JPS5788774A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5788774A JPS5788774A JP55164543A JP16454380A JPS5788774A JP S5788774 A JPS5788774 A JP S5788774A JP 55164543 A JP55164543 A JP 55164543A JP 16454380 A JP16454380 A JP 16454380A JP S5788774 A JPS5788774 A JP S5788774A
- Authority
- JP
- Japan
- Prior art keywords
- gate
- capacitor
- electrostatic breakdown
- output
- interposing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
Abstract
PURPOSE:To prevent electrostatic breakdown by a semiconductor device without reducing output level and without increasing the occupying area of chip by a method wherein a capacitor utilizing line capacity of multilayer wiring is added for prevention of electrostatic breakdown between a gate and the output part of an output stage MOS structure. CONSTITUTION:The gate electrode 3 is formed on an Si substrate 1 interposing a gate insulating film 2 between them, and moreover the upper part of the gate electrode 3 is made as to be covered with a drain electrode 5 interposing an interlayer insulating film 4 between them to form a capacitor C1. When electrostatic input E is applied to the drain of a buffer for output of the output stage MOSFET constituted by this way, electric potential of the gate is made to rise by division of capacitance with a capacitor C2 between the substrate-gate and the capacitor C1, a time constant to make electric charge of the gate to be discharged through a prebuffer DMOSFET is formed, and prevention of electrostatic breakdown can be enabled. Accordingly electrostatic breakdown can be prevented effectively without reducing output level, and without increasing the occupying area of chipe.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55164543A JPS5788774A (en) | 1980-11-25 | 1980-11-25 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55164543A JPS5788774A (en) | 1980-11-25 | 1980-11-25 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5788774A true JPS5788774A (en) | 1982-06-02 |
JPH0478022B2 JPH0478022B2 (en) | 1992-12-10 |
Family
ID=15795149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55164543A Granted JPS5788774A (en) | 1980-11-25 | 1980-11-25 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5788774A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4636833A (en) * | 1983-03-18 | 1987-01-13 | Hitachi, Ltd. | Semiconductor device |
JPS62219959A (en) * | 1986-03-20 | 1987-09-28 | Fujitsu Ltd | Mos integrated circuit |
US4786881A (en) * | 1987-08-27 | 1988-11-22 | General Electric Company | Amplifier with integrated feedback network |
JPH08298292A (en) * | 1996-06-14 | 1996-11-12 | Matsushita Electron Corp | Semiconductor integrated circuit |
JP2007273689A (en) * | 2006-03-31 | 2007-10-18 | Denso Corp | Semiconductor device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5369589A (en) * | 1976-12-03 | 1978-06-21 | Mitsubishi Electric Corp | Insulating gate type field effect transistor with protective device |
-
1980
- 1980-11-25 JP JP55164543A patent/JPS5788774A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5369589A (en) * | 1976-12-03 | 1978-06-21 | Mitsubishi Electric Corp | Insulating gate type field effect transistor with protective device |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4636833A (en) * | 1983-03-18 | 1987-01-13 | Hitachi, Ltd. | Semiconductor device |
JPS62219959A (en) * | 1986-03-20 | 1987-09-28 | Fujitsu Ltd | Mos integrated circuit |
US4786881A (en) * | 1987-08-27 | 1988-11-22 | General Electric Company | Amplifier with integrated feedback network |
JPH08298292A (en) * | 1996-06-14 | 1996-11-12 | Matsushita Electron Corp | Semiconductor integrated circuit |
JP2007273689A (en) * | 2006-03-31 | 2007-10-18 | Denso Corp | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPH0478022B2 (en) | 1992-12-10 |
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