JPS5796551A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5796551A
JPS5796551A JP55173523A JP17352380A JPS5796551A JP S5796551 A JPS5796551 A JP S5796551A JP 55173523 A JP55173523 A JP 55173523A JP 17352380 A JP17352380 A JP 17352380A JP S5796551 A JPS5796551 A JP S5796551A
Authority
JP
Japan
Prior art keywords
photoresist
metal film
lifting
thermal processing
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55173523A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6258542B2 (enExample
Inventor
Koichi Higuchi
Masaaki Ohira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55173523A priority Critical patent/JPS5796551A/ja
Publication of JPS5796551A publication Critical patent/JPS5796551A/ja
Publication of JPS6258542B2 publication Critical patent/JPS6258542B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP55173523A 1980-12-09 1980-12-09 Manufacture of semiconductor device Granted JPS5796551A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55173523A JPS5796551A (en) 1980-12-09 1980-12-09 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55173523A JPS5796551A (en) 1980-12-09 1980-12-09 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5796551A true JPS5796551A (en) 1982-06-15
JPS6258542B2 JPS6258542B2 (enExample) 1987-12-07

Family

ID=15962097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55173523A Granted JPS5796551A (en) 1980-12-09 1980-12-09 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5796551A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120539A (ja) * 1983-11-30 1985-06-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 導電体パタ−ンの形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5394184A (en) * 1977-01-28 1978-08-17 Fujitsu Ltd Pattern forming method by lift-off

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5394184A (en) * 1977-01-28 1978-08-17 Fujitsu Ltd Pattern forming method by lift-off

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120539A (ja) * 1983-11-30 1985-06-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 導電体パタ−ンの形成方法

Also Published As

Publication number Publication date
JPS6258542B2 (enExample) 1987-12-07

Similar Documents

Publication Publication Date Title
JPS5240969A (en) Process for production of semiconductor device
JPS57157249A (en) Preparation of optical exposure mask
JPS5591130A (en) Production of semiconductor device
JPS5559741A (en) Preparation of semiconductor device
JPS5437581A (en) Wafer etching device
JPS5568655A (en) Manufacturing method of wiring
JPS5493971A (en) Production of semiconductor device
JPS5493970A (en) Patttern forming method of multi-layer metallic thin film
JPS559415A (en) Semiconductor manufacturing method
JPS5797629A (en) Manufacture of semiconductor device
JPS5679451A (en) Production of semiconductor device
JPS5329673A (en) Production of semiconductor device
JPS5483771A (en) Manufacture of semiconductor device
JPS6484224A (en) Electrode forming method
JPS5492265A (en) Production of thermal head
JPS55130148A (en) Forming method of bump electrode
JPS57128033A (en) Forming method for electrode wire of semiconductor device
JPS5494880A (en) Circuit pattern forming method of semiconductor device
JPS5466348A (en) Forming method for metal film
JPS5226169A (en) Photoetching method of silicone oxide layer
JPS5544767A (en) Formation of electrode pattern
JPS5585030A (en) Forming method for electrode of semiconductor device
JPS5612743A (en) Processing method of projection for conductive layer of substrate
JPS53112054A (en) Gas discharging panel
JPS5527662A (en) Method of manufacturing semiconductor device