JPS6431420A - Photoresist dropping nozzle - Google Patents
Photoresist dropping nozzleInfo
- Publication number
- JPS6431420A JPS6431420A JP18817687A JP18817687A JPS6431420A JP S6431420 A JPS6431420 A JP S6431420A JP 18817687 A JP18817687 A JP 18817687A JP 18817687 A JP18817687 A JP 18817687A JP S6431420 A JPS6431420 A JP S6431420A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- drip
- nozzle
- holes
- dropped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To lessen the drip amount and suppress the evaporation of a volatile solvent into the air, by reducing its drip time and then improve the uniformity of a photoresist film thickness, by composing a nozzle so that more than two dropping holes are arranged at least. CONSTITUTION:Photoresist 101 is dropped from the tip 3 of a nozzle to a wafer through a filter 2. In such a case, a plurality of drip holes 102 are arranged at the tip 3 of the nozzle and photoresist 101 is dropped to spread over the whole water through a plurality of the drip holes 102. As a result, the drip amount of photoresist can be curtailed in comparison with that of the conventional nozzles for dropping photoresist and also its drip time is reduced. Then this nozzle may suppress the evaporation of a volatile solvent in photoresist into the air and not only makes photoresist film thicknesses uniform but also forms fine patterns which exhibit an excellent reproducible property.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18817687A JPS6431420A (en) | 1987-07-27 | 1987-07-27 | Photoresist dropping nozzle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18817687A JPS6431420A (en) | 1987-07-27 | 1987-07-27 | Photoresist dropping nozzle |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6431420A true JPS6431420A (en) | 1989-02-01 |
Family
ID=16219095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18817687A Pending JPS6431420A (en) | 1987-07-27 | 1987-07-27 | Photoresist dropping nozzle |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6431420A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0641869U (en) * | 1992-06-30 | 1994-06-03 | 株式会社シーテック | Liquid application nozzle |
KR20030073928A (en) * | 2002-03-14 | 2003-09-19 | 삼성전자주식회사 | Apparatus for forming etching prevention film with spray type and method for patterning thin film using the same |
JP2011049002A (en) * | 2009-08-26 | 2011-03-10 | Casio Computer Co Ltd | Coating device |
-
1987
- 1987-07-27 JP JP18817687A patent/JPS6431420A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0641869U (en) * | 1992-06-30 | 1994-06-03 | 株式会社シーテック | Liquid application nozzle |
KR20030073928A (en) * | 2002-03-14 | 2003-09-19 | 삼성전자주식회사 | Apparatus for forming etching prevention film with spray type and method for patterning thin film using the same |
JP2011049002A (en) * | 2009-08-26 | 2011-03-10 | Casio Computer Co Ltd | Coating device |
US8464653B2 (en) | 2009-08-26 | 2013-06-18 | Casio Computer Co., Ltd. | Application device and method of producing application layer using same |
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