JPS5793544A - Manufacture of compound semiconductor device - Google Patents
Manufacture of compound semiconductor deviceInfo
- Publication number
- JPS5793544A JPS5793544A JP17007580A JP17007580A JPS5793544A JP S5793544 A JPS5793544 A JP S5793544A JP 17007580 A JP17007580 A JP 17007580A JP 17007580 A JP17007580 A JP 17007580A JP S5793544 A JPS5793544 A JP S5793544A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- layer
- type
- gap
- pellets
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Weting (AREA)
- Dicing (AREA)
Abstract
PURPOSE:To etch the side face of a pellet without isolation of an electrode by dividing a GaP crystal having p-n junction into pellets with p type side electrode material of the crystal with aluminum and then treating it with acid containing hydrogen peroxide and sulfuric acid. CONSTITUTION:A Te-doped n tye GaP epitaxial layer 4 and a Zn, O-doped p type GaP epitaxial layer 3 are grown in liquid phase on an n type GaP substate 5 to form red light emitting diode epitaxial wafers. Then, Zn is diffused from the surface of the layer 3 by a sealing tube diffusion method to form a p<+> type layer 2 of 2mum thick, and subsequently an aluminum electrode 1 is formed on the surface, and an AuSi electrode 6 is covered on the back surface. To divide the substrate 5 into pellets, it is diced, is then treated in an etchant containing a mixture of sulfuric acid:hydrogen peroxide:water=1:1:1 at 60 deg.C, and a strain layer 7 produced at the side face of the pellet is effectively removed by dicing. The electrode 1 is not corroded with this etchant.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17007580A JPS5793544A (en) | 1980-12-02 | 1980-12-02 | Manufacture of compound semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17007580A JPS5793544A (en) | 1980-12-02 | 1980-12-02 | Manufacture of compound semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5793544A true JPS5793544A (en) | 1982-06-10 |
Family
ID=15898169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17007580A Pending JPS5793544A (en) | 1980-12-02 | 1980-12-02 | Manufacture of compound semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5793544A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63266851A (en) * | 1987-04-24 | 1988-11-02 | Mitsubishi Monsanto Chem Co | Semiconductor device isolation method |
WO2007015354A1 (en) * | 2005-08-01 | 2007-02-08 | Sharp Kabushiki Kaisha | Method for manufacturing photoelectric converter and photoelectric converter |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5140785A (en) * | 1974-10-04 | 1976-04-05 | Ise Electronics Corp | |
JPS54100278A (en) * | 1978-01-24 | 1979-08-07 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
-
1980
- 1980-12-02 JP JP17007580A patent/JPS5793544A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5140785A (en) * | 1974-10-04 | 1976-04-05 | Ise Electronics Corp | |
JPS54100278A (en) * | 1978-01-24 | 1979-08-07 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63266851A (en) * | 1987-04-24 | 1988-11-02 | Mitsubishi Monsanto Chem Co | Semiconductor device isolation method |
WO2007015354A1 (en) * | 2005-08-01 | 2007-02-08 | Sharp Kabushiki Kaisha | Method for manufacturing photoelectric converter and photoelectric converter |
JP2007042739A (en) * | 2005-08-01 | 2007-02-15 | Sharp Corp | Photoelectric conversion device and method of manufacturing the same |
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