JPS5740973A - Inverter circuit and manufacture therefor - Google Patents
Inverter circuit and manufacture thereforInfo
- Publication number
- JPS5740973A JPS5740973A JP55116559A JP11655980A JPS5740973A JP S5740973 A JPS5740973 A JP S5740973A JP 55116559 A JP55116559 A JP 55116559A JP 11655980 A JP11655980 A JP 11655980A JP S5740973 A JPS5740973 A JP S5740973A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- region
- resistance element
- oxygen
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
Abstract
PURPOSE:To provide an inverter circuit which enables high integration using resistance element as load, by a method wherein an island-shaped semiconductor layer is separated to upper and lower layers by an insulation layer, and the lower part is used as a resistance element while a transistor is provided in the upper part, which are connected with each other. CONSTITUTION:An island-shaped N type silicon layer 3 which is insulated at the circumference by a field oxide film 2 is formed on a sapphire substrate 1, and an oxygen-ion layer 5 is formed therein. Then heat treatment is applied to make the oxygen ion injected layer react with silicon to yield SiO2 forming an insulation layer 6 to separate a lower silicon layer region 3 as a resistance element and an upper silicon layer region 32. The regions 31 and 32 are connected as one part by the portion 33 where oxygen-ion was not injected. Then a gate oxide film 7 is formed, and after forming a P type channel region 8 in the region 32, a gate terminal 9 is formed. Then an N<+> type source 10 and drain 11 are formed in the region 32 to make an MOS-transistor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55116559A JPS5740973A (en) | 1980-08-25 | 1980-08-25 | Inverter circuit and manufacture therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55116559A JPS5740973A (en) | 1980-08-25 | 1980-08-25 | Inverter circuit and manufacture therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5740973A true JPS5740973A (en) | 1982-03-06 |
Family
ID=14690102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55116559A Pending JPS5740973A (en) | 1980-08-25 | 1980-08-25 | Inverter circuit and manufacture therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5740973A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5893282A (en) * | 1981-11-30 | 1983-06-02 | Seiko Epson Corp | Thin film semiconductor element |
JPH08368U (en) * | 1992-02-07 | 1996-02-20 | 日本電子株式会社 | Frequency generation method for NMR apparatus |
-
1980
- 1980-08-25 JP JP55116559A patent/JPS5740973A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5893282A (en) * | 1981-11-30 | 1983-06-02 | Seiko Epson Corp | Thin film semiconductor element |
JPH08368U (en) * | 1992-02-07 | 1996-02-20 | 日本電子株式会社 | Frequency generation method for NMR apparatus |
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