JPS5776870A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS5776870A JPS5776870A JP55152671A JP15267180A JPS5776870A JP S5776870 A JPS5776870 A JP S5776870A JP 55152671 A JP55152671 A JP 55152671A JP 15267180 A JP15267180 A JP 15267180A JP S5776870 A JPS5776870 A JP S5776870A
- Authority
- JP
- Japan
- Prior art keywords
- base
- layer
- gate
- collector
- leakage current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 2
- 229910052796 boron Inorganic materials 0.000 abstract 2
- 238000002347 injection Methods 0.000 abstract 2
- 239000007924 injection Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910052785 arsenic Inorganic materials 0.000 abstract 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
- H01L27/0229—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
- H01L27/0233—Integrated injection logic structures [I2L]
- H01L27/0244—I2L structures integrated in combination with analog structures
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
Abstract
PURPOSE:To eliminate a leakage current between a collector and a base by a method wherein an activated base layer of an I<2>L gate is formed deeper than that of a linear transistor (Tr) and a collector layer of the I<2>L gate is formed shallower than an emitter layer of Tr. CONSTITUTION:Buried layers 221, 222, an epitaxial layer 23 and field oxide layers 241, 242, 243 are formed on a p type silicon substrate 21. A p<+> type activated base layer 26 is formed at a deep position by selective ion-injection of boron. A base 27 of a linear transistor is also formed. Then arsenic doped polycrystalline silicon layers 331-335 are formed and p<+> base regions 39, 41 and an injector 40 are formed by boron injection. Electrodes 45-49 are formed by formation of contact holes 42, 43, 441, 442, 443. With above method, a leakage current between the collector and the base of the I<2>L gate can be eliminated and the linear circuit can coexist together.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55152671A JPS5776870A (en) | 1980-10-30 | 1980-10-30 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55152671A JPS5776870A (en) | 1980-10-30 | 1980-10-30 | Semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5776870A true JPS5776870A (en) | 1982-05-14 |
Family
ID=15545548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55152671A Pending JPS5776870A (en) | 1980-10-30 | 1980-10-30 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5776870A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59152665A (en) * | 1983-02-21 | 1984-08-31 | Nec Corp | Semiconductor device and manufacture thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS501675A (en) * | 1973-05-07 | 1975-01-09 | ||
JPS502477A (en) * | 1973-05-07 | 1975-01-11 | ||
JPS53121587A (en) * | 1977-03-31 | 1978-10-24 | Toshiba Corp | Semiconductor device |
-
1980
- 1980-10-30 JP JP55152671A patent/JPS5776870A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS501675A (en) * | 1973-05-07 | 1975-01-09 | ||
JPS502477A (en) * | 1973-05-07 | 1975-01-11 | ||
JPS53121587A (en) * | 1977-03-31 | 1978-10-24 | Toshiba Corp | Semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59152665A (en) * | 1983-02-21 | 1984-08-31 | Nec Corp | Semiconductor device and manufacture thereof |
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