JPS5788028A - Formation of electrically conductive transparent film of indium oxide - Google Patents
Formation of electrically conductive transparent film of indium oxideInfo
- Publication number
- JPS5788028A JPS5788028A JP15943880A JP15943880A JPS5788028A JP S5788028 A JPS5788028 A JP S5788028A JP 15943880 A JP15943880 A JP 15943880A JP 15943880 A JP15943880 A JP 15943880A JP S5788028 A JPS5788028 A JP S5788028A
- Authority
- JP
- Japan
- Prior art keywords
- electrically conductive
- transparent film
- conductive transparent
- sputtering
- in2o3
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Electric Cables (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15943880A JPS5788028A (en) | 1980-11-14 | 1980-11-14 | Formation of electrically conductive transparent film of indium oxide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15943880A JPS5788028A (en) | 1980-11-14 | 1980-11-14 | Formation of electrically conductive transparent film of indium oxide |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5788028A true JPS5788028A (en) | 1982-06-01 |
JPS6354788B2 JPS6354788B2 (enrdf_load_stackoverflow) | 1988-10-31 |
Family
ID=15693749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15943880A Granted JPS5788028A (en) | 1980-11-14 | 1980-11-14 | Formation of electrically conductive transparent film of indium oxide |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5788028A (enrdf_load_stackoverflow) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2555613A1 (fr) * | 1983-11-30 | 1985-05-31 | Ppg Industries Inc | Procede pour la pulverisation cathodique sur un support d'une pellicule d'oxyde d'indium de basse resistance |
JPS6116153A (ja) * | 1984-06-29 | 1986-01-24 | Toyota Motor Corp | 自動車用導電性透明部材 |
JPS63456A (ja) * | 1986-06-20 | 1988-01-05 | Tdk Corp | 太陽電池用透明導岩膜の製造方法 |
JPH07152041A (ja) * | 1993-11-26 | 1995-06-16 | Casio Comput Co Ltd | 配線を有する電子デバイス |
KR100744017B1 (ko) * | 2001-06-26 | 2007-07-30 | 미츠이 긴조쿠 고교 가부시키가이샤 | 고저항 투명 도전막용 스퍼터링 타겟 및 고저항 투명도전막의 제조방법 |
JP2010284873A (ja) * | 2009-06-11 | 2010-12-24 | Asahi Glass Co Ltd | 熱線反射性透明材料、熱線反射性透明材料の製造方法及び熱線反射性透明材料を備えた温室 |
RU2693982C2 (ru) * | 2014-05-30 | 2019-07-08 | ПиПиДжи ИНДАСТРИЗ ОГАЙО, ИНК. | Прозрачный проводящий оксид олова, легированный индием |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5469183A (en) * | 1977-11-15 | 1979-06-02 | Asahi Glass Co Ltd | Preparation of transparent, electrically-conductive plastic |
-
1980
- 1980-11-14 JP JP15943880A patent/JPS5788028A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5469183A (en) * | 1977-11-15 | 1979-06-02 | Asahi Glass Co Ltd | Preparation of transparent, electrically-conductive plastic |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2555613A1 (fr) * | 1983-11-30 | 1985-05-31 | Ppg Industries Inc | Procede pour la pulverisation cathodique sur un support d'une pellicule d'oxyde d'indium de basse resistance |
JPS60138068A (ja) * | 1983-11-30 | 1985-07-22 | ピーピージー・インダストリーズ・インコーポレーテツド | 低抵抗性金属酸化物含有フイルムの形成法 |
JPS6116153A (ja) * | 1984-06-29 | 1986-01-24 | Toyota Motor Corp | 自動車用導電性透明部材 |
JPS63456A (ja) * | 1986-06-20 | 1988-01-05 | Tdk Corp | 太陽電池用透明導岩膜の製造方法 |
JPH07152041A (ja) * | 1993-11-26 | 1995-06-16 | Casio Comput Co Ltd | 配線を有する電子デバイス |
KR100744017B1 (ko) * | 2001-06-26 | 2007-07-30 | 미츠이 긴조쿠 고교 가부시키가이샤 | 고저항 투명 도전막용 스퍼터링 타겟 및 고저항 투명도전막의 제조방법 |
JP2010284873A (ja) * | 2009-06-11 | 2010-12-24 | Asahi Glass Co Ltd | 熱線反射性透明材料、熱線反射性透明材料の製造方法及び熱線反射性透明材料を備えた温室 |
RU2693982C2 (ru) * | 2014-05-30 | 2019-07-08 | ПиПиДжи ИНДАСТРИЗ ОГАЙО, ИНК. | Прозрачный проводящий оксид олова, легированный индием |
US12338525B2 (en) | 2014-05-30 | 2025-06-24 | Ppg Industries Ohio, Inc. | Transparent conducting indium doped tin oxide |
Also Published As
Publication number | Publication date |
---|---|
JPS6354788B2 (enrdf_load_stackoverflow) | 1988-10-31 |
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