JPS53121587A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS53121587A JPS53121587A JP3669777A JP3669777A JPS53121587A JP S53121587 A JPS53121587 A JP S53121587A JP 3669777 A JP3669777 A JP 3669777A JP 3669777 A JP3669777 A JP 3669777A JP S53121587 A JPS53121587 A JP S53121587A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- securing
- concentration
- base region
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
- H01L27/0229—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
- H01L27/0233—Integrated injection logic structures [I2L]
- H01L27/0244—I2L structures integrated in combination with analog structures
Abstract
PURPOSE:To ensure a high-speed operation for the semiconductor device, by securing a low-concentration and deep layer at the area right under the collector region among the base region of first TR in the device formed through intergation of the I<2>L containing first vertical transistor TR of reverse structure and second vertical bipolar TR and while securing a high-concentration and shallow layer at the area surrounding the collector region and the base region of second TR respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3669777A JPS53121587A (en) | 1977-03-31 | 1977-03-31 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3669777A JPS53121587A (en) | 1977-03-31 | 1977-03-31 | Semiconductor device |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61002213A Division JPS61263149A (en) | 1986-01-10 | 1986-01-10 | Manufacture of semiconductor device |
JP61002214A Division JPS61263150A (en) | 1986-01-10 | 1986-01-10 | Manufacture of semiconductor device |
JP61002212A Division JPS61263148A (en) | 1986-01-10 | 1986-01-10 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53121587A true JPS53121587A (en) | 1978-10-24 |
JPS5711504B2 JPS5711504B2 (en) | 1982-03-04 |
Family
ID=12476963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3669777A Granted JPS53121587A (en) | 1977-03-31 | 1977-03-31 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53121587A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5527697A (en) * | 1978-08-11 | 1980-02-27 | Siemens Ag | Bipolar semiconductor integrated circuit and method of manufacturing same |
JPS5710966A (en) * | 1980-06-25 | 1982-01-20 | Mitsubishi Electric Corp | Manufacture of semiconductor integrated circuit device |
JPS5763853A (en) * | 1980-10-06 | 1982-04-17 | Matsushita Electric Ind Co Ltd | Semiconductor intergrated circuit and preparing method therefor |
JPS5776870A (en) * | 1980-10-30 | 1982-05-14 | Toshiba Corp | Semiconductor integrated circuit |
JPS62245708A (en) * | 1986-04-17 | 1987-10-27 | Sanyo Electric Co Ltd | Current mirror circuit |
US5661066A (en) * | 1980-12-17 | 1997-08-26 | Matsushita Electric Industrial Co., Ltd. | Semiconductor integrated circuit |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5350686A (en) * | 1976-10-19 | 1978-05-09 | Mitsubishi Electric Corp | Production of semiconductor integrated circuit |
-
1977
- 1977-03-31 JP JP3669777A patent/JPS53121587A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5350686A (en) * | 1976-10-19 | 1978-05-09 | Mitsubishi Electric Corp | Production of semiconductor integrated circuit |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5527697A (en) * | 1978-08-11 | 1980-02-27 | Siemens Ag | Bipolar semiconductor integrated circuit and method of manufacturing same |
JPS5710966A (en) * | 1980-06-25 | 1982-01-20 | Mitsubishi Electric Corp | Manufacture of semiconductor integrated circuit device |
JPS5763853A (en) * | 1980-10-06 | 1982-04-17 | Matsushita Electric Ind Co Ltd | Semiconductor intergrated circuit and preparing method therefor |
JPS5776870A (en) * | 1980-10-30 | 1982-05-14 | Toshiba Corp | Semiconductor integrated circuit |
US5661066A (en) * | 1980-12-17 | 1997-08-26 | Matsushita Electric Industrial Co., Ltd. | Semiconductor integrated circuit |
JPS62245708A (en) * | 1986-04-17 | 1987-10-27 | Sanyo Electric Co Ltd | Current mirror circuit |
JPH0528910B2 (en) * | 1986-04-17 | 1993-04-27 | Sanyo Electric Co |
Also Published As
Publication number | Publication date |
---|---|
JPS5711504B2 (en) | 1982-03-04 |
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