JPS5799643A - Seethrough mask - Google Patents

Seethrough mask

Info

Publication number
JPS5799643A
JPS5799643A JP17470680A JP17470680A JPS5799643A JP S5799643 A JPS5799643 A JP S5799643A JP 17470680 A JP17470680 A JP 17470680A JP 17470680 A JP17470680 A JP 17470680A JP S5799643 A JPS5799643 A JP S5799643A
Authority
JP
Japan
Prior art keywords
mask
far
seethrough
base plate
ultraviolet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17470680A
Other languages
Japanese (ja)
Other versions
JPS6154214B2 (en
Inventor
Kiyoshi Ozawa
Nobuyoshi Takagi
Satoru Kawai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17470680A priority Critical patent/JPS5799643A/en
Publication of JPS5799643A publication Critical patent/JPS5799643A/en
Publication of JPS6154214B2 publication Critical patent/JPS6154214B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To facilitate positioning during the formation of an element pattern by obtaining a seethrough mask for (far) ultraviolet-ray exposure which is transparent in a visible-light range by forming a hydrogenated or oxygenated silicon thin film on a glass or quartz base plate. CONSTITUTION:Silane gas or mixed gas of silane gas and O2 is used and a base plate is held adequately, e.g., at 250 deg.C to form a hydrogenated or oxygenated amorphous silicon film on the base plate by glow discharge. Then, resist is provided as a mask on this silicon film and etching is performed by CF4 gas plasma jet treatment to obtain a seethrough mask for (far) ultraviolet-ray exposure which has a necessary pattern. This mask is transparent in a visible-light range, but opaque to ultraviolet rays and far-ultraviolet rays, facilitating positioning during exposure. The silicon film of this mask is acid resistant and is washable with an acid and organic solvent.
JP17470680A 1980-12-12 1980-12-12 Seethrough mask Granted JPS5799643A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17470680A JPS5799643A (en) 1980-12-12 1980-12-12 Seethrough mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17470680A JPS5799643A (en) 1980-12-12 1980-12-12 Seethrough mask

Publications (2)

Publication Number Publication Date
JPS5799643A true JPS5799643A (en) 1982-06-21
JPS6154214B2 JPS6154214B2 (en) 1986-11-21

Family

ID=15983230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17470680A Granted JPS5799643A (en) 1980-12-12 1980-12-12 Seethrough mask

Country Status (1)

Country Link
JP (1) JPS5799643A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928156A (en) * 1982-12-29 1984-02-14 Konishiroku Photo Ind Co Ltd Manufacture of exposure mask
FR2589593A1 (en) * 1985-08-09 1987-05-07 Pichot Michel Lithography mask, process for manufacturing this mask and process for manufacturing an integrated circuit with the aid of the said mask
FR2606210A1 (en) * 1986-10-30 1988-05-06 Devine Roderick Process for the manufacture of a photolithogravure (photogravure) mask and mask obtained
US7507039B2 (en) * 2002-02-28 2009-03-24 Fujitsu Limited Dynamic pressure bearing manufacturing method, dynamic pressure bearing and dynamic pressure bearing manufacturing device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928156A (en) * 1982-12-29 1984-02-14 Konishiroku Photo Ind Co Ltd Manufacture of exposure mask
JPH0548464B2 (en) * 1982-12-29 1993-07-21 Konishiroku Photo Ind
FR2589593A1 (en) * 1985-08-09 1987-05-07 Pichot Michel Lithography mask, process for manufacturing this mask and process for manufacturing an integrated circuit with the aid of the said mask
FR2606210A1 (en) * 1986-10-30 1988-05-06 Devine Roderick Process for the manufacture of a photolithogravure (photogravure) mask and mask obtained
US7507039B2 (en) * 2002-02-28 2009-03-24 Fujitsu Limited Dynamic pressure bearing manufacturing method, dynamic pressure bearing and dynamic pressure bearing manufacturing device

Also Published As

Publication number Publication date
JPS6154214B2 (en) 1986-11-21

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