JPS56117106A - Inspecting device for pattern defect - Google Patents

Inspecting device for pattern defect

Info

Publication number
JPS56117106A
JPS56117106A JP1918480A JP1918480A JPS56117106A JP S56117106 A JPS56117106 A JP S56117106A JP 1918480 A JP1918480 A JP 1918480A JP 1918480 A JP1918480 A JP 1918480A JP S56117106 A JPS56117106 A JP S56117106A
Authority
JP
Japan
Prior art keywords
pattern
inspected
photodetector array
fourier converting
spectrum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1918480A
Other languages
Japanese (ja)
Other versions
JPS6330561B2 (en
Inventor
Shunsuke Mukasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP1918480A priority Critical patent/JPS56117106A/en
Publication of JPS56117106A publication Critical patent/JPS56117106A/en
Publication of JPS6330561B2 publication Critical patent/JPS6330561B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To simplify the titled device by detecting defects in a pattern by means of the photodetector array arranged on a reverse Fourier converting surface while shifting the regulative pattern horizontally. CONSTITUTION:Laser beam 2 from laser oscillator 1 is converted into horizontal beam 4 through collimeter 3 to irradiate regulative pattern 5. Pattern 5 to be inspected is arranged on the front focus surface and space filter 8 having a negative pattern with the Fourier converting spectrum strength of normal pattern is arranged on the back focus surface. Normal patterns out of the Fourier converting spectrum of the pattern to be inspected 5 are absorbed into space filter 8 and the spectrum of defective patterns is transmitted and detected by photodetector array 11 through reverse Fourier converting lens 10. After making the pattern 8 to be inspected shift at a right angle to the optical axis, the area and position of a defective image can be detected with photodetector array 11, making it possible to simplify the device.
JP1918480A 1980-02-20 1980-02-20 Inspecting device for pattern defect Granted JPS56117106A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1918480A JPS56117106A (en) 1980-02-20 1980-02-20 Inspecting device for pattern defect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1918480A JPS56117106A (en) 1980-02-20 1980-02-20 Inspecting device for pattern defect

Publications (2)

Publication Number Publication Date
JPS56117106A true JPS56117106A (en) 1981-09-14
JPS6330561B2 JPS6330561B2 (en) 1988-06-20

Family

ID=11992244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1918480A Granted JPS56117106A (en) 1980-02-20 1980-02-20 Inspecting device for pattern defect

Country Status (1)

Country Link
JP (1) JPS56117106A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0286529A2 (en) * 1987-04-08 1988-10-12 Commissariat A L'energie Atomique Arrangement for determining the contrast of a display screen with regard to the direction of observation
JPH0431745A (en) * 1990-05-28 1992-02-03 Res Dev Corp Of Japan Apparatus for simultaneous detecting amplitude image and phase image using heterodyne-detecting light receiving device
JP2010204653A (en) * 2009-03-04 2010-09-16 Samsung Mobile Display Co Ltd Apparatus and method of inspecting mask

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105967A (en) * 1978-02-08 1979-08-20 Toshiba Corp Defect test system for pattern featuring directivity

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105967A (en) * 1978-02-08 1979-08-20 Toshiba Corp Defect test system for pattern featuring directivity

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0286529A2 (en) * 1987-04-08 1988-10-12 Commissariat A L'energie Atomique Arrangement for determining the contrast of a display screen with regard to the direction of observation
FR2613830A1 (en) * 1987-04-08 1988-10-14 Commissariat Energie Atomique DEVICE FOR DETERMINING THE CONTRAST OF A DISPLAY SCREEN BASED ON THE OBSERVATION DIRECTION
JPH0431745A (en) * 1990-05-28 1992-02-03 Res Dev Corp Of Japan Apparatus for simultaneous detecting amplitude image and phase image using heterodyne-detecting light receiving device
JP2010204653A (en) * 2009-03-04 2010-09-16 Samsung Mobile Display Co Ltd Apparatus and method of inspecting mask

Also Published As

Publication number Publication date
JPS6330561B2 (en) 1988-06-20

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