JPS58106443A - 高周波誘導プラズマ発光分析装置用試料導入装置 - Google Patents
高周波誘導プラズマ発光分析装置用試料導入装置Info
- Publication number
- JPS58106443A JPS58106443A JP20479381A JP20479381A JPS58106443A JP S58106443 A JPS58106443 A JP S58106443A JP 20479381 A JP20479381 A JP 20479381A JP 20479381 A JP20479381 A JP 20479381A JP S58106443 A JPS58106443 A JP S58106443A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- gas
- introducing
- pressure
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000006698 induction Effects 0.000 title 1
- 239000006200 vaporizer Substances 0.000 claims abstract description 11
- 238000002309 gasification Methods 0.000 claims abstract description 8
- 239000007789 gas Substances 0.000 abstract description 38
- 238000002347 injection Methods 0.000 abstract description 4
- 239000007924 injection Substances 0.000 abstract description 4
- 239000012159 carrier gas Substances 0.000 abstract 1
- 238000010276 construction Methods 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 22
- 229910052786 argon Inorganic materials 0.000 description 11
- 230000002411 adverse Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20479381A JPS58106443A (ja) | 1981-12-18 | 1981-12-18 | 高周波誘導プラズマ発光分析装置用試料導入装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20479381A JPS58106443A (ja) | 1981-12-18 | 1981-12-18 | 高周波誘導プラズマ発光分析装置用試料導入装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58106443A true JPS58106443A (ja) | 1983-06-24 |
| JPH0153413B2 JPH0153413B2 (enExample) | 1989-11-14 |
Family
ID=16496442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20479381A Granted JPS58106443A (ja) | 1981-12-18 | 1981-12-18 | 高周波誘導プラズマ発光分析装置用試料導入装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58106443A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6126843A (ja) * | 1984-07-17 | 1986-02-06 | Shimadzu Corp | マイクロサンプル導入装置 |
| JPH03226656A (ja) * | 1990-01-31 | 1991-10-07 | Shimadzu Corp | Icp発光分光分析装置の抵抗加熱気化器 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012019340A1 (zh) * | 2010-08-11 | 2012-02-16 | 北京吉天仪器有限公司 | 检测Cr(VI)的原子荧光光谱法及光谱仪 |
| JP7293436B1 (ja) | 2022-03-11 | 2023-06-19 | レノボ・シンガポール・プライベート・リミテッド | 電子機器 |
-
1981
- 1981-12-18 JP JP20479381A patent/JPS58106443A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6126843A (ja) * | 1984-07-17 | 1986-02-06 | Shimadzu Corp | マイクロサンプル導入装置 |
| JPH03226656A (ja) * | 1990-01-31 | 1991-10-07 | Shimadzu Corp | Icp発光分光分析装置の抵抗加熱気化器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0153413B2 (enExample) | 1989-11-14 |
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