JPS5727168A - Equipment for wet treatment - Google Patents

Equipment for wet treatment

Info

Publication number
JPS5727168A
JPS5727168A JP10250680A JP10250680A JPS5727168A JP S5727168 A JPS5727168 A JP S5727168A JP 10250680 A JP10250680 A JP 10250680A JP 10250680 A JP10250680 A JP 10250680A JP S5727168 A JPS5727168 A JP S5727168A
Authority
JP
Japan
Prior art keywords
substrate
porous material
liquid
liquid medicine
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10250680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6238034B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Hideyuki Hirose
Tomoaki Tsuboka
Masayasu Tsunematsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10250680A priority Critical patent/JPS5727168A/ja
Publication of JPS5727168A publication Critical patent/JPS5727168A/ja
Publication of JPS6238034B2 publication Critical patent/JPS6238034B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Nozzles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10250680A 1980-07-28 1980-07-28 Equipment for wet treatment Granted JPS5727168A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10250680A JPS5727168A (en) 1980-07-28 1980-07-28 Equipment for wet treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10250680A JPS5727168A (en) 1980-07-28 1980-07-28 Equipment for wet treatment

Publications (2)

Publication Number Publication Date
JPS5727168A true JPS5727168A (en) 1982-02-13
JPS6238034B2 JPS6238034B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-08-15

Family

ID=14329278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10250680A Granted JPS5727168A (en) 1980-07-28 1980-07-28 Equipment for wet treatment

Country Status (1)

Country Link
JP (1) JPS5727168A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192955A (en) * 1981-05-25 1982-11-27 Toppan Printing Co Ltd Developing method
JPS59112872A (ja) * 1982-12-16 1984-06-29 Matsushita Electric Ind Co Ltd 回転塗装装置
JPS59145525A (ja) * 1983-02-09 1984-08-21 Matsushita Electronics Corp レジスト現像方法
JPS59154361U (ja) * 1983-04-04 1984-10-16 三菱レイヨン株式会社 塗布装置
JPS61104825A (ja) * 1984-10-29 1986-05-23 Akira Nakajima プラスチツク線材の連続一体化装置
JPS63260040A (ja) * 1987-04-16 1988-10-27 Yamaguchi Nippon Denki Kk 半導体素子の固着方法
US4838289A (en) * 1982-08-03 1989-06-13 Texas Instruments Incorporated Apparatus and method for edge cleaning
JPH01253235A (ja) * 1988-03-31 1989-10-09 Sigma Gijutsu Kogyo Kk 基板処理方法および装置
EP1610363A4 (en) * 2003-04-01 2008-05-14 Tokyo Electron Ltd METHOD FOR HEAT TREATMENT AND HEAT TREATMENT DEVICE
JP2012142425A (ja) * 2010-12-28 2012-07-26 Tdk Corp スラリー供給装置及び塗布装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192955A (en) * 1981-05-25 1982-11-27 Toppan Printing Co Ltd Developing method
US4838289A (en) * 1982-08-03 1989-06-13 Texas Instruments Incorporated Apparatus and method for edge cleaning
JPS59112872A (ja) * 1982-12-16 1984-06-29 Matsushita Electric Ind Co Ltd 回転塗装装置
JPS59145525A (ja) * 1983-02-09 1984-08-21 Matsushita Electronics Corp レジスト現像方法
JPS59154361U (ja) * 1983-04-04 1984-10-16 三菱レイヨン株式会社 塗布装置
JPS61104825A (ja) * 1984-10-29 1986-05-23 Akira Nakajima プラスチツク線材の連続一体化装置
JPS63260040A (ja) * 1987-04-16 1988-10-27 Yamaguchi Nippon Denki Kk 半導体素子の固着方法
JPH01253235A (ja) * 1988-03-31 1989-10-09 Sigma Gijutsu Kogyo Kk 基板処理方法および装置
EP1610363A4 (en) * 2003-04-01 2008-05-14 Tokyo Electron Ltd METHOD FOR HEAT TREATMENT AND HEAT TREATMENT DEVICE
US7537448B2 (en) 2003-04-01 2009-05-26 Tokyo Electron Limited Thermal processing method and thermal processing unit
JP2012142425A (ja) * 2010-12-28 2012-07-26 Tdk Corp スラリー供給装置及び塗布装置

Also Published As

Publication number Publication date
JPS6238034B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-08-15

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