/JPS6130018B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
  • Recrystallisation Techniques (AREA)
JP57003903A 1982-01-12 1982-01-12 多結晶体膜の製造方法 Granted JPS58122036A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57003903A JPS58122036A (ja) 1982-01-12 1982-01-12 多結晶体膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57003903A JPS58122036A (ja) 1982-01-12 1982-01-12 多結晶体膜の製造方法

Publications (2)

Publication Number Publication Date
JPS58122036A true JPS58122036A (ja) 1983-07-20
JPS6130018B2 JPS6130018B2 (enExample) 1986-07-10

Family

ID=11570148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57003903A Granted JPS58122036A (ja) 1982-01-12 1982-01-12 多結晶体膜の製造方法

Country Status (1)

Country Link
JP (1) JPS58122036A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62101008A (ja) * 1985-10-28 1987-05-11 Matsushita Electric Ind Co Ltd 磁性部材
JPS62120014A (ja) * 1985-11-20 1987-06-01 Nec Corp 半導体装置用基板の製造方法
JPH01108379A (ja) * 1987-09-18 1989-04-25 Xerox Corp 大粒子多結晶質膜の製造方法
WO1997028559A1 (fr) * 1996-01-30 1997-08-07 Seiko Epson Corporation Dispositif permettant d'obtenir un corps d'une energie elevee, procede de formation d'un film cristallin, et procede de fabrication d'un composant electronique possedant un film fin

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62101008A (ja) * 1985-10-28 1987-05-11 Matsushita Electric Ind Co Ltd 磁性部材
JPS62120014A (ja) * 1985-11-20 1987-06-01 Nec Corp 半導体装置用基板の製造方法
JPH01108379A (ja) * 1987-09-18 1989-04-25 Xerox Corp 大粒子多結晶質膜の製造方法
WO1997028559A1 (fr) * 1996-01-30 1997-08-07 Seiko Epson Corporation Dispositif permettant d'obtenir un corps d'une energie elevee, procede de formation d'un film cristallin, et procede de fabrication d'un composant electronique possedant un film fin
CN1131546C (zh) * 1996-01-30 2003-12-17 精工爱普生株式会社 结晶性膜的形成方法
CN1316556C (zh) * 1996-01-30 2007-05-16 精工爱普生株式会社 高能体供给装置、结晶性膜的形成方法和薄膜电子装置的制造方法

Also Published As

Publication number Publication date
JPS6130018B2 (enExample) 1986-07-10

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