JPS5730332A - Method of etching - Google Patents
Method of etchingInfo
- Publication number
- JPS5730332A JPS5730332A JP10463480A JP10463480A JPS5730332A JP S5730332 A JPS5730332 A JP S5730332A JP 10463480 A JP10463480 A JP 10463480A JP 10463480 A JP10463480 A JP 10463480A JP S5730332 A JPS5730332 A JP S5730332A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- wafers
- data
- vessel
- feeded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 title abstract 8
- 238000000034 method Methods 0.000 title abstract 3
- 235000012431 wafers Nutrition 0.000 abstract 5
- 239000003795 chemical substances by application Substances 0.000 abstract 3
- 238000005406 washing Methods 0.000 abstract 3
- 230000003472 neutralizing effect Effects 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000004809 Teflon Substances 0.000 abstract 1
- 229920006362 Teflon® Polymers 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10463480A JPS5730332A (en) | 1980-07-30 | 1980-07-30 | Method of etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10463480A JPS5730332A (en) | 1980-07-30 | 1980-07-30 | Method of etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5730332A true JPS5730332A (en) | 1982-02-18 |
Family
ID=14385870
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10463480A Pending JPS5730332A (en) | 1980-07-30 | 1980-07-30 | Method of etching |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5730332A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008202467A (ja) * | 2007-02-19 | 2008-09-04 | Ihi Corp | 過給機 |
| US11041433B2 (en) | 2018-01-11 | 2021-06-22 | Gunma Prefecture | Exhaust casing for turbocharger, and method for manufacturing same |
-
1980
- 1980-07-30 JP JP10463480A patent/JPS5730332A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008202467A (ja) * | 2007-02-19 | 2008-09-04 | Ihi Corp | 過給機 |
| US11041433B2 (en) | 2018-01-11 | 2021-06-22 | Gunma Prefecture | Exhaust casing for turbocharger, and method for manufacturing same |
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