JPS5754265A - Kinzokuhimakukeiseihoho - Google Patents
KinzokuhimakukeiseihohoInfo
- Publication number
- JPS5754265A JPS5754265A JP12945480A JP12945480A JPS5754265A JP S5754265 A JPS5754265 A JP S5754265A JP 12945480 A JP12945480 A JP 12945480A JP 12945480 A JP12945480 A JP 12945480A JP S5754265 A JPS5754265 A JP S5754265A
- Authority
- JP
- Japan
- Prior art keywords
- mask sheet
- substrate
- spacers
- metal film
- forming method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/143—Masks therefor
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12945480A JPS5754265A (ja) | 1980-09-18 | 1980-09-18 | Kinzokuhimakukeiseihoho |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12945480A JPS5754265A (ja) | 1980-09-18 | 1980-09-18 | Kinzokuhimakukeiseihoho |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5754265A true JPS5754265A (ja) | 1982-03-31 |
Family
ID=15009878
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12945480A Pending JPS5754265A (ja) | 1980-09-18 | 1980-09-18 | Kinzokuhimakukeiseihoho |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5754265A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0219873A2 (en) * | 1985-10-23 | 1987-04-29 | GTE Products Corporation | Mask for patterning electrode structures in thin film EL devices |
EP0219872A2 (en) * | 1985-10-23 | 1987-04-29 | GTE Products Corporation | Mask assembly having mask stress relieving feature |
EP0220685A2 (en) * | 1985-10-23 | 1987-05-06 | GTE Products Corporation | Apparatus and method for registration of shadow masked thin-film patterns |
-
1980
- 1980-09-18 JP JP12945480A patent/JPS5754265A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0219873A2 (en) * | 1985-10-23 | 1987-04-29 | GTE Products Corporation | Mask for patterning electrode structures in thin film EL devices |
EP0219872A2 (en) * | 1985-10-23 | 1987-04-29 | GTE Products Corporation | Mask assembly having mask stress relieving feature |
EP0220685A2 (en) * | 1985-10-23 | 1987-05-06 | GTE Products Corporation | Apparatus and method for registration of shadow masked thin-film patterns |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS523583A (en) | Crystal film forming process | |
JPS5754265A (ja) | Kinzokuhimakukeiseihoho | |
JPS52105526A (en) | Treatment of cobalt base heat-resisting alloy | |
JPS5253658A (en) | Method of introducing impurity into semiconductor | |
JPS52182A (en) | Method of forming planar type fet electrodes | |
JPS51140560A (en) | Method of monitoring homoepitaxy film thickness | |
JPS57155539A (en) | Mask | |
JPS524167A (en) | Manufacturing process of p-n junction type solid element | |
JPS51120671A (en) | Photomask fault processing method | |
JPS51136286A (en) | Ion implantation using noncrystalline carchogenide thin film as mask | |
JPS5313200A (en) | Production method of piezo-electric thin film | |
JPS53108885A (en) | Evaporating device | |
JPS57204123A (en) | Forming method for resist stencil mask | |
JPS52147646A (en) | Method for uniformyly coating coating compounds on metal plates | |
JPS57192097A (en) | Formation of metal film | |
JPS5222587A (en) | Method for protective treatment of fluorescent substance | |
JPS51134393A (en) | Process for producing fluorescent material with ion bombardment resist ance | |
JPS5355143A (en) | Electrode forming method in full surface mirror type liquid crystal displaydevice | |
JPS5357974A (en) | Electron beam exposure method | |
JPS53112662A (en) | Growing unit for ion beam thin film | |
JPS5268384A (en) | Evaporation source | |
JPS5322165A (en) | Electrodialysis apparatus of filter press type | |
JPS52102681A (en) | Boat for evaporation by resistance heating | |
JPS5261797A (en) | Production of dielectric thin film | |
JPS53130261A (en) | Controlling method for shape of rolled metal |