JPS5745230A - Inspecting device for photomask dry plate - Google Patents

Inspecting device for photomask dry plate

Info

Publication number
JPS5745230A
JPS5745230A JP11984180A JP11984180A JPS5745230A JP S5745230 A JPS5745230 A JP S5745230A JP 11984180 A JP11984180 A JP 11984180A JP 11984180 A JP11984180 A JP 11984180A JP S5745230 A JPS5745230 A JP S5745230A
Authority
JP
Japan
Prior art keywords
dry plate
inspection
detecting device
laser beam
pinholes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11984180A
Other languages
Japanese (ja)
Other versions
JPS598060B2 (en
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55119841A priority Critical patent/JPS598060B2/en
Publication of JPS5745230A publication Critical patent/JPS5745230A/en
Publication of JPS598060B2 publication Critical patent/JPS598060B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable to perform an inspection for foreign substance and an inspection for pinholes at the same time by a method wherein a polarized beam splitter, a scanning device, a reflected light detecting device and another detecting device are provided for use with the laser beam emitted from a laser beam generator. CONSTITUTION:The laser beam emitted from the laser beam generator 1 is irradiated on a photomask dry plate 8 through the intermediaries of a beam expander 2, a polarized beam splitter 3, a lens 4, a scanning mirror 6 whereon a scanner 5 is installed and a lens 7, and among the reflected lights, the polarized light corresponding to the foreign substance on the dry plate is detected by the photoelectric detecting device 11 through the intermediary of the lens 10, and the transmitted light corresponding to the pinholes on the dry plate is detected by the photoelectric detecting device 9. Through these procedures, the inspection for foreign substance on the surface of the dry plate and the inspection for the pinholes can be performed simultaneously.
JP55119841A 1980-09-01 1980-09-01 Photomask dry plate inspection equipment Expired JPS598060B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55119841A JPS598060B2 (en) 1980-09-01 1980-09-01 Photomask dry plate inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55119841A JPS598060B2 (en) 1980-09-01 1980-09-01 Photomask dry plate inspection equipment

Publications (2)

Publication Number Publication Date
JPS5745230A true JPS5745230A (en) 1982-03-15
JPS598060B2 JPS598060B2 (en) 1984-02-22

Family

ID=14771577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55119841A Expired JPS598060B2 (en) 1980-09-01 1980-09-01 Photomask dry plate inspection equipment

Country Status (1)

Country Link
JP (1) JPS598060B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2524162A1 (en) * 1982-03-23 1983-09-30 Canon Kk APPARATUS AND METHOD FOR CONTROLLING NEGATIVES AND DEVICE FOR MASKING MASKS

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2524162A1 (en) * 1982-03-23 1983-09-30 Canon Kk APPARATUS AND METHOD FOR CONTROLLING NEGATIVES AND DEVICE FOR MASKING MASKS

Also Published As

Publication number Publication date
JPS598060B2 (en) 1984-02-22

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