JPS598060B2 - Photomask dry plate inspection equipment - Google Patents
Photomask dry plate inspection equipmentInfo
- Publication number
- JPS598060B2 JPS598060B2 JP55119841A JP11984180A JPS598060B2 JP S598060 B2 JPS598060 B2 JP S598060B2 JP 55119841 A JP55119841 A JP 55119841A JP 11984180 A JP11984180 A JP 11984180A JP S598060 B2 JPS598060 B2 JP S598060B2
- Authority
- JP
- Japan
- Prior art keywords
- dry plate
- laser beam
- photomask
- inspection equipment
- photoelectric detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Description
【発明の詳細な説明】
本発明は半導体装置の回路パターンを形成するためのフ
ォトマスク乾板の検査装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an inspection apparatus for photomask dry plates for forming circuit patterns of semiconductor devices.
半導体装置の回路パターン形成用フォトマスクはガラス
板上に金属酸化膜をコーティングしこれをフォトエッチ
ングにより回路パターンに対応した形状にエッチングし
て製造する。A photomask for forming a circuit pattern of a semiconductor device is manufactured by coating a glass plate with a metal oxide film and etching it into a shape corresponding to the circuit pattern by photoetching.
このようなフォトマスク製造工程前に、ガラス板上の金
属酸化膜全面にレジストを塗布した状態のいわゆる乾板
はその表面を検査してレジスト上に不純物異物が付着し
ているものを取除きまた金属酸化膜の状態を検査して空
洞やピンホールが形成されたものを取除かなければなら
ない。このような乾板の検査作業は表面異物検査および
ピンホール検査の２つの作業を行なわなければならず各
々作業に大がかりな光学装置を必要とし多大な時間を要
していｚ本発明は上記の点に鑑みなされたものであつて
フォトマスク乾板の表面異物検出およびピンホール検出
を同時にできる乾板検査装置の提供を目的とする○この
ため本発明に係る検査装置においては、レーザ光発生器
からのレーザ光を偏光ビームスプリッタおよびスキャニ
ング装置を介して検査すべき乾板に照射し、この乾板か
らの反射光のうち乾板表面の異物に対応した偏光を上記
偏光ビームスプリッタで分割してこれを検知する光電検
出器を備え、さらに上記乾板のレーザ光照射面の反対側
に乾板のピンホール検出用光電検出器を備えている。以
下、図面に基いて本発明をさらに詳しく説明する。Before such a photomask manufacturing process, the surface of a so-called dry plate, in which a resist is applied to the entire surface of a metal oxide film on a glass plate, is inspected to remove any impurities or foreign matter adhering to the resist. The condition of the oxide film must be inspected and any cavities or pinholes formed must be removed. Inspection of such a dry plate requires two operations: surface foreign matter inspection and pinhole inspection, each of which requires a large-scale optical device and takes a lot of time.The present invention addresses the above points. The object of the present invention is to provide a dry plate inspection device that can simultaneously detect foreign matter and pinholes on the surface of a photomask dry plate.For this reason, in the inspection device according to the present invention, a laser beam from a laser beam generator is used. is irradiated onto a dry plate to be inspected via a polarizing beam splitter and a scanning device, and out of the reflected light from the dry plate, polarized light corresponding to foreign matter on the dry plate surface is divided by the polarizing beam splitter and detected by a photoelectric detector. Further, a photoelectric detector for detecting pinholes in the dry plate is provided on the opposite side of the laser beam irradiation surface of the dry plate. Hereinafter, the present invention will be explained in more detail based on the drawings.
