JPH01239922A - Pattern defect inspecting device - Google Patents

Pattern defect inspecting device

Info

Publication number
JPH01239922A
JPH01239922A JP6753488A JP6753488A JPH01239922A JP H01239922 A JPH01239922 A JP H01239922A JP 6753488 A JP6753488 A JP 6753488A JP 6753488 A JP6753488 A JP 6753488A JP H01239922 A JPH01239922 A JP H01239922A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
substrate
reticle
pattern
image
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6753488A
Inventor
Katsumi Umeda
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To detect with high accuracy any defect on a substrate produced upon pattern transfer by inspecting, in comparison, a pattern formed on the substrate with a mask pattern.
CONSTITUTION: A reticle 1 is placed on a X-Y stage 3, and a transmitted light emanating from the lower surface of the reticle 1 is adapted to enter a CCD image sensor 9 through an optical system 5 and a prism 7. The sensor 9 converts image information to an electric signal, which is then supplied to an information processing unit 13. A patterned substrate 2 is placed on the surface of a X-Y stage 4 using the reticle 1, and irradiated with a scanned laser 12 beam. A reflected light from the substrate 2 is incident upon a CCD image sensor 10, converted into an electric signal, and fed to a processing part 13. The processing part 13 compares and identifies an image from the reticle with a pattern image on the substrate. Thus, any defect which might be produced upon pattern transfer can be detected highly accurately.
COPYRIGHT: (C)1989,JPO&Japio
JP6753488A 1988-03-22 1988-03-22 Pattern defect inspecting device Pending JPH01239922A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6753488A JPH01239922A (en) 1988-03-22 1988-03-22 Pattern defect inspecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6753488A JPH01239922A (en) 1988-03-22 1988-03-22 Pattern defect inspecting device

Publications (1)

Publication Number Publication Date
JPH01239922A true true JPH01239922A (en) 1989-09-25

Family

ID=13347742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6753488A Pending JPH01239922A (en) 1988-03-22 1988-03-22 Pattern defect inspecting device

Country Status (1)

Country Link
JP (1) JPH01239922A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08339074A (en) * 1995-03-22 1996-12-24 Hyundai Electron Ind Co Ltd Manufacture of exposure mask
JP2007227614A (en) * 2006-02-23 2007-09-06 Nikon Corp Information control method, information control system, program, recording medium, pattern tester, and board tester

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08339074A (en) * 1995-03-22 1996-12-24 Hyundai Electron Ind Co Ltd Manufacture of exposure mask
JP2007227614A (en) * 2006-02-23 2007-09-06 Nikon Corp Information control method, information control system, program, recording medium, pattern tester, and board tester

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