JPS58114442A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS58114442A JPS58114442A JP21398081A JP21398081A JPS58114442A JP S58114442 A JPS58114442 A JP S58114442A JP 21398081 A JP21398081 A JP 21398081A JP 21398081 A JP21398081 A JP 21398081A JP S58114442 A JPS58114442 A JP S58114442A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- transfer
- net
- region
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21398081A JPS58114442A (ja) | 1981-12-26 | 1981-12-26 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21398081A JPS58114442A (ja) | 1981-12-26 | 1981-12-26 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58114442A true JPS58114442A (ja) | 1983-07-07 |
| JPH0221137B2 JPH0221137B2 (enExample) | 1990-05-11 |
Family
ID=16648246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21398081A Granted JPS58114442A (ja) | 1981-12-26 | 1981-12-26 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58114442A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6083810A (en) * | 1993-11-15 | 2000-07-04 | Lucent Technologies | Integrated circuit fabrication process |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS542671A (en) * | 1977-06-03 | 1979-01-10 | Ibm | Method of producing semiconductor |
-
1981
- 1981-12-26 JP JP21398081A patent/JPS58114442A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS542671A (en) * | 1977-06-03 | 1979-01-10 | Ibm | Method of producing semiconductor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6083810A (en) * | 1993-11-15 | 2000-07-04 | Lucent Technologies | Integrated circuit fabrication process |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0221137B2 (enExample) | 1990-05-11 |
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