JPS5783029A - Exposure of electron beam - Google Patents

Exposure of electron beam

Info

Publication number
JPS5783029A
JPS5783029A JP55158397A JP15839780A JPS5783029A JP S5783029 A JPS5783029 A JP S5783029A JP 55158397 A JP55158397 A JP 55158397A JP 15839780 A JP15839780 A JP 15839780A JP S5783029 A JPS5783029 A JP S5783029A
Authority
JP
Japan
Prior art keywords
irradiation
patterns
electron beam
scattering
doughnut
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55158397A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6262046B2 (enExample
Inventor
Noriaki Nakayama
Shigeru Furuya
Yasuhide Machida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55158397A priority Critical patent/JPS5783029A/ja
Publication of JPS5783029A publication Critical patent/JPS5783029A/ja
Publication of JPS6262046B2 publication Critical patent/JPS6262046B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP55158397A 1980-11-11 1980-11-11 Exposure of electron beam Granted JPS5783029A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55158397A JPS5783029A (en) 1980-11-11 1980-11-11 Exposure of electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55158397A JPS5783029A (en) 1980-11-11 1980-11-11 Exposure of electron beam

Publications (2)

Publication Number Publication Date
JPS5783029A true JPS5783029A (en) 1982-05-24
JPS6262046B2 JPS6262046B2 (enExample) 1987-12-24

Family

ID=15670841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55158397A Granted JPS5783029A (en) 1980-11-11 1980-11-11 Exposure of electron beam

Country Status (1)

Country Link
JP (1) JPS5783029A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58210616A (ja) * 1982-05-31 1983-12-07 Toshiba Corp 電子ビ−ム描画方法
JPS58210617A (ja) * 1982-05-31 1983-12-07 Toshiba Corp 電子ビ−ム描画方法
JPH02220426A (ja) * 1989-02-21 1990-09-03 Matsushita Electric Ind Co Ltd 電子ビーム露光方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58210616A (ja) * 1982-05-31 1983-12-07 Toshiba Corp 電子ビ−ム描画方法
JPS58210617A (ja) * 1982-05-31 1983-12-07 Toshiba Corp 電子ビ−ム描画方法
JPH02220426A (ja) * 1989-02-21 1990-09-03 Matsushita Electric Ind Co Ltd 電子ビーム露光方法

Also Published As

Publication number Publication date
JPS6262046B2 (enExample) 1987-12-24

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