JPS57186384A - Multipled wavelength type buried hetero-structure semiconductor laser array - Google Patents
Multipled wavelength type buried hetero-structure semiconductor laser arrayInfo
- Publication number
- JPS57186384A JPS57186384A JP7166181A JP7166181A JPS57186384A JP S57186384 A JPS57186384 A JP S57186384A JP 7166181 A JP7166181 A JP 7166181A JP 7166181 A JP7166181 A JP 7166181A JP S57186384 A JPS57186384 A JP S57186384A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- current block
- laser array
- grown successively
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To obtain the laser arrays, oscillating wavelengths therefrom largely differ, easily by mutually making the energy gaps of the active layers of adjacent lasers differ and using a section between the adjacent lasers as a current block layer. CONSTITUTION:An N type buffer layer 502, the active layer 503 having the composition of 1.3mum wavelengths and a P type clad layer 504 are grown successively onto an N type substrate 501. The surface is etched up to a section deeper than the layer 503 by using an SiO2 film 505 as an etching mask, and an N type buffer layer 506, the active layer 507 having the compositon of 1.5mum wavelength and a P type clad layer 508 are grown successively through epitaxial growth as the film 505 is left as it is. Mesas 509, 510, are shaped so as to leave the approximately central sections of the layers 503, 507. The P type current block layer 511, the N type current block layer 512, a P type clad layer 513 and an N type gap layer 514 are grown successively to a wafer etched in mesa form, and a P sid electrode 517 and an N side electrode 518 are shaped. Accordingly, the laser array having high performance is obtained because strain, etc. on the interface of growth are removed through mesa etching.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7166181A JPS57186384A (en) | 1981-05-12 | 1981-05-12 | Multipled wavelength type buried hetero-structure semiconductor laser array |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7166181A JPS57186384A (en) | 1981-05-12 | 1981-05-12 | Multipled wavelength type buried hetero-structure semiconductor laser array |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57186384A true JPS57186384A (en) | 1982-11-16 |
Family
ID=13467006
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7166181A Pending JPS57186384A (en) | 1981-05-12 | 1981-05-12 | Multipled wavelength type buried hetero-structure semiconductor laser array |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57186384A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61222190A (en) * | 1985-03-28 | 1986-10-02 | Nec Corp | Two-element quantum well structure semiconductor laser and manufacture thereof |
KR100540891B1 (en) * | 1999-12-27 | 2006-01-12 | 한국전자통신연구원 | Multi-wavelength Detectable Photodiode Array and Fabricating Method thereof |
-
1981
- 1981-05-12 JP JP7166181A patent/JPS57186384A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61222190A (en) * | 1985-03-28 | 1986-10-02 | Nec Corp | Two-element quantum well structure semiconductor laser and manufacture thereof |
KR100540891B1 (en) * | 1999-12-27 | 2006-01-12 | 한국전자통신연구원 | Multi-wavelength Detectable Photodiode Array and Fabricating Method thereof |
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