JPS5727168A - Equipment for wet treatment - Google Patents
Equipment for wet treatmentInfo
- Publication number
- JPS5727168A JPS5727168A JP10250680A JP10250680A JPS5727168A JP S5727168 A JPS5727168 A JP S5727168A JP 10250680 A JP10250680 A JP 10250680A JP 10250680 A JP10250680 A JP 10250680A JP S5727168 A JPS5727168 A JP S5727168A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- porous material
- liquid
- liquid medicine
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000011282 treatment Methods 0.000 title abstract 3
- 239000007788 liquid Substances 0.000 abstract 9
- 239000000758 substrate Substances 0.000 abstract 7
- 239000003814 drug Substances 0.000 abstract 6
- 239000011148 porous material Substances 0.000 abstract 5
- 229940079593 drug Drugs 0.000 abstract 1
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Nozzles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10250680A JPS5727168A (en) | 1980-07-28 | 1980-07-28 | Equipment for wet treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10250680A JPS5727168A (en) | 1980-07-28 | 1980-07-28 | Equipment for wet treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5727168A true JPS5727168A (en) | 1982-02-13 |
| JPS6238034B2 JPS6238034B2 (enrdf_load_stackoverflow) | 1987-08-15 |
Family
ID=14329278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10250680A Granted JPS5727168A (en) | 1980-07-28 | 1980-07-28 | Equipment for wet treatment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5727168A (enrdf_load_stackoverflow) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57192955A (en) * | 1981-05-25 | 1982-11-27 | Toppan Printing Co Ltd | Developing method |
| JPS59112872A (ja) * | 1982-12-16 | 1984-06-29 | Matsushita Electric Ind Co Ltd | 回転塗装装置 |
| JPS59145525A (ja) * | 1983-02-09 | 1984-08-21 | Matsushita Electronics Corp | レジスト現像方法 |
| JPS59154361U (ja) * | 1983-04-04 | 1984-10-16 | 三菱レイヨン株式会社 | 塗布装置 |
| JPS61104825A (ja) * | 1984-10-29 | 1986-05-23 | Akira Nakajima | プラスチツク線材の連続一体化装置 |
| JPS63260040A (ja) * | 1987-04-16 | 1988-10-27 | Yamaguchi Nippon Denki Kk | 半導体素子の固着方法 |
| US4838289A (en) * | 1982-08-03 | 1989-06-13 | Texas Instruments Incorporated | Apparatus and method for edge cleaning |
| JPH01253235A (ja) * | 1988-03-31 | 1989-10-09 | Sigma Gijutsu Kogyo Kk | 基板処理方法および装置 |
| EP1610363A4 (en) * | 2003-04-01 | 2008-05-14 | Tokyo Electron Ltd | METHOD FOR HEAT TREATMENT AND HEAT TREATMENT DEVICE |
| JP2012142425A (ja) * | 2010-12-28 | 2012-07-26 | Tdk Corp | スラリー供給装置及び塗布装置 |
-
1980
- 1980-07-28 JP JP10250680A patent/JPS5727168A/ja active Granted
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57192955A (en) * | 1981-05-25 | 1982-11-27 | Toppan Printing Co Ltd | Developing method |
| US4838289A (en) * | 1982-08-03 | 1989-06-13 | Texas Instruments Incorporated | Apparatus and method for edge cleaning |
| JPS59112872A (ja) * | 1982-12-16 | 1984-06-29 | Matsushita Electric Ind Co Ltd | 回転塗装装置 |
| JPS59145525A (ja) * | 1983-02-09 | 1984-08-21 | Matsushita Electronics Corp | レジスト現像方法 |
| JPS59154361U (ja) * | 1983-04-04 | 1984-10-16 | 三菱レイヨン株式会社 | 塗布装置 |
| JPS61104825A (ja) * | 1984-10-29 | 1986-05-23 | Akira Nakajima | プラスチツク線材の連続一体化装置 |
| JPS63260040A (ja) * | 1987-04-16 | 1988-10-27 | Yamaguchi Nippon Denki Kk | 半導体素子の固着方法 |
| JPH01253235A (ja) * | 1988-03-31 | 1989-10-09 | Sigma Gijutsu Kogyo Kk | 基板処理方法および装置 |
| EP1610363A4 (en) * | 2003-04-01 | 2008-05-14 | Tokyo Electron Ltd | METHOD FOR HEAT TREATMENT AND HEAT TREATMENT DEVICE |
| US7537448B2 (en) | 2003-04-01 | 2009-05-26 | Tokyo Electron Limited | Thermal processing method and thermal processing unit |
| JP2012142425A (ja) * | 2010-12-28 | 2012-07-26 | Tdk Corp | スラリー供給装置及び塗布装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6238034B2 (enrdf_load_stackoverflow) | 1987-08-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS52123172A (en) | Spin coating method | |
| JPS5727168A (en) | Equipment for wet treatment | |
| JPS6481345A (en) | Formation of bump and apparatus therefor | |
| JPS57130570A (en) | Spinner coating method and apparatus | |
| JPS55119470A (en) | Coating method | |
| JPS5512750A (en) | Resist application device | |
| JPS55121865A (en) | Coating method | |
| JPS5536944A (en) | Method and device for washing rectangular substrate | |
| JPS5627113A (en) | Production of case for luquid crystal cell | |
| JP2537611B2 (ja) | 塗布材料の塗布装置 | |
| JPS55124232A (en) | Application method of substrate treatment solution and the device therefor | |
| JPS55120038A (en) | Resist coating and developing device | |
| JPS5763166A (en) | Rotary coating device | |
| JPS6425539A (en) | Wet treating apparatus | |
| JPS5918642A (ja) | 半導体製造装置 | |
| JPS6369564A (ja) | 基板の回転塗布装置 | |
| JPS56104440A (en) | Coating of resist | |
| JPS6431420A (en) | Photoresist dropping nozzle | |
| JPS5670635A (en) | Rotatable coating method and device therefor | |
| JPS5559724A (en) | Spinner device | |
| JPS6447474A (en) | Method for applying high-viscosity resin | |
| JPS57147478A (en) | Rotary type surface treating apparatus | |
| JPS5724659A (en) | Method and apparatus for electrostatic coating | |
| JPS5724661A (en) | Electrostatic coating device | |
| JPS51151738A (en) | Apparatus for spin coating |