JPS5745232A - Device and method for developing - Google Patents

Device and method for developing

Info

Publication number
JPS5745232A
JPS5745232A JP55120052A JP12005280A JPS5745232A JP S5745232 A JPS5745232 A JP S5745232A JP 55120052 A JP55120052 A JP 55120052A JP 12005280 A JP12005280 A JP 12005280A JP S5745232 A JPS5745232 A JP S5745232A
Authority
JP
Japan
Prior art keywords
wafer
developing solution
frame body
solution
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55120052A
Other languages
English (en)
Japanese (ja)
Other versions
JPS623971B2 (enrdf_load_html_response
Inventor
Kenzo Hatada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP55120052A priority Critical patent/JPS5745232A/ja
Publication of JPS5745232A publication Critical patent/JPS5745232A/ja
Publication of JPS623971B2 publication Critical patent/JPS623971B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55120052A 1980-08-29 1980-08-29 Device and method for developing Granted JPS5745232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55120052A JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55120052A JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Publications (2)

Publication Number Publication Date
JPS5745232A true JPS5745232A (en) 1982-03-15
JPS623971B2 JPS623971B2 (enrdf_load_html_response) 1987-01-28

Family

ID=14776692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55120052A Granted JPS5745232A (en) 1980-08-29 1980-08-29 Device and method for developing

Country Status (1)

Country Link
JP (1) JPS5745232A (enrdf_load_html_response)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119451U (ja) * 1983-02-01 1984-08-11 セイコーインスツルメンツ株式会社 レジスト現像装置
JPS6010253U (ja) * 1983-06-30 1985-01-24 松下電工株式会社 防音リレ−
JPS61196535A (ja) * 1985-02-26 1986-08-30 Mitsubishi Electric Corp 半導体製造装置
JPS61251134A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 自動現像装置
JPS62117324A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPS62117323A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPS62269316A (ja) * 1986-05-19 1987-11-21 Kurotani Iwao 半導体材料の現像処理装置
JPS63168026A (ja) * 1986-12-29 1988-07-12 Tokyo Electron Ltd 現像方法
JPS63271930A (ja) * 1987-04-28 1988-11-09 Tokyo Electron Ltd 現像装置
US4855775A (en) * 1987-04-28 1989-08-08 Tokyo Electron Limited Developing apparatus
JPH0210824A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 電子線レジスト現像方法
JPH02246319A (ja) * 1989-03-20 1990-10-02 Toppan Printing Co Ltd 現像装置および現像方法
JPH07263338A (ja) * 1995-01-27 1995-10-13 Tokyo Electron Ltd 現像装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969756A (en) * 1990-03-19 1990-11-13 General Motors Corporation Motor driven actuator speed control

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4725976U (enrdf_load_html_response) * 1971-04-21 1972-11-24
JPS55108742U (enrdf_load_html_response) * 1979-01-25 1980-07-30

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4725976U (enrdf_load_html_response) * 1971-04-21 1972-11-24
JPS55108742U (enrdf_load_html_response) * 1979-01-25 1980-07-30

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119451U (ja) * 1983-02-01 1984-08-11 セイコーインスツルメンツ株式会社 レジスト現像装置
JPS6010253U (ja) * 1983-06-30 1985-01-24 松下電工株式会社 防音リレ−
JPS61196535A (ja) * 1985-02-26 1986-08-30 Mitsubishi Electric Corp 半導体製造装置
JPS61251134A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 自動現像装置
JPS62117324A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPS62117323A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPS62269316A (ja) * 1986-05-19 1987-11-21 Kurotani Iwao 半導体材料の現像処理装置
JPS63168026A (ja) * 1986-12-29 1988-07-12 Tokyo Electron Ltd 現像方法
JPS63271930A (ja) * 1987-04-28 1988-11-09 Tokyo Electron Ltd 現像装置
US4855775A (en) * 1987-04-28 1989-08-08 Tokyo Electron Limited Developing apparatus
JPH0210824A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 電子線レジスト現像方法
JPH02246319A (ja) * 1989-03-20 1990-10-02 Toppan Printing Co Ltd 現像装置および現像方法
JPH07263338A (ja) * 1995-01-27 1995-10-13 Tokyo Electron Ltd 現像装置

Also Published As

Publication number Publication date
JPS623971B2 (enrdf_load_html_response) 1987-01-28

Similar Documents

Publication Publication Date Title
JPS5745232A (en) Device and method for developing
JPS57117669A (en) Method and apparatus for uniformly applying liquid treating bath to fiber flat molded body
FR2275256A1 (fr) Appareil et procede pour traiter une surface, en particulier pour pulveriser une mousse isolante sur une paroi
YU204477A (en) Process for rinsing articles after a chemical and electrochemical treatment of the surface
JPS56134261A (en) Substrate having visual surface effect , method and apparatus for producing same
ATE30804T1 (de) Verfahren zum dekontaminieren der oberflaeche eines gegenstands.
JPS57192955A (en) Developing method
JPS551114A (en) Method and device for washing wafer
GB2123952B (en) Apparatus for and method of measuring the evenness of a surface
GB2018610B (en) Apparatus for the treatment of liquids and method for cleaning a layer of fibres in such an apparatus
JPS55124232A (en) Application method of substrate treatment solution and the device therefor
JPS5363695A (en) Method of finish polishing
FR2308425A1 (fr) Procede et appareil permettant d'appliquer une matiere lubrifiante sur un substrat metallique
JPS571902A (en) Method and apparatus for measuring wafer thickness for wafer lapping machine
JPS5357596A (en) Grinding method of roll
JPS5364472A (en) Processing apparatus
GB1550318A (en) Apparatus for treating articles with a liquid
JPS57194828A (en) Method and apparatus for dressing electrode in electrospark machining device
JPS52156176A (en) Surface washing method of liquid treating membrane
JPS57154854A (en) Processing device for plate type material
JPS5721966A (en) Continuous ruggedly forming method by electron beam irradiation
IL50564A0 (en) A machine for injection of liquid into the surface of soil and method for stabilizing soil
JPS53148857A (en) Method and device for washing concrete residues in concrete mixer
JPS6476054A (en) Process for developing graphic photosensitive material providing improved uniformity of development
JPS51151081A (en) Mos type semiconductor apparatus and that manufacturing method