JPS5749290A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPS5749290A JPS5749290A JP12570880A JP12570880A JPS5749290A JP S5749290 A JPS5749290 A JP S5749290A JP 12570880 A JP12570880 A JP 12570880A JP 12570880 A JP12570880 A JP 12570880A JP S5749290 A JPS5749290 A JP S5749290A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- region
- diffusion
- entire area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2237—Buried stripe structure with a non-planar active layer
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To make it possible to obtain a semiconductor laser device without using diffusion mask which would undesirably impart a stress to the epitaxial growth layer, by providing a method wherein the epitaxial layer is formed in a stepped manner and the diffusion layer is formed to a constant depth over the entire area. CONSTITUTION:A P type region or a region 13 of high resistance is formed on a part of the N type GaAS substrate 1 to produce a step. An N type AlGaAs layer 2a, N type GaAs active layer 3a, N type AlGaAs layer 4a and P type AlGaAs layer 5a are formed along the step by epitaxial growth method. Then, an N type GaAs layer 6a is superposed to eliminate the step. Then, Zn is diffused over the entire area from the surface to a contstant depth to form a P<+> type region 7 and an underlying P type region 8. A web-like P type layer 8 extends across the active layer 3a, N type layer 4a and the P type layer 5a at the stepped part. Then, electrodes 10 and 11 are formed on both surfaces and the structure is split along the chain lines. This method does not necessitate the use of any diffusion mask for selective diffusion, so that the deterioration of characteristics is avoided and a longer life is ensured. In addition, the level of threshold current is maintained low thanks to a reverse bias junction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12570880A JPS5749290A (en) | 1980-09-08 | 1980-09-08 | Semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12570880A JPS5749290A (en) | 1980-09-08 | 1980-09-08 | Semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5749290A true JPS5749290A (en) | 1982-03-23 |
Family
ID=14916762
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12570880A Pending JPS5749290A (en) | 1980-09-08 | 1980-09-08 | Semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5749290A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58222586A (en) * | 1982-06-18 | 1983-12-24 | Omron Tateisi Electronics Co | Semiconductor laser |
JPS5913388A (en) * | 1982-07-14 | 1984-01-24 | Omron Tateisi Electronics Co | Semiconductor laser array |
JPS5913387A (en) * | 1982-07-14 | 1984-01-24 | Omron Tateisi Electronics Co | Semiconductor laser |
JPS5914691A (en) * | 1982-07-16 | 1984-01-25 | Omron Tateisi Electronics Co | Semiconductor laser |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5410689A (en) * | 1977-06-24 | 1979-01-26 | Mitsubishi Electric Corp | Semiconductor laser device and its production |
JPS54150990A (en) * | 1978-05-18 | 1979-11-27 | Mitsubishi Electric Corp | Semiconductor laser device and its manufacture |
JPS55115388A (en) * | 1979-02-26 | 1980-09-05 | Mitsubishi Electric Corp | Manufacture of semiconductor laser device |
-
1980
- 1980-09-08 JP JP12570880A patent/JPS5749290A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5410689A (en) * | 1977-06-24 | 1979-01-26 | Mitsubishi Electric Corp | Semiconductor laser device and its production |
JPS54150990A (en) * | 1978-05-18 | 1979-11-27 | Mitsubishi Electric Corp | Semiconductor laser device and its manufacture |
JPS55115388A (en) * | 1979-02-26 | 1980-09-05 | Mitsubishi Electric Corp | Manufacture of semiconductor laser device |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58222586A (en) * | 1982-06-18 | 1983-12-24 | Omron Tateisi Electronics Co | Semiconductor laser |
JPS5913388A (en) * | 1982-07-14 | 1984-01-24 | Omron Tateisi Electronics Co | Semiconductor laser array |
JPS5913387A (en) * | 1982-07-14 | 1984-01-24 | Omron Tateisi Electronics Co | Semiconductor laser |
JPS5914691A (en) * | 1982-07-16 | 1984-01-25 | Omron Tateisi Electronics Co | Semiconductor laser |
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