レーザ光発生器１からのレーザ光はビームエクスパンダ
２を通過して偏光ビームスプリッタ３に入射しここで偏
光作用を受けて例えば円偏光の光のみがここを通過し光
学レンズ４を通してスキャナ５のスキャニングミラー６
で回転走査されスキャニングレンズＴを通しで検査すべ
き乾板８を照射する。乾板８は前述のようにガラス板上
に金属酸化膜を形成しその土にレジストを塗布したもの
であり金属酸化膜が完全に形成されていればレーザ光は
乾板８を通過しない。この乾板８の金属酸化膜にピンホ
ールが形成されている場合にはこの部分をレーザ光が透
過し光電検出器９により検知される。一方、ピンホール
が形成されていない部分では照射されたレーザ光は反射
されて光路を逆進する。このとき乾板８の表面に異物が
付着 。していると反射光は円偏光の光から例えばＰ偏
光の光に変化しこれが偏光ビームスプリッタ３で分割さ
れて集光レンズ１０を通して光電検出器１１で検知され
る。以上のような乾板検査装置においては１つのレーザ
光発生器を用いて乾板表面の異物検査およびピンホール
検査の両方を同時に行なうことができ検査装置が小型化
？れ作業能率が大きく向上すんThe laser beam from the laser beam generator 1 passes through the beam expander 2 and enters the polarizing beam splitter 3, where it is polarized and, for example, only circularly polarized light passes through it and is sent to the scanner 5 through the optical lens 4. scanning mirror 6
The dry plate 8 to be inspected is irradiated through the scanning lens T which is rotated and scanned by the scanning lens T. As described above, the dry plate 8 is made by forming a metal oxide film on a glass plate and applying a resist to the soil. If the metal oxide film is completely formed, the laser beam will not pass through the dry plate 8. If a pinhole is formed in the metal oxide film of the dry plate 8, the laser beam passes through this portion and is detected by the photoelectric detector 9. On the other hand, in a portion where no pinhole is formed, the irradiated laser beam is reflected and travels backward along the optical path. At this time, foreign matter adheres to the surface of the dry plate 8. When this happens, the reflected light changes from circularly polarized light to, for example, P-polarized light, which is split by the polarizing beam splitter 3, passed through the condensing lens 10, and detected by the photoelectric detector 11. In the above-mentioned dry plate inspection apparatus, it is possible to simultaneously perform both foreign matter inspection and pinhole inspection on the dry plate surface using one laser beam generator, making the inspection apparatus more compact. This greatly improves work efficiency.
図面は本発明に係る乾板検査装置の構成図であるｏ１・
・・・・・レーザ光発生器、
リツタ、５・・・・・・スキヤナ、
ラ一、８・・・・・・乾板、９，１
３・・・・・・偏光ビームスプ
６・・・・・・スキヤニングミ
１・・・・・・光電検出器。The drawing is a block diagram of a dry plate inspection device according to the present invention.
...Laser beam generator, Ritsuta, 5...Scanner, Ra1, 8...Dry plate, 9,1 3...Polarized beam spray 6... ... Scanning Mi 1 ... Photoelectric detector.
Claims (1)
ッタおよびスキャニング装置を介して検査すべき乾板に
照射し、該乾板からの反射光のうち上記乾板表面異物に
対応した偏光を上記偏光ビームスプリッタで分割してこ
れを検知する光電検出器を備え、さらに上記乾板のレー
ザ光照射面の反対側に乾板のピンホール検出用光電検出
器を備えたフォトマスク乾板の検査装置。1 A laser beam from a laser beam generator is irradiated onto a dry plate to be inspected via a polarizing beam splitter and a scanning device, and out of the light reflected from the dry plate, polarized light corresponding to the foreign matter on the dry plate surface is split by the polarizing beam splitter. An inspection device for a photomask dry plate, comprising a photoelectric detector for detecting this, and a photoelectric detector for detecting pinholes in the dry plate on the opposite side of the laser beam irradiation surface of the dry plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55119841A JPS598060B2 (en) | 1980-09-01 | 1980-09-01 | Photomask dry plate inspection equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55119841A JPS598060B2 (en) | 1980-09-01 | 1980-09-01 | Photomask dry plate inspection equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5745230A JPS5745230A (en) | 1982-03-15 |
| JPS598060B2 true JPS598060B2 (en) | 1984-02-22 |
Family
ID=14771577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55119841A Expired JPS598060B2 (en) | 1980-09-01 | 1980-09-01 | Photomask dry plate inspection equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS598060B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58162038A (en) * | 1982-03-23 | 1983-09-26 | Canon Inc | Pattern defect detection apparatus |
-
1980
- 1980-09-01 JP JP55119841A patent/JPS598060B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5745230A (en) | 1982-03-15 |
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