JPS5454056A - Photoelectric detector - Google Patents

Photoelectric detector

Info

Publication number
JPS5454056A
JPS5454056A JP12041977A JP12041977A JPS5454056A JP S5454056 A JPS5454056 A JP S5454056A JP 12041977 A JP12041977 A JP 12041977A JP 12041977 A JP12041977 A JP 12041977A JP S5454056 A JPS5454056 A JP S5454056A
Authority
JP
Japan
Prior art keywords
photoelectric
view finding
polarizing
systems
beam splitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12041977A
Other languages
Japanese (ja)
Other versions
JPS649606B2 (en
Inventor
Akiyoshi Suzuki
Ichiro Kano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP12041977A priority Critical patent/JPS5454056A/en
Priority to DE19782843282 priority patent/DE2843282A1/en
Priority to US05/948,776 priority patent/US4251129A/en
Publication of JPS5454056A publication Critical patent/JPS5454056A/en
Publication of JPS649606B2 publication Critical patent/JPS649606B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To efficiently joint optical systems for automatic alignment by making use of a polarizing beam splitter so that the polarizing directions of the photoelectric detecting system and a view finding system. CONSTITUTION:A photoelectric detector to be used with a automatic alignment apparatus between a mask and wafer upon the printing operation of an IC has its view finding systems 22 to 24, view finding illumination systems 19 to 52 and a photoelectric detecting systems 14 to 18 combined with a photoelectric scanning system by a dichroic beam splitter 50 and a polarizing beam splitter 14 as well as a beam splitter 9. The wafer is irradiated with two kinds of lights coming from a laser beam 1 and the view finding light source 19 and having different polarizing directions. One of the two lights is directed toward the photoelectric device 18 of the photoelectric scanning system while the other light is selectively directed to the eyepiece portion of the view finding optical system by the excellent combination of a polarizing splitter 51, a plate 41 of a quarter wave length and the polarizing plate 52, thus making the view finding system and photoelectric detecting systems compatible.
JP12041977A 1977-10-05 1977-10-06 Photoelectric detector Granted JPS5454056A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP12041977A JPS5454056A (en) 1977-10-06 1977-10-06 Photoelectric detector
DE19782843282 DE2843282A1 (en) 1977-10-05 1978-10-04 PHOTOELECTRIC DETECTION DEVICE
US05/948,776 US4251129A (en) 1977-10-05 1978-10-05 Photoelectric detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12041977A JPS5454056A (en) 1977-10-06 1977-10-06 Photoelectric detector

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62006341A Division JPS62188902A (en) 1987-01-14 1987-01-14 Optical instrument

Publications (2)

Publication Number Publication Date
JPS5454056A true JPS5454056A (en) 1979-04-27
JPS649606B2 JPS649606B2 (en) 1989-02-17

Family

ID=14785749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12041977A Granted JPS5454056A (en) 1977-10-05 1977-10-06 Photoelectric detector

Country Status (1)

Country Link
JP (1) JPS5454056A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101677A (en) * 1982-12-01 1984-06-12 Ricoh Co Ltd Developing device using magnetic brush
JPS6080223A (en) * 1983-10-07 1985-05-08 Hitachi Ltd Light exposing device
JPS60227218A (en) * 1984-04-25 1985-11-12 Fuji Photo Film Co Ltd Splitting and synthesizing method of beam
JPS637618A (en) * 1986-06-27 1988-01-13 Nippon Tairan Kk Laser-beam positioning apparatus in semiconductor manufacturing apparatus
JPH0645223A (en) * 1993-06-25 1994-02-18 Nikon Corp Projection aligner

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5129846U (en) * 1974-08-27 1976-03-04

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5129846U (en) * 1974-08-27 1976-03-04

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101677A (en) * 1982-12-01 1984-06-12 Ricoh Co Ltd Developing device using magnetic brush
JPS6080223A (en) * 1983-10-07 1985-05-08 Hitachi Ltd Light exposing device
JPS60227218A (en) * 1984-04-25 1985-11-12 Fuji Photo Film Co Ltd Splitting and synthesizing method of beam
JPS637618A (en) * 1986-06-27 1988-01-13 Nippon Tairan Kk Laser-beam positioning apparatus in semiconductor manufacturing apparatus
JPH0645223A (en) * 1993-06-25 1994-02-18 Nikon Corp Projection aligner

Also Published As

Publication number Publication date
JPS649606B2 (en) 1989-02-17

Similar Documents

Publication Publication Date Title
JPS5212577A (en) Automatic location device
ES2020151A4 (en) PROCEDURE AND DEVICE FOR THE ELABORATION OF MATERIAL WITH THE ASSISTANCE OF A LASER.
ATE89671T1 (en) COMBINED BRIGHTFIELD-DARKFIELD RESPONSE ILLUMINATION DEVICE.
JPS57142612A (en) Alignment optical system of projection type exposure device
JPS5454056A (en) Photoelectric detector
JPS51149004A (en) Optical apparatus
JPS51135529A (en) Ophthalmofundus photographing device with an anterior eye illumination system
JPS52132851A (en) Optical detector of scanning type
JPS5342846A (en) Photo coupling device
JPS55164304A (en) Mirror surface check unit
JPS5413732A (en) Light source device
JPS52126241A (en) Slit illumination device
JPS5278392A (en) Optical semiconductor device
JPS51132757A (en) Optical observation device
JPS55140102A (en) Measuring device for flatness of inspected plane glass
WO1979000400A1 (en) Automatic focusing system
JPS5487177A (en) Component positioning unit
JPS55124008A (en) Defect inspecting apparatus
JPS55158505A (en) Knifed mark inspector
GB570022A (en) A projection system for the inspection of internal surfaces
JPS5238944A (en) Optical system for scanning
JPS53107268A (en) Exposing method for fluorescent screen
JPS53131857A (en) Measuring device of optical fiber cut-off wavelength
JPS5317330A (en) Display means for focusing condition
JPS53119679A (en) Mask alignment device