JPS5766644A - Pattern forming method by lift-off - Google Patents
Pattern forming method by lift-offInfo
- Publication number
- JPS5766644A JPS5766644A JP14181880A JP14181880A JPS5766644A JP S5766644 A JPS5766644 A JP S5766644A JP 14181880 A JP14181880 A JP 14181880A JP 14181880 A JP14181880 A JP 14181880A JP S5766644 A JPS5766644 A JP S5766644A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- remaining
- substrate
- lift
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 abstract 5
- 239000000758 substrate Substances 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14181880A JPS5766644A (en) | 1980-10-09 | 1980-10-09 | Pattern forming method by lift-off |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14181880A JPS5766644A (en) | 1980-10-09 | 1980-10-09 | Pattern forming method by lift-off |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5766644A true JPS5766644A (en) | 1982-04-22 |
Family
ID=15300835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14181880A Pending JPS5766644A (en) | 1980-10-09 | 1980-10-09 | Pattern forming method by lift-off |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5766644A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6292472A (ja) * | 1985-10-18 | 1987-04-27 | Sanyo Electric Co Ltd | 薄膜トランジスタの製造方法 |
-
1980
- 1980-10-09 JP JP14181880A patent/JPS5766644A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6292472A (ja) * | 1985-10-18 | 1987-04-27 | Sanyo Electric Co Ltd | 薄膜トランジスタの製造方法 |
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