JPS572522A - Defect inspecting device for regular pattern - Google Patents

Defect inspecting device for regular pattern

Info

Publication number
JPS572522A
JPS572522A JP7577880A JP7577880A JPS572522A JP S572522 A JPS572522 A JP S572522A JP 7577880 A JP7577880 A JP 7577880A JP 7577880 A JP7577880 A JP 7577880A JP S572522 A JPS572522 A JP S572522A
Authority
JP
Japan
Prior art keywords
pattern
fourier transformation
inspected
parallel
emitted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7577880A
Other languages
English (en)
Other versions
JPS632041B2 (ja
Inventor
Nobuo Tsumita
Shunsuke Mukasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP7577880A priority Critical patent/JPS572522A/ja
Publication of JPS572522A publication Critical patent/JPS572522A/ja
Publication of JPS632041B2 publication Critical patent/JPS632041B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP7577880A 1980-06-05 1980-06-05 Defect inspecting device for regular pattern Granted JPS572522A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7577880A JPS572522A (en) 1980-06-05 1980-06-05 Defect inspecting device for regular pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7577880A JPS572522A (en) 1980-06-05 1980-06-05 Defect inspecting device for regular pattern

Publications (2)

Publication Number Publication Date
JPS572522A true JPS572522A (en) 1982-01-07
JPS632041B2 JPS632041B2 (ja) 1988-01-16

Family

ID=13586007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7577880A Granted JPS572522A (en) 1980-06-05 1980-06-05 Defect inspecting device for regular pattern

Country Status (1)

Country Link
JP (1) JPS572522A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62220239A (ja) * 1986-03-20 1987-09-28 Hitachi Metals Ltd アプセツト加工用アンビル
JPH02122061A (ja) * 1988-10-28 1990-05-09 Hitachi Koki Co Ltd 浸炭焼入れを施した金属材料

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5191737A (ja) * 1975-02-10 1976-08-11
JPS54105967A (en) * 1978-02-08 1979-08-20 Toshiba Corp Defect test system for pattern featuring directivity

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5191737A (ja) * 1975-02-10 1976-08-11
JPS54105967A (en) * 1978-02-08 1979-08-20 Toshiba Corp Defect test system for pattern featuring directivity

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62220239A (ja) * 1986-03-20 1987-09-28 Hitachi Metals Ltd アプセツト加工用アンビル
JPH02122061A (ja) * 1988-10-28 1990-05-09 Hitachi Koki Co Ltd 浸炭焼入れを施した金属材料

Also Published As

Publication number Publication date
JPS632041B2 (ja) 1988-01-16

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