JPH01239922A - Pattern defect inspecting device - Google Patents

Pattern defect inspecting device

Info

Publication number
JPH01239922A
JPH01239922A JP6753488A JP6753488A JPH01239922A JP H01239922 A JPH01239922 A JP H01239922A JP 6753488 A JP6753488 A JP 6753488A JP 6753488 A JP6753488 A JP 6753488A JP H01239922 A JPH01239922 A JP H01239922A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
pattern
substrate
image
reticle
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6753488A
Inventor
Katsumi Umeda
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To detect with high accuracy any defect on a substrate produced upon pattern transfer by inspecting, in comparison, a pattern formed on the substrate with a mask pattern.
CONSTITUTION: A reticle 1 is placed on a X-Y stage 3, and a transmitted light emanating from the lower surface of the reticle 1 is adapted to enter a CCD image sensor 9 through an optical system 5 and a prism 7. The sensor 9 converts image information to an electric signal, which is then supplied to an information processing unit 13. A patterned substrate 2 is placed on the surface of a X-Y stage 4 using the reticle 1, and irradiated with a scanned laser 12 beam. A reflected light from the substrate 2 is incident upon a CCD image sensor 10, converted into an electric signal, and fed to a processing part 13. The processing part 13 compares and identifies an image from the reticle with a pattern image on the substrate. Thus, any defect which might be produced upon pattern transfer can be detected highly accurately.
COPYRIGHT: (C)1989,JPO&Japio
JP6753488A 1988-03-22 1988-03-22 Pattern defect inspecting device Pending JPH01239922A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6753488A JPH01239922A (en) 1988-03-22 1988-03-22 Pattern defect inspecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6753488A JPH01239922A (en) 1988-03-22 1988-03-22 Pattern defect inspecting device

Publications (1)

Publication Number Publication Date
JPH01239922A true true JPH01239922A (en) 1989-09-25

Family

ID=13347742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6753488A Pending JPH01239922A (en) 1988-03-22 1988-03-22 Pattern defect inspecting device

Country Status (1)

Country Link
JP (1) JPH01239922A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08339074A (en) * 1995-03-22 1996-12-24 Hyundai Electron Ind Co Ltd Manufacture of exposure mask
JP2007227614A (en) * 2006-02-23 2007-09-06 Nikon Corp Information control method, information control system, program, recording medium, pattern tester, and board tester

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08339074A (en) * 1995-03-22 1996-12-24 Hyundai Electron Ind Co Ltd Manufacture of exposure mask
JP2007227614A (en) * 2006-02-23 2007-09-06 Nikon Corp Information control method, information control system, program, recording medium, pattern tester, and board tester

Similar Documents

Publication Publication Date Title
JPS6289336A (en) Inspecting device for semiconductor wafer
JPH01250847A (en) Automatic high speed optical inspection equipment
JPS62190728A (en) Method and apparatus for monitoring etching end point
JPH02222533A (en) Polishing device for semiconductor wafer
JPS5642205A (en) Focus detecting method
JPS63131123A (en) Optical reader
JPS6211151A (en) Apparatus for inspecting surface flaw
JPS6324116A (en) Shape measuring instrument
JPS59232344A (en) Detector for wiring pattern
JPH03102248A (en) Method and apparatus for detecting foreign matter
JPH0496315A (en) Exposure device
JPH03102249A (en) Method and apparatus for detecting foreign matter
JPS63144889A (en) Laser beam processing device
JPH0373831A (en) Device for inspecting defect
JPS5837923A (en) Inspection apparatus for photo mask
JPH03199947A (en) Inspection of soldered part and apparatus therefor, and inspection of electronic component mounting state
JPS6242039A (en) Surface inspecting device
JPS6153616A (en) Scanner
JPH02132311A (en) Circuit pattern inspection instrument for printed wiring board
JPS61286708A (en) Measuring device for measuring number of laminated plate materials
JPH02112709A (en) Method and device for alignment
JPS587136A (en) Method and device for projection type exposure
JPH0540026A (en) Pattern reading device
JPS5616804A (en) Pattern check unit of printed circuit board
JPS62140418A (en) Position detector of surface