JPS5789241A - Fabrication of semiconductor - Google Patents
Fabrication of semiconductorInfo
- Publication number
- JPS5789241A JPS5789241A JP16550580A JP16550580A JPS5789241A JP S5789241 A JPS5789241 A JP S5789241A JP 16550580 A JP16550580 A JP 16550580A JP 16550580 A JP16550580 A JP 16550580A JP S5789241 A JPS5789241 A JP S5789241A
- Authority
- JP
- Japan
- Prior art keywords
- field
- layer
- aluminum
- polysilicon
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
Abstract
PURPOSE:To prevent breakage of aluminum interconnections by a construction of polysilicon buried in a field layer flush with the field surface. CONSTITUTION:After a field layer 4 is formed on a substrate 5, a groove is produced at a patterned area for polysilicon on the field by photolithographic etching process. A polysilicon layer 1 as thick as the groove depth is built in the groove on the field completely flush with the surface by CVD process. After making P<+> and N<+> diffusion, an interlayer insulation layer 3 is deposited, a layer of aluminum is provided by evaporation or other methods over the surface for interconnection afrer a contact hole is formed by etching. In such a construction, possible breakage of aluminum interconnections can be prevented because flatness of the aluminum coating is maintained on the field.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16550580A JPS5789241A (en) | 1980-11-25 | 1980-11-25 | Fabrication of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16550580A JPS5789241A (en) | 1980-11-25 | 1980-11-25 | Fabrication of semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5789241A true JPS5789241A (en) | 1982-06-03 |
Family
ID=15813660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16550580A Pending JPS5789241A (en) | 1980-11-25 | 1980-11-25 | Fabrication of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5789241A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4329518A1 (en) * | 1993-08-28 | 1994-01-05 | Slamecka Ernst | Vacuum switch contact assembly - has piston unit with electrode and contact disc arrangement set into end surface and having low conductivity |
-
1980
- 1980-11-25 JP JP16550580A patent/JPS5789241A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4329518A1 (en) * | 1993-08-28 | 1994-01-05 | Slamecka Ernst | Vacuum switch contact assembly - has piston unit with electrode and contact disc arrangement set into end surface and having low conductivity |
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